JPS5492527A - Manufacture of metal foil having apertures - Google Patents
Manufacture of metal foil having aperturesInfo
- Publication number
- JPS5492527A JPS5492527A JP16063877A JP16063877A JPS5492527A JP S5492527 A JPS5492527 A JP S5492527A JP 16063877 A JP16063877 A JP 16063877A JP 16063877 A JP16063877 A JP 16063877A JP S5492527 A JPS5492527 A JP S5492527A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- pattern
- metal foil
- layer
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 title abstract 5
- 239000011888 foil Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 5
- 239000011347 resin Substances 0.000 abstract 4
- 229920005989 resin Polymers 0.000 abstract 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 abstract 3
- 239000002904 solvent Substances 0.000 abstract 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 abstract 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 abstract 1
- 238000004090 dissolution Methods 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract 1
- 239000004926 polymethyl methacrylate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0005—Separation of the coating from the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16063877A JPS5492527A (en) | 1977-12-28 | 1977-12-28 | Manufacture of metal foil having apertures |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16063877A JPS5492527A (en) | 1977-12-28 | 1977-12-28 | Manufacture of metal foil having apertures |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5492527A true JPS5492527A (en) | 1979-07-21 |
JPS6156317B2 JPS6156317B2 (enrdf_load_stackoverflow) | 1986-12-02 |
Family
ID=15719249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16063877A Granted JPS5492527A (en) | 1977-12-28 | 1977-12-28 | Manufacture of metal foil having apertures |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5492527A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61124600A (ja) * | 1984-11-21 | 1986-06-12 | Hitachi Cable Ltd | フレ−ムパタ−ンの形成方法 |
JPH0660804A (ja) * | 1992-04-14 | 1994-03-04 | Micron Technol Inc | 自己整合高エネルギー融蝕により製造される電界放出ディスプレイ用スペーサー |
JP2005340138A (ja) * | 2004-05-31 | 2005-12-08 | Canon Inc | マスク構造体及びその製造方法 |
WO2013058289A1 (ja) * | 2011-10-17 | 2013-04-25 | 株式会社 ベアック | 孔開き金属箔の製造方法 |
-
1977
- 1977-12-28 JP JP16063877A patent/JPS5492527A/ja active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61124600A (ja) * | 1984-11-21 | 1986-06-12 | Hitachi Cable Ltd | フレ−ムパタ−ンの形成方法 |
JPH0660804A (ja) * | 1992-04-14 | 1994-03-04 | Micron Technol Inc | 自己整合高エネルギー融蝕により製造される電界放出ディスプレイ用スペーサー |
JP2005340138A (ja) * | 2004-05-31 | 2005-12-08 | Canon Inc | マスク構造体及びその製造方法 |
WO2013058289A1 (ja) * | 2011-10-17 | 2013-04-25 | 株式会社 ベアック | 孔開き金属箔の製造方法 |
WO2013057772A1 (ja) * | 2011-10-17 | 2013-04-25 | 株式会社 ベアック | 孔開き金属箔の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6156317B2 (enrdf_load_stackoverflow) | 1986-12-02 |
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