JPS6381331A - Holding method for mask film in exposing device - Google Patents

Holding method for mask film in exposing device

Info

Publication number
JPS6381331A
JPS6381331A JP61226687A JP22668786A JPS6381331A JP S6381331 A JPS6381331 A JP S6381331A JP 61226687 A JP61226687 A JP 61226687A JP 22668786 A JP22668786 A JP 22668786A JP S6381331 A JPS6381331 A JP S6381331A
Authority
JP
Japan
Prior art keywords
mask film
film
printing frame
frame
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61226687A
Other languages
Japanese (ja)
Inventor
Naoshi Kozu
神津 尚士
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Priority to JP61226687A priority Critical patent/JPS6381331A/en
Publication of JPS6381331A publication Critical patent/JPS6381331A/en
Pending legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prevent occurrence of positional deviation of a mask film by holding the mask film to a printing frame by means of charge attraction. CONSTITUTION:When positioning with a work is determined, DC voltage is applied to a mask film 4 closely contacted to circuit patterns 1a, 1b formed by ITO film of a printing frame 1 by a power source 2. Negative charge is charged on the surface of the pattern 1a of the ITO film by applied voltage, and plus charge is charged on the surface of the pattern 1b. As polyethylene terephtalate, a high dielectric, is used for the mask film 4, the surface of the mask film 4 is charged and attracted to the printing frame 1 by attraction between charge. Thus, positional deviation of the mask film does not occur, mask film of various size can be handled.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は露光装置の焼付枠にマスクフィルムを取付ける
方法に関し、特にマスクフィルムを帯電吸着させて保持
する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for attaching a mask film to a printing frame of an exposure apparatus, and more particularly to a method for holding a mask film by electrostatic attraction.

〔従来の技術〕[Conventional technology]

プリント基板等の製造工程において、生基板(ワーク)
に原稿画像を露光焼付する際、正確な露光を行うために
は原稿画像フィルム等をプリント基板等のワークに密着
させる必要がある。これは原稿原像フィルム(以下マス
クフィルムと記す)とワークの相互位置関係を精密に保
持することが、露光焼付において最も重要な管理点の1
つに挙げられるからであり、同様にマスクフィルムを焼
付枠に位置ズレなく堅固に密着保持させる必要がある。
In the manufacturing process of printed circuit boards, etc., raw boards (workpieces)
When exposing and printing an original image, it is necessary to bring the original image film or the like into close contact with a workpiece such as a printed circuit board in order to perform accurate exposure. Precisely maintaining the mutual positional relationship between the original original image film (hereinafter referred to as mask film) and the workpiece is one of the most important control points in exposure printing.
Similarly, it is necessary to firmly hold the mask film in close contact with the printing frame without shifting the position.

従来の露光焼付枠のマスクフィルム保持方法を示したも
のが第3図であり、以下図面を参照して説明する。図に
おいて露光焼付枠は下枠(台座)104と上枠101と
マスクフィルム102とワーク103と上枠101の周
縁に取着された真空形成用ゴム105と真空吸引口10
6.107から構成されている。上枠101には透明な
樹脂板やガラス板を用い、マスクフィルム102を真空
吸引口106から図示しない真空ポンプ等にて吸引して
、上枠101に吸着させる。真空吸引口106からは露
光に影響を与えない形状と位置に、吸引用細溝106a
、106b、106cが複数刻設されてマスクフィルム
102を上枠101に密着させている。その後下枠(台
座)104に搬送されたワーク103上に上枠101は
下降して密着し、真空吸引口107から吸引して、真空
形成用ゴム105に囲まれたワーク103とマスクフィ
ルム102をより堅固に密着させ、相互の位置関係を精
密に保持させるものであった。父上枠。
FIG. 3 shows a conventional method for holding a mask film in an exposure and printing frame, and will be described below with reference to the drawings. In the figure, the exposure and printing frame includes a lower frame (pedestal) 104, an upper frame 101, a mask film 102, a workpiece 103, a vacuum forming rubber 105 attached to the periphery of the upper frame 101, and a vacuum suction port 10.
6.107. A transparent resin plate or glass plate is used for the upper frame 101, and the mask film 102 is sucked into the upper frame 101 by suction from a vacuum suction port 106 using a vacuum pump (not shown) or the like. From the vacuum suction port 106, a narrow suction groove 106a is formed in a shape and position that does not affect exposure.
, 106b, and 106c are engraved to make the mask film 102 come into close contact with the upper frame 101. Thereafter, the upper frame 101 descends and comes into close contact with the workpiece 103 transferred to the lower frame (pedestal) 104, and suction is applied from the vacuum suction port 107 to remove the workpiece 103 surrounded by the vacuum forming rubber 105 and the mask film 102. This was to allow them to adhere more tightly and maintain their mutual positional relationship precisely. Father frame.

