JPS5453965A - Mask for soft x-ray copying - Google Patents
Mask for soft x-ray copyingInfo
- Publication number
- JPS5453965A JPS5453965A JP12011377A JP12011377A JPS5453965A JP S5453965 A JPS5453965 A JP S5453965A JP 12011377 A JP12011377 A JP 12011377A JP 12011377 A JP12011377 A JP 12011377A JP S5453965 A JPS5453965 A JP S5453965A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- substrate
- thick
- copying
- soft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To manufacture the mask for fine pattern copying, by increasing the mechanical strength and also the flatness and transparency of soft X-ray, through the use of the Si3N4 film in which the atomic constituent of Si is more than 0.5 and the film thickness is more than 0.2 μm for the mask substrate.
CONSTITUTION: On the Si substrate 8 2" diameter and 280 μm thick, the Si3N4 mask substrate 6 0.5 μm thick is made vapor phase growing with the condition of NH3/SiH4 ratio 5, forming the gold pattern 3 4000Å thick. At the rear side, the Si3N4 mask 4 is made in advance and the frame 1 is made with selctive photo etching. This substrate 6 has the strength of hydrostatic pressure of 0.3 Kg/cm2 to the window of 4mm square. Accordingly, the film thickness can be reduced and the transparent rate is increased, no distortion is caused because of the increased strength, and copying of fine pattern is made possible
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12011377A JPS5453965A (en) | 1977-10-07 | 1977-10-07 | Mask for soft x-ray copying |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12011377A JPS5453965A (en) | 1977-10-07 | 1977-10-07 | Mask for soft x-ray copying |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5453965A true JPS5453965A (en) | 1979-04-27 |
Family
ID=14778254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12011377A Pending JPS5453965A (en) | 1977-10-07 | 1977-10-07 | Mask for soft x-ray copying |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5453965A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5177773A (en) * | 1990-03-26 | 1993-01-05 | Hitachi, Ltd. | X-ray mask and method for producing same |
-
1977
- 1977-10-07 JP JP12011377A patent/JPS5453965A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5177773A (en) * | 1990-03-26 | 1993-01-05 | Hitachi, Ltd. | X-ray mask and method for producing same |
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