JPS5447576A - Plasma cvd apparatus - Google Patents

Plasma cvd apparatus

Info

Publication number
JPS5447576A
JPS5447576A JP11336277A JP11336277A JPS5447576A JP S5447576 A JPS5447576 A JP S5447576A JP 11336277 A JP11336277 A JP 11336277A JP 11336277 A JP11336277 A JP 11336277A JP S5447576 A JPS5447576 A JP S5447576A
Authority
JP
Japan
Prior art keywords
wafer
motor
work
bringing
reverse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11336277A
Other languages
English (en)
Inventor
Masakuni Akiba
Hiroto Nagatomo
Jun Suzuki
Takeo Yoshimi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11336277A priority Critical patent/JPS5447576A/ja
Publication of JPS5447576A publication Critical patent/JPS5447576A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
JP11336277A 1977-09-22 1977-09-22 Plasma cvd apparatus Pending JPS5447576A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11336277A JPS5447576A (en) 1977-09-22 1977-09-22 Plasma cvd apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11336277A JPS5447576A (en) 1977-09-22 1977-09-22 Plasma cvd apparatus

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP24197883A Division JPS59145519A (ja) 1983-12-23 1983-12-23 プラズマｃｖｄ装置
JP24197983A Division JPS59145532A (ja) 1983-12-23 1983-12-23 プラズマｃｖｄ方法

Publications (1)

Publication Number Publication Date
JPS5447576A true JPS5447576A (en) 1979-04-14

Family

ID=14610350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11336277A Pending JPS5447576A (en) 1977-09-22 1977-09-22 Plasma cvd apparatus

Country Status (1)

Country Link
JP (1) JPS5447576A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727032A (en) * 1980-07-25 1982-02-13 Hitachi Ltd Plasma cvd device
JPS594433A (ja) * 1982-06-30 1984-01-11 Toshiba Corp 薄膜形成装置
JPS59207622A (ja) * 1983-05-11 1984-11-24 Furukawa Electric Co Ltd:The 半導体薄膜気相成長装置
FR2587732A1 (fr) * 1985-09-26 1987-03-27 Centre Nat Rech Scient Reacteur de depot chimique en phase vapeur assiste par plasma
JPH0284778A (ja) * 1989-06-16 1990-03-26 Sanyo Electric Co Ltd 太陽電池装置の製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727032A (en) * 1980-07-25 1982-02-13 Hitachi Ltd Plasma cvd device
JPS631746B2 (ja) * 1980-07-25 1988-01-13 Hitachi Seisakusho Kk
JPS594433A (ja) * 1982-06-30 1984-01-11 Toshiba Corp 薄膜形成装置
JPS59207622A (ja) * 1983-05-11 1984-11-24 Furukawa Electric Co Ltd:The 半導体薄膜気相成長装置
FR2587732A1 (fr) * 1985-09-26 1987-03-27 Centre Nat Rech Scient Reacteur de depot chimique en phase vapeur assiste par plasma
JPH0284778A (ja) * 1989-06-16 1990-03-26 Sanyo Electric Co Ltd 太陽電池装置の製造方法

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