下枠両面を同時に露光する両面露光装置においても、上
記と同様に下枠へのマスクフィルムの取付保持が行われ
ていた。
Even in a double-sided exposure device that exposes both sides of the lower frame simultaneously, the mask film is attached and held to the lower frame in the same manner as described above.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記従来の技術によるマスクフィルムの焼付枠への取付
保持方法は真空吸着という機構的手段を用いたものであ
り、改善すべき問題点が明らかにされていた。
The method of attaching and holding the mask film to the printing frame according to the above-mentioned conventional technique uses a mechanical means called vacuum suction, and problems that need to be improved have been identified.

その第1には真空ポンプ等によってマスクフィルムの真
空吸着を行っているため、焼付枠の上枠。
Firstly, since the mask film is vacuum-adsorbed using a vacuum pump, etc., the upper frame of the printing frame is damaged.

下枠間を真空に吸引してマスクフィルムとワークの間を
堅固に密着させるメイン真空吸引時に、上記上枠でのマ
スクフィルムの真空吸着とのバランスが崩れてマスクフ
ィルムがズレる虞れが生じることと、第2にはマスクフ
ィルムの形状寸法に対応した焼付枠を用いなくては、該
マスクフィルムの良好な真空吸着を保持することが困難
で、マスクフィルムのサイズに合わせた焼付枠を何種類
も作成し、マスクフィルムを交換する毎に焼付枠も交換
しなければならなかった。第3には露光に影響を与えな
い形状と位置にマスクフィルム吸着用の真空吸引用細溝
を刻設する加工が必要で、余分な工数がかかっていた。
During the main vacuum suction, which creates a vacuum between the lower frames to firmly adhere the mask film and the workpiece, there is a risk that the balance with the vacuum suction of the mask film on the upper frame may be lost, causing the mask film to shift. Second, it is difficult to maintain good vacuum suction of the mask film unless you use a printing frame that corresponds to the shape and dimensions of the mask film. The printing frame had to be replaced every time the mask film was replaced. Thirdly, it was necessary to carve thin grooves for vacuum suction for adsorbing the mask film in a shape and position that would not affect exposure, which required extra man-hours.

本発明は上記問題点を解決するために創出されたもので
あり、マスクフィルムの位置ズレが生じる虞れがなく、
種々のサイズのマスクフィルムに対応可能に汎用性があ
り、操作性に優れたマスクフィルム保持方法を提供する
ことを目的とする。
The present invention was created to solve the above problems, and there is no risk of misalignment of the mask film.
It is an object of the present invention to provide a method for holding a mask film that is versatile enough to support mask films of various sizes and has excellent operability.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点を解決するための具体的手段としては、露光
装置の焼付枠となる透光可能な板に透明導電薄膜による
回路パターンを作成して、電圧を印加しマスクフィルム
を帯電吸着させるマスクフィルムの保持方法を用いるこ
とである。
A specific means to solve the above problem is to create a circuit pattern using a transparent conductive thin film on a translucent plate that serves as the printing frame of the exposure device, and then apply a voltage to the mask film to charge and attract the mask film. The method of retention is as follows.

〔作用〕[Effect]

上記のマスクフィルム保持方法を用いることにより、露
光装置の焼付枠となる透光可能な板に作成した導電性の
透明薄膜による回路パターンに電圧を印加する。回路パ
ターンは電圧を加えた時帯電し、厚さの薄い軽量のマス
クフィルムは焼付枠の板に帯電吸着して保持される。
By using the above-described mask film holding method, a voltage is applied to a circuit pattern made of a conductive transparent thin film formed on a translucent plate that serves as a printing frame of an exposure device. The circuit pattern becomes electrically charged when a voltage is applied, and the thin, lightweight mask film is held by the electrically charged adsorption on the printing frame plate.

