JPS5437076A - Sputtering - Google Patents

Sputtering

Info

Publication number
JPS5437076A
JPS5437076A JP10461177A JP10461177A JPS5437076A JP S5437076 A JPS5437076 A JP S5437076A JP 10461177 A JP10461177 A JP 10461177A JP 10461177 A JP10461177 A JP 10461177A JP S5437076 A JPS5437076 A JP S5437076A
Authority
JP
Japan
Prior art keywords
sputtering
unnecesary
electric
reduce
vacuum tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10461177A
Other languages
English (en)
Inventor
Tetsuhito Matsubara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10461177A priority Critical patent/JPS5437076A/ja
Publication of JPS5437076A publication Critical patent/JPS5437076A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP10461177A 1977-08-30 1977-08-30 Sputtering Pending JPS5437076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10461177A JPS5437076A (en) 1977-08-30 1977-08-30 Sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10461177A JPS5437076A (en) 1977-08-30 1977-08-30 Sputtering

Publications (1)

Publication Number Publication Date
JPS5437076A true JPS5437076A (en) 1979-03-19

Family

ID=14385220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10461177A Pending JPS5437076A (en) 1977-08-30 1977-08-30 Sputtering

Country Status (1)

Country Link
JP (1) JPS5437076A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52111910A (en) * 1976-03-16 1977-09-20 Tokai Carbon Kk Carbon articles for sliding and manufacture
JPS56156764A (en) * 1980-05-02 1981-12-03 Fujitsu Ltd Spattering device
JPS59162113A (ja) * 1983-02-18 1984-09-13 フォルシュングスツエントルム・ユーリッヒ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング 貫流可能な多孔質の炭素製成形体の製造方法
JPH01309963A (ja) * 1988-06-08 1989-12-14 Matsushita Electric Ind Co Ltd スパッタリング装置
US6352629B1 (en) * 2000-07-10 2002-03-05 Applied Materials, Inc. Coaxial electromagnet in a magnetron sputtering reactor

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52111910A (en) * 1976-03-16 1977-09-20 Tokai Carbon Kk Carbon articles for sliding and manufacture
JPS5437076B2 (ja) * 1976-03-16 1979-11-13
JPS56156764A (en) * 1980-05-02 1981-12-03 Fujitsu Ltd Spattering device
JPS6353260B2 (ja) * 1980-05-02 1988-10-21 Fujitsu Ltd
JPS59162113A (ja) * 1983-02-18 1984-09-13 フォルシュングスツエントルム・ユーリッヒ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング 貫流可能な多孔質の炭素製成形体の製造方法
JPH0339004B2 (ja) * 1983-02-18 1991-06-12 Fuorushungusutsuentorumu Yuuritsuhi Gmbh
JPH01309963A (ja) * 1988-06-08 1989-12-14 Matsushita Electric Ind Co Ltd スパッタリング装置
US6352629B1 (en) * 2000-07-10 2002-03-05 Applied Materials, Inc. Coaxial electromagnet in a magnetron sputtering reactor

Similar Documents

Publication Publication Date Title
ES449034A1 (es) Perfeccionamientos introducidos en una lampara de descarga en vapor de mercurio a baja presion.
JPS5263663A (en) Gas electric discharge panel
JPS56152973A (en) Sputter etching device
JPS5367972A (en) Electrode for elctric discharge lamp
JPS5437076A (en) Sputtering
JPS5650042A (en) Ion pump for super high vacuum
JPS57194255A (en) Sputtering device
JPS5558371A (en) Sputtering apparatus
JPS553169A (en) Character display unit
GB1158486A (en) Improvements in Triode Ionic Vacuum Pump
JPS5776185A (en) Sputtering device
JPS53141182A (en) Plasma chemical vapor depositing device
JPS56160742A (en) Gas discharge indication panel
JPS54117678A (en) Gas discharge-type display device
JPS5595257A (en) Gas discharge display panel
JPS5583130A (en) Plasma display panel
JPS5240926A (en) Gas electric discharge display equipment
GB1422647A (en) Magnetic separators
JPS53114661A (en) Ion source of penning discharge type
JPS6421080A (en) Plasma cvd device
JPS5638751A (en) Flat plate display device
UA14390A1 (uk) Пристрій для хіміко-термічhої обробки виробів у вакуумі
JPS57136735A (en) Gas electric-discharge display panel
JPS5271715A (en) Sputtering ion vacuum pump
JPS5211759A (en) Gas discharge display panel