JPS5472975A - Mask inspecting method - Google Patents
Mask inspecting methodInfo
- Publication number
- JPS5472975A JPS5472975A JP13999277A JP13999277A JPS5472975A JP S5472975 A JPS5472975 A JP S5472975A JP 13999277 A JP13999277 A JP 13999277A JP 13999277 A JP13999277 A JP 13999277A JP S5472975 A JPS5472975 A JP S5472975A
- Authority
- JP
- Japan
- Prior art keywords
- defect
- pattern
- mask
- pattern generator
- generating part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13999277A JPS5472975A (en) | 1977-11-24 | 1977-11-24 | Mask inspecting method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13999277A JPS5472975A (en) | 1977-11-24 | 1977-11-24 | Mask inspecting method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5472975A true JPS5472975A (en) | 1979-06-11 |
Family
ID=15258407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13999277A Pending JPS5472975A (en) | 1977-11-24 | 1977-11-24 | Mask inspecting method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5472975A (ja) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5654038A (en) * | 1979-10-08 | 1981-05-13 | Toshiba Corp | Checking device for shape of photomask |
JPS57188823A (en) * | 1981-05-15 | 1982-11-19 | Nippon Kogaku Kk <Nikon> | Inspecting device for pattern |
JPS57196530A (en) * | 1981-05-28 | 1982-12-02 | Fujitsu Ltd | Inspection of pattern |
JPS57206025A (en) * | 1981-06-01 | 1982-12-17 | Fujitsu Ltd | Pattern inspecting system |
JPS5827323A (ja) * | 1981-08-12 | 1983-02-18 | Hitachi Ltd | マスク検査方法および装置 |
JPS58158922A (ja) * | 1982-03-16 | 1983-09-21 | Dainippon Printing Co Ltd | 規則性パタ−ンの共通欠陥検出方法 |
JPS58158923A (ja) * | 1982-03-16 | 1983-09-21 | Dainippon Printing Co Ltd | 規則性パタ−ンの共通欠陥検出方法 |
JPS60103616A (ja) * | 1983-11-11 | 1985-06-07 | Hitachi Tokyo Electronics Co Ltd | 欠陥検査方法および装置 |
JPS60126828A (ja) * | 1983-12-14 | 1985-07-06 | Nippon Jido Seigyo Kk | パタ−ンの欠陥検査装置に用いるデ−タ処理方法 |
JPS60253222A (ja) * | 1984-05-30 | 1985-12-13 | Hitachi Ltd | 欠陥検査方法 |
JPS6122624A (ja) * | 1984-07-11 | 1986-01-31 | Hitachi Ltd | 外観検査装置 |
-
1977
- 1977-11-24 JP JP13999277A patent/JPS5472975A/ja active Pending
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5654038A (en) * | 1979-10-08 | 1981-05-13 | Toshiba Corp | Checking device for shape of photomask |
JPS57188823A (en) * | 1981-05-15 | 1982-11-19 | Nippon Kogaku Kk <Nikon> | Inspecting device for pattern |
JPH02853B2 (ja) * | 1981-05-15 | 1990-01-09 | Nippon Kogaku Kk | |
JPS6239811B2 (ja) * | 1981-05-28 | 1987-08-25 | Fujitsu Ltd | |
JPS57196530A (en) * | 1981-05-28 | 1982-12-02 | Fujitsu Ltd | Inspection of pattern |
JPS57206025A (en) * | 1981-06-01 | 1982-12-17 | Fujitsu Ltd | Pattern inspecting system |
JPS5827323A (ja) * | 1981-08-12 | 1983-02-18 | Hitachi Ltd | マスク検査方法および装置 |
JPH0115001B2 (ja) * | 1982-03-16 | 1989-03-15 | Dainippon Printing Co Ltd | |
JPS58158923A (ja) * | 1982-03-16 | 1983-09-21 | Dainippon Printing Co Ltd | 規則性パタ−ンの共通欠陥検出方法 |
JPS58158922A (ja) * | 1982-03-16 | 1983-09-21 | Dainippon Printing Co Ltd | 規則性パタ−ンの共通欠陥検出方法 |
JPS60103616A (ja) * | 1983-11-11 | 1985-06-07 | Hitachi Tokyo Electronics Co Ltd | 欠陥検査方法および装置 |
JPH056177B2 (ja) * | 1983-11-11 | 1993-01-26 | Hitachi Tokyo Erekutoronikusu Kk | |
JPS60126828A (ja) * | 1983-12-14 | 1985-07-06 | Nippon Jido Seigyo Kk | パタ−ンの欠陥検査装置に用いるデ−タ処理方法 |
JPS60253222A (ja) * | 1984-05-30 | 1985-12-13 | Hitachi Ltd | 欠陥検査方法 |
JPH0516585B2 (ja) * | 1984-05-30 | 1993-03-04 | Hitachi Ltd | |
JPS6122624A (ja) * | 1984-07-11 | 1986-01-31 | Hitachi Ltd | 外観検査装置 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5472975A (en) | Mask inspecting method | |
JPS5332759A (en) | Precision coordinate position detection and position control unit by composite diffration grating method | |
JPS52144895A (en) | Control method for cam machining apparatus | |
JPS52127224A (en) | Electronicmusical instrument | |
JPS54935A (en) | Pattern detector | |
JPS5322370A (en) | Inspecting method of semiconductor device | |
JPS51147260A (en) | Inspecting method of resist pattern | |
JPS5333530A (en) | Decision method for bar code pattern | |
JPS5215359A (en) | Method and equipment to insepct surface condition of objects | |
JPS5365668A (en) | Electron beam exposure device | |
JPS52104286A (en) | Eddy current inspection method | |
JPS5322993A (en) | Method of analysis for irradiated fuel | |
JPS52137984A (en) | Drawing apparatus | |
JPS55151207A (en) | Detecting method for reference mark position by electron beam exposure | |
JPS5360122A (en) | Test pattern generator | |
JPS52111785A (en) | Flaw detector | |
JPS5390876A (en) | Inspecting method for integrated semiconductor circuit device | |
JPS5381083A (en) | Focusing method of projection exposure apparatus | |
JPS5382268A (en) | Production of mask | |
JPS5369665A (en) | Method of and apparatus for measuring curvature of shadow mask | |
JPS53120380A (en) | Measuring method of exposure accuracy of electron ray exposure apparatus | |
JPS5220053A (en) | Method of detecting a moving object using super-ultrashort wave | |
JPS5220054A (en) | Method of detecting a moving object using superultrashort wave | |
JPS5284978A (en) | Production of semiconducotr device | |
JPS52150938A (en) | Method and apparatus for code reading |