〔発明の実施例〕[Embodiments of the invention]

以下本発明の一実施例について図面を参照して詳細に説
明する。
An embodiment of the present invention will be described in detail below with reference to the drawings.

第1図は実施例の構成要部を示した構成図で、第2図は
第1図のA−A線方向の断面図を示したものである。
FIG. 1 is a configuration diagram showing the main components of the embodiment, and FIG. 2 is a sectional view taken along the line A--A in FIG. 1.

第1図において焼付枠1は透明なガラス板あるいはアク
リル樹脂板で構成している。焼付枠1は種々の寸法のマ
スクフィルムに汎用的に用いるためにも、強度並びに表
面平滑度を保てる範囲であるならば寸法は大きくとるの
が好適である。焼付枠1には透明導電薄膜によって回路
パターン1a+1bがプリント形成されている。
In FIG. 1, a printing frame 1 is made of a transparent glass plate or an acrylic resin plate. Since the printing frame 1 can be used for general purpose mask films of various sizes, it is preferable that the size of the printing frame 1 is large as long as the strength and surface smoothness can be maintained. A circuit pattern 1a+1b is printed on the printing frame 1 using a transparent conductive thin film.

透明導電薄膜のプリント形成について説明する。Print formation of a transparent conductive thin film will be explained.

透明導電薄膜は透明導電性物質から成っている。The transparent conductive thin film is made of a transparent conductive material.

透明導電性物質は可視光近傍の光を吸収せず透過させる
特性を有するもので、電気に対して良導体であり、酸化
インジウム、スズ酸化カドミウム等を代表的なものとす
る半導体から構成される。本実施例における透明導電薄
膜には酸化インジウム薄膜(以下ITO膜と記す)を用
いている。
Transparent conductive materials have the property of not absorbing but transmitting light in the vicinity of visible light, are good conductors of electricity, and are composed of semiconductors, typical examples of which include indium oxide and tin cadmium oxide. In this embodiment, an indium oxide thin film (hereinafter referred to as an ITO film) is used as the transparent conductive thin film.

ITO膜によって回路パターン1aと回路パターン1b
は、夫々数ミリ幅の櫛の歯状に形成され、相互に楔状に
組合わされ、回路パターン1aと回路パターン1bの間
隔は、均一で保止な寸法に設定される。該回路パターン
la、lbを形成するITO膜は厚さが数百人〜数μm
の極めて薄い塗膜であり、必要とされる光の透過には影
響を与えない厚さに設計されている。
Circuit pattern 1a and circuit pattern 1b are formed by ITO film.
The circuit patterns 1a and 1b are each formed in the shape of a comb tooth with a width of several millimeters and are combined with each other in a wedge shape, and the distance between the circuit patterns 1a and 1b is set to a uniform and constant dimension. The ITO film forming the circuit patterns la and lb has a thickness of several hundred to several μm.
It is an extremely thin coating, designed to have a thickness that does not affect the required light transmission.

ITO膜で形成する回路パターン1aと回路パターン1
bの間には電源2によって直流または交流の電圧が印加
され、印加電圧は調整器3によって制御される。本実施
例では調整器3には可変抵抗器を用いている。
Circuit pattern 1a and circuit pattern 1 formed with ITO film
A DC or AC voltage is applied by a power supply 2 between the voltages 1 and 2b, and the applied voltage is controlled by a regulator 3. In this embodiment, a variable resistor is used as the regulator 3.

