JPS5522833A - Manufacturing of semiconductor device - Google Patents

Manufacturing of semiconductor device

Info

Publication number
JPS5522833A
JPS5522833A JP9533478A JP9533478A JPS5522833A JP S5522833 A JPS5522833 A JP S5522833A JP 9533478 A JP9533478 A JP 9533478A JP 9533478 A JP9533478 A JP 9533478A JP S5522833 A JPS5522833 A JP S5522833A
Authority
JP
Japan
Prior art keywords
pattern
photoregist
film
adhesion
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9533478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6366049B2 (enrdf_load_stackoverflow
Inventor
Kazuya Kikuchi
Tadanaka Yoneda
Kazufumi Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9533478A priority Critical patent/JPS5522833A/ja
Publication of JPS5522833A publication Critical patent/JPS5522833A/ja
Publication of JPS6366049B2 publication Critical patent/JPS6366049B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9533478A 1978-08-03 1978-08-03 Manufacturing of semiconductor device Granted JPS5522833A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9533478A JPS5522833A (en) 1978-08-03 1978-08-03 Manufacturing of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9533478A JPS5522833A (en) 1978-08-03 1978-08-03 Manufacturing of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5522833A true JPS5522833A (en) 1980-02-18
JPS6366049B2 JPS6366049B2 (enrdf_load_stackoverflow) 1988-12-19

Family

ID=14134807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9533478A Granted JPS5522833A (en) 1978-08-03 1978-08-03 Manufacturing of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5522833A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5884430A (ja) * 1981-11-14 1983-05-20 Daikin Ind Ltd レジスト膜の耐エツチング性増大方法
JPS63232330A (ja) * 1987-03-20 1988-09-28 Ushio Inc レジスト処理方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53110374A (en) * 1977-03-08 1978-09-27 Fujitsu Ltd Manufacture of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53110374A (en) * 1977-03-08 1978-09-27 Fujitsu Ltd Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5884430A (ja) * 1981-11-14 1983-05-20 Daikin Ind Ltd レジスト膜の耐エツチング性増大方法
JPS63232330A (ja) * 1987-03-20 1988-09-28 Ushio Inc レジスト処理方法

Also Published As

Publication number Publication date
JPS6366049B2 (enrdf_load_stackoverflow) 1988-12-19

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