JPS55161067A - Manufacturing apparatus of thin film - Google Patents

Manufacturing apparatus of thin film

Info

Publication number
JPS55161067A
JPS55161067A JP6895079A JP6895079A JPS55161067A JP S55161067 A JPS55161067 A JP S55161067A JP 6895079 A JP6895079 A JP 6895079A JP 6895079 A JP6895079 A JP 6895079A JP S55161067 A JPS55161067 A JP S55161067A
Authority
JP
Japan
Prior art keywords
thin film
vessel
reaction gas
sputtering
flowing amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6895079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6312938B2 (enrdf_load_stackoverflow
Inventor
Taiji Shimomoto
Susumu Miyagawa
Shigetoshi Hiratsuka
Yasuo Tanaka
Akio Kumada
Eiichi Maruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6895079A priority Critical patent/JPS55161067A/ja
Publication of JPS55161067A publication Critical patent/JPS55161067A/ja
Publication of JPS6312938B2 publication Critical patent/JPS6312938B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP6895079A 1979-06-04 1979-06-04 Manufacturing apparatus of thin film Granted JPS55161067A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6895079A JPS55161067A (en) 1979-06-04 1979-06-04 Manufacturing apparatus of thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6895079A JPS55161067A (en) 1979-06-04 1979-06-04 Manufacturing apparatus of thin film

Publications (2)

Publication Number Publication Date
JPS55161067A true JPS55161067A (en) 1980-12-15
JPS6312938B2 JPS6312938B2 (enrdf_load_stackoverflow) 1988-03-23

Family

ID=13388446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6895079A Granted JPS55161067A (en) 1979-06-04 1979-06-04 Manufacturing apparatus of thin film

Country Status (1)

Country Link
JP (1) JPS55161067A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5967619A (ja) * 1982-10-12 1984-04-17 Kokusai Electric Co Ltd 減圧容器を有する半導体製造装置の圧力制御装置
JPS59185776A (ja) * 1983-04-04 1984-10-22 ボ−グ・ワ−ナ−・コ−ポレ−シヨン 第４ｂ族金属の迅速反応性スパツタリング
JP2000026967A (ja) * 1998-04-16 2000-01-25 Boc Group Inc:The 反応性スパッタリング装置のカスケ―ド制御
JP2002275628A (ja) * 2001-03-21 2002-09-25 Sumitomo Bakelite Co Ltd スパッタリング成膜方法
JP2002322561A (ja) * 2001-04-25 2002-11-08 Sumitomo Bakelite Co Ltd スパッタリング成膜方法
JP2010199305A (ja) * 2009-02-25 2010-09-09 Mitsubishi Heavy Ind Ltd 光電変換装置の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006045611A (ja) * 2004-08-04 2006-02-16 Nippon Telegr & Teleph Corp <Ntt> スパッタ成膜装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5362788A (en) * 1976-11-15 1978-06-05 Commissariat Energie Atomique Method of controlling thin film deposit by active sputtering and active sputtering apparatus for carrying out said method
JPS54103790A (en) * 1978-02-01 1979-08-15 Nec Corp Sputtering apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5362788A (en) * 1976-11-15 1978-06-05 Commissariat Energie Atomique Method of controlling thin film deposit by active sputtering and active sputtering apparatus for carrying out said method
JPS54103790A (en) * 1978-02-01 1979-08-15 Nec Corp Sputtering apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5967619A (ja) * 1982-10-12 1984-04-17 Kokusai Electric Co Ltd 減圧容器を有する半導体製造装置の圧力制御装置
JPS59185776A (ja) * 1983-04-04 1984-10-22 ボ−グ・ワ−ナ−・コ−ポレ−シヨン 第４ｂ族金属の迅速反応性スパツタリング
JP2000026967A (ja) * 1998-04-16 2000-01-25 Boc Group Inc:The 反応性スパッタリング装置のカスケ―ド制御
JP2002275628A (ja) * 2001-03-21 2002-09-25 Sumitomo Bakelite Co Ltd スパッタリング成膜方法
JP2002322561A (ja) * 2001-04-25 2002-11-08 Sumitomo Bakelite Co Ltd スパッタリング成膜方法
JP2010199305A (ja) * 2009-02-25 2010-09-09 Mitsubishi Heavy Ind Ltd 光電変換装置の製造方法

Also Published As

Publication number Publication date
JPS6312938B2 (enrdf_load_stackoverflow) 1988-03-23

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