以上のように構成された第1図の焼付枠1にマスクフィ
ルム4を取付ける。焼付枠1にマスクフィルム4が吸着
された状態を示した断面図が第2図である。焼付枠1の
ITO膜で形成した回路パターンla、lbに密着され
たマスクフィルム4は、ワークとの位置合わせが決定さ
れると、電源2により直流電圧が印加される。印加電圧
によりITO膜のパターン1aにはマイナス電荷がパタ
ーン表面に帯電し、パターン1bの表面にはプラス電荷
が帯電する。マスクフィルム4には高誘電体であるポリ
エチレンテレフタレートが採用されているので、マスク
フィルム4の表面は上記電荷に帯電されて、電荷間の吸
引力により焼付枠1に吸着される。
A mask film 4 is attached to the printing frame 1 of FIG. 1 constructed as described above. FIG. 2 is a sectional view showing a state in which the mask film 4 is attracted to the printing frame 1. When the alignment with the workpiece is determined, a DC voltage is applied to the mask film 4 closely attached to the circuit patterns la and lb formed of the ITO film of the printing frame 1 by the power source 2. Due to the applied voltage, a negative charge is charged on the surface of the pattern 1a of the ITO film, and a positive charge is charged on the surface of the pattern 1b. Since the mask film 4 is made of polyethylene terephthalate, which is a high dielectric material, the surface of the mask film 4 is charged with the above-mentioned charges, and is attracted to the printing frame 1 by the attractive force between the charges.

該マスクフィルム4は軽量で柔軟性を有しているので、
焼付枠1のパターン面1a、lbに堅固に密着する。そ
して焼付枠1を構成するガラス板やアクリル樹脂板には
真空吸引用の細溝等の加工がされていないため、表面の
平滑度が良いので常圧のもとにおいてもマスクフィルム
4の吸着面にエアの残留や浸入は生じない。
Since the mask film 4 is lightweight and flexible,
It firmly adheres to the pattern surfaces 1a and lb of the printing frame 1. Since the glass plate and acrylic resin plate that make up the printing frame 1 are not processed with thin grooves for vacuum suction, the surface is smooth and the mask film 4 can be attracted to the suction surface even under normal pressure. No residual air or infiltration occurs.

本発明は上記実施例に限定されるものではなく、実施に
あたっては種々の態様をとるものである。
The present invention is not limited to the above-described embodiments, but may take various forms when implemented.

例えば、ITO膜による回路パターンla、lbの形成
で、露光焼付に必要な光の透過にバラツキの変化が生じ
る時は、ITO膜の回路パターン1a、lbの間にIT
O膜と同等の光透過率の透過性絶縁膜を形成して、焼付
枠の光の透過を等しくするように構成しても良り。本実
施例では片面露光の場合の焼付枠へのマスクフィルム保
持方法について述べたが、両面露光の場合も同様に実施
されることは当然である。
For example, when forming circuit patterns la and lb using an ITO film, if variations occur in the transmission of light necessary for exposure and printing, it is necessary to
A structure may be adopted in which a transparent insulating film having the same light transmittance as the O film is formed to equalize light transmission through the printing frame. In this embodiment, the method of holding the mask film on the printing frame in the case of single-sided exposure has been described, but it goes without saying that the same method can be used in the case of double-sided exposure.

〔発明の効果〕〔Effect of the invention〕

以上に説明したように本発明によれば、マスクフィルム
を帯電吸着によって焼付枠に保持するので、マスクフィ
ルムは焼付枠に数ミリ幅で多数形成した透明導電薄膜の
回路パターンに堅固に密着して、ワークとマスクフィル
ムの密着を図るメイン真空吸気を行っても、マスクフィ
ルムが焼付枠  ゛に確実に保持されて、従来の方法に
よるマスクフィルムの位置ズレから生じる露光不良を減
じる大きな効果を生じる。そして焼付枠の大きさを適宜
に設計しておけば、多くの寸法種類のマスクフィルムに
汎用できて、用意する焼付枠の数を減じることができる
と共に、真空吸着では必要であった焼付枠へ吸気用の溝
等の加工が不要となる。又帯電吸着の吸着力は印加電圧
を変えることにより容易に調整可能であるから、可変抵
抗器の簡単な操作により吸着力を種々の露光条件に合わ
せて調節できる効果を生じる。
As explained above, according to the present invention, the mask film is held on the printing frame by electrostatic adsorption, so that the mask film firmly adheres to the circuit patterns of the transparent conductive thin film formed in large numbers several millimeters wide on the printing frame. Even when the main vacuum suction is performed to bring the workpiece and the mask film into close contact, the mask film is reliably held in the printing frame, which has the great effect of reducing exposure defects caused by misalignment of the mask film in the conventional method. If the size of the printing frame is designed appropriately, it can be used for mask films of many sizes, reducing the number of printing frames to be prepared, and reducing the size of the printing frame that was necessary with vacuum suction. No machining of intake grooves, etc. is required. Furthermore, since the attraction force of charge attraction can be easily adjusted by changing the applied voltage, the attraction force can be adjusted to suit various exposure conditions by simple operation of the variable resistor.

