JPS55105349A - Integrated-circuit device - Google Patents
Integrated-circuit deviceInfo
- Publication number
- JPS55105349A JPS55105349A JP698980A JP698980A JPS55105349A JP S55105349 A JPS55105349 A JP S55105349A JP 698980 A JP698980 A JP 698980A JP 698980 A JP698980 A JP 698980A JP S55105349 A JPS55105349 A JP S55105349A
- Authority
- JP
- Japan
- Prior art keywords
- region
- film
- layer
- layers
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: To prevent the lateral expansion of a region and to eliminate the misalignment of wiring layers to be provided on the region, by reducing the film of a region, wherein diffusion or ion implantation is made, among the insulating films deposited on a semiconductor substrate.
CONSTITUTION: An SiO2 film 22 is deposited on a semiconductor substrate 21. The region wherein a diffused layer is formed is etched to form a thin film 221 and the thickness of the other region is remained as a thick film 222. Then, in order to form a diffusing layer 24 for connection which will become the underlay for polycrystalline Si layers 26 and 27, which will be formed later, a mask 23 of a resist film having a specified hole is provided, and the layer 24 is formed by diffusion. In this way, the layer 24 does not expand in the lateral direction. Thereafter, the mask 23 is removed, the polycrystalline layers 26 and 27 which are to become wiring layers are grown, and a source region 28, a drain region 29, and a wiring region 30 are formed by ion implantation. Then, all the surface is covered by an SiO2 film 31 which is stacked on the films 221 and 222, a window 32 is opened, and Al electrode 33 is attached.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP698980A JPS55105349A (en) | 1980-01-25 | 1980-01-25 | Integrated-circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP698980A JPS55105349A (en) | 1980-01-25 | 1980-01-25 | Integrated-circuit device |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9808273A Division JPS5525502B2 (en) | 1973-08-31 | 1973-08-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55105349A true JPS55105349A (en) | 1980-08-12 |
Family
ID=11653548
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP698980A Pending JPS55105349A (en) | 1980-01-25 | 1980-01-25 | Integrated-circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55105349A (en) |
-
1980
- 1980-01-25 JP JP698980A patent/JPS55105349A/en active Pending
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