JPS53116069A - Measuring method for amount of ion injection - Google Patents

Measuring method for amount of ion injection

Info

Publication number
JPS53116069A
JPS53116069A JP3098177A JP3098177A JPS53116069A JP S53116069 A JPS53116069 A JP S53116069A JP 3098177 A JP3098177 A JP 3098177A JP 3098177 A JP3098177 A JP 3098177A JP S53116069 A JPS53116069 A JP S53116069A
Authority
JP
Japan
Prior art keywords
ion injection
amount
measuring method
conductive type
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3098177A
Other languages
Japanese (ja)
Other versions
JPS5910051B2 (en
Inventor
Masakatsu Yoshida
Yoshihiko Kuchio
Atsutomo Toi
Tsukasa Sawaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP3098177A priority Critical patent/JPS5910051B2/en
Publication of JPS53116069A publication Critical patent/JPS53116069A/en
Publication of JPS5910051B2 publication Critical patent/JPS5910051B2/en
Expired legal-status Critical Current

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: To measure the amount of ion injection, from the difference of the resistance value of the semiconductor layer of a conductive type from before and after of ion injection of other conductive type.
COPYRIGHT: (C)1978,JPO&Japio
JP3098177A 1977-03-18 1977-03-18 How to measure ion implantation amount Expired JPS5910051B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3098177A JPS5910051B2 (en) 1977-03-18 1977-03-18 How to measure ion implantation amount

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3098177A JPS5910051B2 (en) 1977-03-18 1977-03-18 How to measure ion implantation amount

Publications (2)

Publication Number Publication Date
JPS53116069A true JPS53116069A (en) 1978-10-11
JPS5910051B2 JPS5910051B2 (en) 1984-03-06

Family

ID=12318809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3098177A Expired JPS5910051B2 (en) 1977-03-18 1977-03-18 How to measure ion implantation amount

Country Status (1)

Country Link
JP (1) JPS5910051B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60100447A (en) * 1983-11-05 1985-06-04 Rohm Co Ltd Measuring method of low density ion implanted amount

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104347441B (en) * 2013-07-26 2018-01-19 和舰科技(苏州)有限公司 The monitoring method of ion implanting

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60100447A (en) * 1983-11-05 1985-06-04 Rohm Co Ltd Measuring method of low density ion implanted amount

Also Published As

Publication number Publication date
JPS5910051B2 (en) 1984-03-06

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