JPS6320015B2 - - Google Patents
Info
- Publication number
- JPS6320015B2 JPS6320015B2 JP53102825A JP10282578A JPS6320015B2 JP S6320015 B2 JPS6320015 B2 JP S6320015B2 JP 53102825 A JP53102825 A JP 53102825A JP 10282578 A JP10282578 A JP 10282578A JP S6320015 B2 JPS6320015 B2 JP S6320015B2
- Authority
- JP
- Japan
- Prior art keywords
- field
- alignment
- mark
- cpu
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 18
- 238000000609 electron-beam lithography Methods 0.000 claims description 4
- 238000010894 electron beam technology Methods 0.000 description 13
- 238000001514 detection method Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10282578A JPS5530811A (en) | 1978-08-25 | 1978-08-25 | Single field alignment method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10282578A JPS5530811A (en) | 1978-08-25 | 1978-08-25 | Single field alignment method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5530811A JPS5530811A (en) | 1980-03-04 |
JPS6320015B2 true JPS6320015B2 (enrdf_load_stackoverflow) | 1988-04-26 |
Family
ID=14337790
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10282578A Granted JPS5530811A (en) | 1978-08-25 | 1978-08-25 | Single field alignment method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5530811A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5743421A (en) * | 1980-08-28 | 1982-03-11 | Jeol Ltd | Adjusting method for correction circuit of electron beam exposure device |
JPS5787131A (en) * | 1980-11-20 | 1982-05-31 | Jeol Ltd | Exposing method of electron beam |
US6437347B1 (en) * | 1999-04-13 | 2002-08-20 | International Business Machines Corporation | Target locking system for electron beam lithography |
-
1978
- 1978-08-25 JP JP10282578A patent/JPS5530811A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5530811A (en) | 1980-03-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4818885A (en) | Electron beam writing method and system using large range deflection in combination with a continuously moving table | |
JP2788139B2 (ja) | 電子線描画装置 | |
EP0024884B1 (en) | Method of detecting the position of a substrate using an electron beam | |
JPS61502486A (ja) | 精密sem測定のための方法と装置 | |
EP0033138B1 (en) | A method for correcting deflection distortions in an apparatus for charged particle lithography | |
JPH06174644A (ja) | 座標変換係数の自動設定方法 | |
JP2002353112A (ja) | 電子ビーム近接露光装置における電子ビームの傾き測定方法及び傾き較正方法並びに電子ビーム近接露光装置 | |
JPS6320015B2 (enrdf_load_stackoverflow) | ||
US4798920A (en) | Stylus coordinate determining device with distortion compensation | |
JP2018160530A (ja) | 座標検出方法および座標出力装置、欠陥検査装置 | |
JP3318440B2 (ja) | ステージ原点位置決定方法及び装置並びにステージ位置検出器原点決定方法及び装置 | |
JP2839341B2 (ja) | 位置信号の校正装置 | |
US20030193560A1 (en) | Precise position control apparatus and precise position control method using the same | |
JPH0922859A (ja) | 電子線露光工程における試料面高さの補正方法 | |
JPH0634722A (ja) | 電子ビーム試験装置 | |
JP3384504B2 (ja) | 荷電粒子ビームを利用したicテスタ | |
JPS5498577A (en) | Correction method for electron beam scanning position | |
JPH0515056B2 (enrdf_load_stackoverflow) | ||
JP2507566B2 (ja) | 電子ビ―ム測長方法および装置 | |
JPS61114116A (ja) | 寸法測長装置 | |
JP2786661B2 (ja) | 荷電ビーム描画方法 | |
JPH0282515A (ja) | 電子ビーム描画方法 | |
JPH0212379B2 (enrdf_load_stackoverflow) | ||
JPS5917531B2 (ja) | 電子ビ−ム露光装置 | |
JP3277746B2 (ja) | 電子線描画装置 |