JPS5530811A - Single field alignment method - Google Patents
Single field alignment methodInfo
- Publication number
- JPS5530811A JPS5530811A JP10282578A JP10282578A JPS5530811A JP S5530811 A JPS5530811 A JP S5530811A JP 10282578 A JP10282578 A JP 10282578A JP 10282578 A JP10282578 A JP 10282578A JP S5530811 A JPS5530811 A JP S5530811A
- Authority
- JP
- Japan
- Prior art keywords
- field
- correcting
- terms
- control system
- absolute dimension
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10282578A JPS5530811A (en) | 1978-08-25 | 1978-08-25 | Single field alignment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10282578A JPS5530811A (en) | 1978-08-25 | 1978-08-25 | Single field alignment method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5530811A true JPS5530811A (en) | 1980-03-04 |
| JPS6320015B2 JPS6320015B2 (enrdf_load_stackoverflow) | 1988-04-26 |
Family
ID=14337790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10282578A Granted JPS5530811A (en) | 1978-08-25 | 1978-08-25 | Single field alignment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5530811A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5743421A (en) * | 1980-08-28 | 1982-03-11 | Jeol Ltd | Adjusting method for correction circuit of electron beam exposure device |
| JPS5787131A (en) * | 1980-11-20 | 1982-05-31 | Jeol Ltd | Exposing method of electron beam |
| JP2000349021A (ja) * | 1999-04-13 | 2000-12-15 | Internatl Business Mach Corp <Ibm> | 電子ビーム・リソグラフィ・システム |
-
1978
- 1978-08-25 JP JP10282578A patent/JPS5530811A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5743421A (en) * | 1980-08-28 | 1982-03-11 | Jeol Ltd | Adjusting method for correction circuit of electron beam exposure device |
| JPS5787131A (en) * | 1980-11-20 | 1982-05-31 | Jeol Ltd | Exposing method of electron beam |
| JP2000349021A (ja) * | 1999-04-13 | 2000-12-15 | Internatl Business Mach Corp <Ibm> | 電子ビーム・リソグラフィ・システム |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6320015B2 (enrdf_load_stackoverflow) | 1988-04-26 |
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