JPS55110246A - Production of photomask - Google Patents

Production of photomask

Info

Publication number
JPS55110246A
JPS55110246A JP1811979A JP1811979A JPS55110246A JP S55110246 A JPS55110246 A JP S55110246A JP 1811979 A JP1811979 A JP 1811979A JP 1811979 A JP1811979 A JP 1811979A JP S55110246 A JPS55110246 A JP S55110246A
Authority
JP
Japan
Prior art keywords
mask
plate
space
chucks
closely contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1811979A
Other languages
Japanese (ja)
Inventor
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1811979A priority Critical patent/JPS55110246A/en
Publication of JPS55110246A publication Critical patent/JPS55110246A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Abstract

PURPOSE:To closely contact a master mask and a blank plate for a working copy mask in a short time without containing air bubbles by fixing the mask and the plate at a specified space and closely contacting them from the center to the periphery in succession under reduced pressure. CONSTITUTION:On frame-like vacuum chuck c with blank plate or dry plate 1 fixed, frame-like vacuum chuck b with master mask 5 fixed is placed with mask 5 downward, leaving a space of about 20mum between mask 5 and plate 1. By evacuating the space from evacuation hole 13 mask 5 and plate 1 are curved owing to the difference in atmospheric pressure between space portion 16 and the outside of chucks b, c to closely contact mask 5 and plate 1 at the central portion. Fixation of the space between chucks b, c is then released gradually, and bellows 10 are squeezed owing to the difference in atmospheric pressure between the inside and outside of chucks b, c to closely contact mask 5 and plate 1.
JP1811979A 1979-02-19 1979-02-19 Production of photomask Pending JPS55110246A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1811979A JPS55110246A (en) 1979-02-19 1979-02-19 Production of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1811979A JPS55110246A (en) 1979-02-19 1979-02-19 Production of photomask

Publications (1)

Publication Number Publication Date
JPS55110246A true JPS55110246A (en) 1980-08-25

Family

ID=11962710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1811979A Pending JPS55110246A (en) 1979-02-19 1979-02-19 Production of photomask

Country Status (1)

Country Link
JP (1) JPS55110246A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6219855A (en) * 1985-07-19 1987-01-28 Hitachi Ltd Exposing device
JPS6381331A (en) * 1986-09-25 1988-04-12 Orc Mfg Co Ltd Holding method for mask film in exposing device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5222882A (en) * 1975-08-14 1977-02-21 Mitsubishi Electric Corp Vacuum tight printing unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5222882A (en) * 1975-08-14 1977-02-21 Mitsubishi Electric Corp Vacuum tight printing unit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6219855A (en) * 1985-07-19 1987-01-28 Hitachi Ltd Exposing device
JPS6381331A (en) * 1986-09-25 1988-04-12 Orc Mfg Co Ltd Holding method for mask film in exposing device

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