以上の効果により汎用性に優れ、マスクフィルムの保持
力の強いマスクフィルム保持方法が提供される。
Due to the above effects, a method for holding a mask film is provided which is excellent in versatility and has a strong mask film holding power.

【図面の簡単な説明】 第1図は本発明の実施例の焼付枠要部構成図で、第2図
は第1図のA−A線断面図であり、第3図は従来技術に
よる焼付枠要部図である。図中に符した番号は以下のも
のを示す。 1・・・焼付枠      1a、 lb・・・透明導
電薄膜2・・・電源       3・・・調整器4・
・・マスクフィルム 第1図 第2図 10 1t)4
[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a configuration diagram of the main parts of a printing frame according to an embodiment of the present invention, FIG. 2 is a cross-sectional view taken along the line A-A in FIG. It is a diagram of the main parts of the frame. The numbers in the figure indicate the following. 1...Printing frame 1a, lb...Transparent conductive thin film 2...Power supply 3...Adjuster 4.
...Mask film Fig. 1 Fig. 2 10 1t) 4

Claims (1)

【特許請求の範囲】[Claims] 露光装置の焼付枠となる透光可能な板に透明導電薄膜に
よる回路パターンを作成して、電圧を印加しマスクフィ
ルムを帯電吸着させることを特徴とする露光装置におけ
るマスクフィルム保持方法。
1. A method for holding a mask film in an exposure apparatus, which comprises creating a circuit pattern using a transparent conductive thin film on a light-transmissible plate serving as a printing frame of the exposure apparatus, and applying a voltage to the mask film to cause the mask film to be charged and attracted.
JP61226687A 1986-09-25 1986-09-25 Holding method for mask film in exposing device Pending JPS6381331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61226687A JPS6381331A (en) 1986-09-25 1986-09-25 Holding method for mask film in exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61226687A JPS6381331A (en) 1986-09-25 1986-09-25 Holding method for mask film in exposing device

Publications (1)

Publication Number Publication Date
JPS6381331A true JPS6381331A (en) 1988-04-12

Family

ID=16849080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61226687A Pending JPS6381331A (en) 1986-09-25 1986-09-25 Holding method for mask film in exposing device

Country Status (1)

Country Link
JP (1) JPS6381331A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007178557A (en) * 2005-12-27 2007-07-12 Orc Mfg Co Ltd Exposure apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5328426U (en) * 1976-08-18 1978-03-10
JPS55110246A (en) * 1979-02-19 1980-08-25 Fujitsu Ltd Production of photomask
JPS60201332A (en) * 1984-03-26 1985-10-11 Hiroshi Shimizu Original platen of copying machine
JPS6113849B2 (en) * 1983-02-10 1986-04-16 Hisamoto Suzuki
JPS62173992A (en) * 1986-01-28 1987-07-30 Taihei Kagaku Seihin Kk Electrostatic attraction device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5328426U (en) * 1976-08-18 1978-03-10
JPS55110246A (en) * 1979-02-19 1980-08-25 Fujitsu Ltd Production of photomask
JPS6113849B2 (en) * 1983-02-10 1986-04-16 Hisamoto Suzuki
JPS60201332A (en) * 1984-03-26 1985-10-11 Hiroshi Shimizu Original platen of copying machine
JPS62173992A (en) * 1986-01-28 1987-07-30 Taihei Kagaku Seihin Kk Electrostatic attraction device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007178557A (en) * 2005-12-27 2007-07-12 Orc Mfg Co Ltd Exposure apparatus
JP4621136B2 (en) * 2005-12-27 2011-01-26 株式会社オーク製作所 Exposure equipment

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