JPS5491182A - Dry etching control - Google Patents
Dry etching controlInfo
- Publication number
- JPS5491182A JPS5491182A JP16069577A JP16069577A JPS5491182A JP S5491182 A JPS5491182 A JP S5491182A JP 16069577 A JP16069577 A JP 16069577A JP 16069577 A JP16069577 A JP 16069577A JP S5491182 A JPS5491182 A JP S5491182A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- wafer
- resistor
- dry
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16069577A JPS5491182A (en) | 1977-12-28 | 1977-12-28 | Dry etching control |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16069577A JPS5491182A (en) | 1977-12-28 | 1977-12-28 | Dry etching control |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5491182A true JPS5491182A (en) | 1979-07-19 |
Family
ID=15720459
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16069577A Pending JPS5491182A (en) | 1977-12-28 | 1977-12-28 | Dry etching control |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5491182A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5713745A (en) * | 1980-06-30 | 1982-01-23 | Fujitsu Ltd | Detecting method for ion etching finishing point |
CN109974763A (zh) * | 2017-12-27 | 2019-07-05 | 泰科电子(上海)有限公司 | 校准系统和校准方法 |
JP2020136332A (ja) * | 2019-02-14 | 2020-08-31 | 株式会社ディスコ | エッチング方法 |
-
1977
- 1977-12-28 JP JP16069577A patent/JPS5491182A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5713745A (en) * | 1980-06-30 | 1982-01-23 | Fujitsu Ltd | Detecting method for ion etching finishing point |
CN109974763A (zh) * | 2017-12-27 | 2019-07-05 | 泰科电子(上海)有限公司 | 校准系统和校准方法 |
JP2020136332A (ja) * | 2019-02-14 | 2020-08-31 | 株式会社ディスコ | エッチング方法 |
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