JPS5486968A - Washing - Google Patents
WashingInfo
- Publication number
- JPS5486968A JPS5486968A JP15445877A JP15445877A JPS5486968A JP S5486968 A JPS5486968 A JP S5486968A JP 15445877 A JP15445877 A JP 15445877A JP 15445877 A JP15445877 A JP 15445877A JP S5486968 A JPS5486968 A JP S5486968A
- Authority
- JP
- Japan
- Prior art keywords
- tube
- gas
- reaction
- silicon
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning In General (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To cleanly wash an appliance or implement made of silicon or silicon compound without removing parts.
CONSTITUTION: Gas of fluoride such as CF, CF4, C3F3, etc. is caused to flow through a reaction tube 10. A high-frequency electric field is produced between electrodes 14, 16 by a power source 18. The gas in the tube 10 is excited by plasma to cause etching reaction. Harmful pollutants adhering to the inside surfaces of an outer tube 10A or an inner tube 10b or to the surface of a wafer holder 12 are removed by the etching in an ash making treatment and then conveyed out of the tube 10 by the gas.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15445877A JPS5486968A (en) | 1977-12-23 | 1977-12-23 | Washing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15445877A JPS5486968A (en) | 1977-12-23 | 1977-12-23 | Washing |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5486968A true JPS5486968A (en) | 1979-07-10 |
Family
ID=15584662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15445877A Pending JPS5486968A (en) | 1977-12-23 | 1977-12-23 | Washing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5486968A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56125840A (en) * | 1980-03-07 | 1981-10-02 | Fujitsu Ltd | Cleaning method of dry etching device |
JPS5821826A (en) * | 1981-07-31 | 1983-02-08 | Seiko Epson Corp | Apparatus for manufacturing semiconductor |
JPS6394635A (en) * | 1986-10-09 | 1988-04-25 | Furendotetsuku Kenkyusho:Kk | Device for manufacturing semiconductor |
JPS63156533A (en) * | 1986-09-12 | 1988-06-29 | ベンジン・テクノロジーズ・インコーポレーテツド | Chamber-site washing method and device |
-
1977
- 1977-12-23 JP JP15445877A patent/JPS5486968A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56125840A (en) * | 1980-03-07 | 1981-10-02 | Fujitsu Ltd | Cleaning method of dry etching device |
JPS5821826A (en) * | 1981-07-31 | 1983-02-08 | Seiko Epson Corp | Apparatus for manufacturing semiconductor |
JPS6359533B2 (en) * | 1981-07-31 | 1988-11-21 | ||
JPS63156533A (en) * | 1986-09-12 | 1988-06-29 | ベンジン・テクノロジーズ・インコーポレーテツド | Chamber-site washing method and device |
JPS6394635A (en) * | 1986-10-09 | 1988-04-25 | Furendotetsuku Kenkyusho:Kk | Device for manufacturing semiconductor |
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