JPS5468171A - Exposure unit for semiconductor wafer - Google Patents
Exposure unit for semiconductor waferInfo
- Publication number
- JPS5468171A JPS5468171A JP13479777A JP13479777A JPS5468171A JP S5468171 A JPS5468171 A JP S5468171A JP 13479777 A JP13479777 A JP 13479777A JP 13479777 A JP13479777 A JP 13479777A JP S5468171 A JPS5468171 A JP S5468171A
- Authority
- JP
- Japan
- Prior art keywords
- center
- semiconductor wafer
- wafer
- jetting
- exposure unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To avoid the residual air at the center and to perform excellent bonding between the wafer and the mask, by jetting from the center of the wafer placing stand, and starting to contact for the upper side of the semiconductor wafer from the center to the circumference.
CONSTITUTION: The semiconductor wafer 2 coated with the photo sensitive layer is placed on the wafer mounting stand 11, and jetting is made from the jet source 14 through the jet hole 12. The gas jetted is contacted with the jet hole 12 and is exerted externally through the continuous groove 13 made on the upper surface. With this operation, the center of the semiconductor wafer 2 is slightly swelled and the mask is gradually contacted from the center to the circumference.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13479777A JPS5468171A (en) | 1977-11-11 | 1977-11-11 | Exposure unit for semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13479777A JPS5468171A (en) | 1977-11-11 | 1977-11-11 | Exposure unit for semiconductor wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5468171A true JPS5468171A (en) | 1979-06-01 |
Family
ID=15136750
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13479777A Pending JPS5468171A (en) | 1977-11-11 | 1977-11-11 | Exposure unit for semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5468171A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57109330A (en) * | 1980-12-26 | 1982-07-07 | Hitachi Ltd | Mask aliner |
-
1977
- 1977-11-11 JP JP13479777A patent/JPS5468171A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57109330A (en) * | 1980-12-26 | 1982-07-07 | Hitachi Ltd | Mask aliner |
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