JPS55111144A - Manufacturing method of semiconductor device - Google Patents

Manufacturing method of semiconductor device

Info

Publication number
JPS55111144A
JPS55111144A JP1882179A JP1882179A JPS55111144A JP S55111144 A JPS55111144 A JP S55111144A JP 1882179 A JP1882179 A JP 1882179A JP 1882179 A JP1882179 A JP 1882179A JP S55111144 A JPS55111144 A JP S55111144A
Authority
JP
Japan
Prior art keywords
oxide film
film
region
pattern
nitride film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1882179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS628939B2 (en, 2012
Inventor
Kunio Aomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP1882179A priority Critical patent/JPS55111144A/ja
Publication of JPS55111144A publication Critical patent/JPS55111144A/ja
Publication of JPS628939B2 publication Critical patent/JPS628939B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
JP1882179A 1979-02-20 1979-02-20 Manufacturing method of semiconductor device Granted JPS55111144A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1882179A JPS55111144A (en) 1979-02-20 1979-02-20 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1882179A JPS55111144A (en) 1979-02-20 1979-02-20 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS55111144A true JPS55111144A (en) 1980-08-27
JPS628939B2 JPS628939B2 (en, 2012) 1987-02-25

Family

ID=11982220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1882179A Granted JPS55111144A (en) 1979-02-20 1979-02-20 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS55111144A (en, 2012)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5877241A (ja) * 1981-11-02 1983-05-10 Nec Corp 半導体集積回路装置
JPS60111466A (ja) * 1983-11-22 1985-06-17 Shindengen Electric Mfg Co Ltd 半導体装置の製造方法
JPH05159180A (ja) * 1991-12-09 1993-06-25 Hitachi Electron Service Co Ltd 分電盤内の配線保護方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS524433A (en) * 1975-06-30 1977-01-13 Matsushita Electric Works Ltd Composite plating method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS524433A (en) * 1975-06-30 1977-01-13 Matsushita Electric Works Ltd Composite plating method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5877241A (ja) * 1981-11-02 1983-05-10 Nec Corp 半導体集積回路装置
JPS60111466A (ja) * 1983-11-22 1985-06-17 Shindengen Electric Mfg Co Ltd 半導体装置の製造方法
JPH05159180A (ja) * 1991-12-09 1993-06-25 Hitachi Electron Service Co Ltd 分電盤内の配線保護方法

Also Published As

Publication number Publication date
JPS628939B2 (en, 2012) 1987-02-25

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