JPS5799333A - Micro wave plasma treatment method - Google Patents
Micro wave plasma treatment methodInfo
- Publication number
- JPS5799333A JPS5799333A JP17267980A JP17267980A JPS5799333A JP S5799333 A JPS5799333 A JP S5799333A JP 17267980 A JP17267980 A JP 17267980A JP 17267980 A JP17267980 A JP 17267980A JP S5799333 A JPS5799333 A JP S5799333A
- Authority
- JP
- Japan
- Prior art keywords
- plasma gas
- micro wave
- test sample
- wave plasma
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To prevent the deposition of solid impurity particles accompanying a plasma gas on the surface of a test sample by directing the flow of the plasma gas introduced from the lower part of the test sample toward the upper part of the test sample.
CONSTITUTION: A micro wave plasma gas introduced into a plasma-generating chamber 2 is sent through a flow path 4 into a plasma reaction chamber 3 and flowed from below toward above a test sample 5 in order to etch the sample 5. Thus, the deposition of solid impurity particles, e.g., silicone oxide, etc., accompanying the plasma gas on the upside of the sample 5 can be prevented. The micro wave plasma gas used is CF4 gas of 0.5 Torr, excited by a frequency of 2.45GHz and an output of 1kW, for example.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17267980A JPS5943217B2 (en) | 1980-12-09 | 1980-12-09 | Microwave plasma treatment method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17267980A JPS5943217B2 (en) | 1980-12-09 | 1980-12-09 | Microwave plasma treatment method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5799333A true JPS5799333A (en) | 1982-06-21 |
JPS5943217B2 JPS5943217B2 (en) | 1984-10-20 |
Family
ID=15946349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17267980A Expired JPS5943217B2 (en) | 1980-12-09 | 1980-12-09 | Microwave plasma treatment method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5943217B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0138679Y2 (en) * | 1985-04-05 | 1989-11-20 |
-
1980
- 1980-12-09 JP JP17267980A patent/JPS5943217B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5943217B2 (en) | 1984-10-20 |
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