JPS52137987A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS52137987A
JPS52137987A JP5489676A JP5489676A JPS52137987A JP S52137987 A JPS52137987 A JP S52137987A JP 5489676 A JP5489676 A JP 5489676A JP 5489676 A JP5489676 A JP 5489676A JP S52137987 A JPS52137987 A JP S52137987A
Authority
JP
Japan
Prior art keywords
layer
production
semiconductor device
polycrystalline
electrode windows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5489676A
Other languages
Japanese (ja)
Other versions
JPS5751924B2 (en
Inventor
Kazunari Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5489676A priority Critical patent/JPS52137987A/en
Publication of JPS52137987A publication Critical patent/JPS52137987A/en
Publication of JPS5751924B2 publication Critical patent/JPS5751924B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To form a shallow diffused layer under electrode windows in later impurity diffusion process by depositing a thin insulator layer on a polycrystalline Si layer for wiring covering the electrode windows then doping an impurity to the polycrystalline Si layer.
COPYRIGHT: (C)1977,JPO&Japio
JP5489676A 1976-05-14 1976-05-14 Production of semiconductor device Granted JPS52137987A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5489676A JPS52137987A (en) 1976-05-14 1976-05-14 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5489676A JPS52137987A (en) 1976-05-14 1976-05-14 Production of semiconductor device

Publications (2)

Publication Number Publication Date
JPS52137987A true JPS52137987A (en) 1977-11-17
JPS5751924B2 JPS5751924B2 (en) 1982-11-05

Family

ID=12983352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5489676A Granted JPS52137987A (en) 1976-05-14 1976-05-14 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS52137987A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197636U (en) * 1981-06-12 1982-12-15

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49131384A (en) * 1973-04-18 1974-12-17
JPS5151279A (en) * 1974-10-31 1976-05-06 Oki Electric Ind Co Ltd HANDOTAISHUSEKIKAIRONO SEIZOHOHO

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49131384A (en) * 1973-04-18 1974-12-17
JPS5151279A (en) * 1974-10-31 1976-05-06 Oki Electric Ind Co Ltd HANDOTAISHUSEKIKAIRONO SEIZOHOHO

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197636U (en) * 1981-06-12 1982-12-15

Also Published As

Publication number Publication date
JPS5751924B2 (en) 1982-11-05

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