JPS5453967A - Mask and wafer for semiconductor circuit manufacture and their alignment unit - Google Patents

Mask and wafer for semiconductor circuit manufacture and their alignment unit

Info

Publication number
JPS5453967A
JPS5453967A JP12073577A JP12073577A JPS5453967A JP S5453967 A JPS5453967 A JP S5453967A JP 12073577 A JP12073577 A JP 12073577A JP 12073577 A JP12073577 A JP 12073577A JP S5453967 A JPS5453967 A JP S5453967A
Authority
JP
Japan
Prior art keywords
wafer
mask
mark
alignment mark
scribing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12073577A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6124816B2 (enrdf_load_stackoverflow
Inventor
Akiyoshi Suzuki
Ichiro Kano
Hideki Yoshinari
Masao Totsuka
Ryozo Hiraga
Yuzo Kato
Yasuo Ogino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP12073577A priority Critical patent/JPS5453967A/ja
Publication of JPS5453967A publication Critical patent/JPS5453967A/ja
Publication of JPS6124816B2 publication Critical patent/JPS6124816B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP12073577A 1977-10-07 1977-10-07 Mask and wafer for semiconductor circuit manufacture and their alignment unit Granted JPS5453967A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12073577A JPS5453967A (en) 1977-10-07 1977-10-07 Mask and wafer for semiconductor circuit manufacture and their alignment unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12073577A JPS5453967A (en) 1977-10-07 1977-10-07 Mask and wafer for semiconductor circuit manufacture and their alignment unit

Publications (2)

Publication Number Publication Date
JPS5453967A true JPS5453967A (en) 1979-04-27
JPS6124816B2 JPS6124816B2 (enrdf_load_stackoverflow) 1986-06-12

Family

ID=14793682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12073577A Granted JPS5453967A (en) 1977-10-07 1977-10-07 Mask and wafer for semiconductor circuit manufacture and their alignment unit

Country Status (1)

Country Link
JP (1) JPS5453967A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5719726A (en) * 1980-07-10 1982-02-02 Nippon Kogaku Kk <Nikon> Positioning device
JPS5788414A (en) * 1980-11-21 1982-06-02 Seiko Epson Corp Alignment device
JPS62155532A (ja) * 1985-12-27 1987-07-10 Nec Corp 半導体ウエ−ハの位置合せマ−クの形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176979A (enrdf_load_stackoverflow) * 1974-12-27 1976-07-03 Hitachi Ltd
JPS51140575A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Photomask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176979A (enrdf_load_stackoverflow) * 1974-12-27 1976-07-03 Hitachi Ltd
JPS51140575A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Photomask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5719726A (en) * 1980-07-10 1982-02-02 Nippon Kogaku Kk <Nikon> Positioning device
JPS5788414A (en) * 1980-11-21 1982-06-02 Seiko Epson Corp Alignment device
JPS62155532A (ja) * 1985-12-27 1987-07-10 Nec Corp 半導体ウエ−ハの位置合せマ−クの形成方法

Also Published As

Publication number Publication date
JPS6124816B2 (enrdf_load_stackoverflow) 1986-06-12

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