JPS55124270A - Junction type field effect transistor - Google Patents
Junction type field effect transistorInfo
- Publication number
- JPS55124270A JPS55124270A JP3279579A JP3279579A JPS55124270A JP S55124270 A JPS55124270 A JP S55124270A JP 3279579 A JP3279579 A JP 3279579A JP 3279579 A JP3279579 A JP 3279579A JP S55124270 A JPS55124270 A JP S55124270A
- Authority
- JP
- Japan
- Prior art keywords
- region
- island
- nitride film
- field effect
- effect transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005669 field effect Effects 0.000 title abstract 2
- 150000004767 nitrides Chemical class 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000012212 insulator Substances 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 229910021426 porous silicon Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
- H01L29/808—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a PN junction gate, e.g. PN homojunction gate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Local Oxidation Of Silicon (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To prevent the slack of a substrate and the deformation of an island in a junction type field effect transistor by utilizing a reactive gate region as porous openings to shorten the porosity forming time and reduce the thickness of nitride film. CONSTITUTION:An insulator 32 is formed by oxidizing porous silicon on an n-type silicon substrate 31 to form an island region 33, source S region 19 and drain D region 20 are elevationally symmetrically formed at the gate region 32 so that the region 23 is effectively operated while shaded region 24 is not operated. Accordingly, the region 23 becomes reactive gate region 24. The region 24 is perforated with openings simultaneously upon the nitride film of the isolating region and perforated in porous state simultaneously upon the isolating region in step of perforating the porosity. Since the perforation is simultaneously proceeded on both the surface of the region 38 and the surface of the region 24, it can shorten the perforating time and prevent the slack of the substrate and the deformation of the island by forming the nitride film of mask to approx. 1,000Angstrom .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3279579A JPS55124270A (en) | 1979-03-19 | 1979-03-19 | Junction type field effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3279579A JPS55124270A (en) | 1979-03-19 | 1979-03-19 | Junction type field effect transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55124270A true JPS55124270A (en) | 1980-09-25 |
JPS6214106B2 JPS6214106B2 (en) | 1987-03-31 |
Family
ID=12368776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3279579A Granted JPS55124270A (en) | 1979-03-19 | 1979-03-19 | Junction type field effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55124270A (en) |
-
1979
- 1979-03-19 JP JP3279579A patent/JPS55124270A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6214106B2 (en) | 1987-03-31 |
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