JPS54135004A - Photosensitive flat printing plate - Google Patents

Photosensitive flat printing plate

Info

Publication number
JPS54135004A
JPS54135004A JP4200478A JP4200478A JPS54135004A JP S54135004 A JPS54135004 A JP S54135004A JP 4200478 A JP4200478 A JP 4200478A JP 4200478 A JP4200478 A JP 4200478A JP S54135004 A JPS54135004 A JP S54135004A
Authority
JP
Japan
Prior art keywords
printing plate
flat printing
photosensitive flat
photosensitive
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4200478A
Other languages
English (en)
Japanese (ja)
Inventor
Masaru Watanabe
Hiroji Tokunaga
Yuuji Matsuoka
Yonezou Akaishi
Shiyouzou Yoneyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP4200478A priority Critical patent/JPS54135004A/ja
Priority to GB7912369A priority patent/GB2023858A/en
Priority to DE19792914558 priority patent/DE2914558A1/de
Publication of JPS54135004A publication Critical patent/JPS54135004A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP4200478A 1978-04-10 1978-04-10 Photosensitive flat printing plate Pending JPS54135004A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP4200478A JPS54135004A (en) 1978-04-10 1978-04-10 Photosensitive flat printing plate
GB7912369A GB2023858A (en) 1978-04-10 1979-04-09 Light-sensitive lithographic printing plates
DE19792914558 DE2914558A1 (de) 1978-04-10 1979-04-10 Lichtempfindliche lithographische druckplatte

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4200478A JPS54135004A (en) 1978-04-10 1978-04-10 Photosensitive flat printing plate

Publications (1)

Publication Number Publication Date
JPS54135004A true JPS54135004A (en) 1979-10-19

Family

ID=12624039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4200478A Pending JPS54135004A (en) 1978-04-10 1978-04-10 Photosensitive flat printing plate

Country Status (3)

Country Link
JP (1) JPS54135004A (de)
DE (1) DE2914558A1 (de)
GB (1) GB2023858A (de)

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
JPS5740249A (en) * 1980-06-14 1982-03-05 Hoechst Ag Photographic copying material and method of coating photosensitive copying layer on support
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
JPS58205149A (ja) * 1982-05-26 1983-11-30 Daikin Ind Ltd 溶解速度差現像液の像鮮明性増大剤
JPS5980468A (ja) * 1982-10-29 1984-05-09 Asahi Glass Co Ltd 農園芸用フイルム
JPS59137943A (ja) * 1983-01-28 1984-08-08 W R Gureesu:Kk 感光性樹脂組成物
JPS59142547A (ja) * 1983-02-02 1984-08-15 Nippon Telegr & Teleph Corp <Ntt> 溶解速度差現像液の像鮮明性増大剤
JPS59155836A (ja) * 1983-02-24 1984-09-05 Tokyo Ohka Kogyo Co Ltd 感光性組成物
JPS59222843A (ja) * 1983-06-01 1984-12-14 Toray Ind Inc ネガ型湿し水不要平版印刷版の製法
JPS61226745A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPS61226746A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPS61248054A (ja) * 1985-04-25 1986-11-05 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS6236657A (ja) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd 半導体微細加工用レジスト組成物
JPS62170950A (ja) * 1986-01-23 1987-07-28 Fuji Photo Film Co Ltd 感光性組成物
JPS62226143A (ja) * 1986-03-27 1987-10-05 Fuji Photo Film Co Ltd 感光性組成物
JPS62227140A (ja) * 1986-03-28 1987-10-06 Fuji Photo Film Co Ltd 画像形成材料
JPS6418142A (en) * 1987-07-13 1989-01-20 Fuji Photo Film Co Ltd Photosensitive composition
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US6709800B2 (en) * 2001-08-16 2004-03-23 Fuji Photo Film Co., Ltd. Presensitized plate for preparing lithographic printing plate
US6740470B2 (en) 2001-02-08 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US6780562B2 (en) 2000-08-29 2004-08-24 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US6830872B2 (en) 2001-09-21 2004-12-14 Fuji Photo Film Co., Ltd. Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound
US7144678B2 (en) 2001-03-30 2006-12-05 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS589146A (ja) * 1981-07-09 1983-01-19 Nippon Paint Co Ltd 水不要平版用版材
US4526856A (en) * 1983-05-23 1985-07-02 Allied Corporation Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents
US4661436A (en) * 1983-06-17 1987-04-28 Petrarch System, Inc. Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant
DE3523176A1 (de) * 1985-06-28 1987-01-08 Hoechst Ag Strahlungsempfindliche beschichtungsloesung und verfahren zur herstellung einer strahlungsempfindlichen schicht auf einem schichttraeger
US5215857A (en) * 1985-08-07 1993-06-01 Japan Synthetic Rubber Co., Ltd. 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
US5238774A (en) * 1985-08-07 1993-08-24 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
ES2202389T3 (es) † 1986-12-23 2004-04-01 Shipley Company Inc. Composicnes fotorresistentes de alta resolucion.
US6787286B2 (en) * 2001-03-08 2004-09-07 Shipley Company, L.L.C. Solvents and photoresist compositions for short wavelength imaging

Cited By (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0128365B2 (de) * 1979-10-22 1989-06-02 Asahi Chemical Ind
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
JPS5740249A (en) * 1980-06-14 1982-03-05 Hoechst Ag Photographic copying material and method of coating photosensitive copying layer on support
JPH038532B2 (de) * 1980-06-14 1991-02-06 Hoechst Ag
US4504567A (en) * 1981-04-27 1985-03-12 Konishiroku Photo Industry Co., Ltd. Light-sensitive lithographic printing plate
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
JPH029337B2 (de) * 1981-04-27 1990-03-01 Konishiroku Photo Ind
JPS58205149A (ja) * 1982-05-26 1983-11-30 Daikin Ind Ltd 溶解速度差現像液の像鮮明性増大剤
JPH0332782B2 (de) * 1982-05-26 1991-05-14 Daikin Kogyo Kk
JPS5980468A (ja) * 1982-10-29 1984-05-09 Asahi Glass Co Ltd 農園芸用フイルム
JPS6218579B2 (de) * 1982-10-29 1987-04-23 Asahi Glass Co Ltd
JPS59137943A (ja) * 1983-01-28 1984-08-08 W R Gureesu:Kk 感光性樹脂組成物
JPH0332783B2 (de) * 1983-02-02 1991-05-14 Nippon Denshin Denwa Kk
JPS59142547A (ja) * 1983-02-02 1984-08-15 Nippon Telegr & Teleph Corp <Ntt> 溶解速度差現像液の像鮮明性増大剤
JPS59155836A (ja) * 1983-02-24 1984-09-05 Tokyo Ohka Kogyo Co Ltd 感光性組成物
JPH0449703B2 (de) * 1983-02-24 1992-08-12 Tokyo Ohka Kogyo Co Ltd
JPS59222843A (ja) * 1983-06-01 1984-12-14 Toray Ind Inc ネガ型湿し水不要平版印刷版の製法
JPS61226745A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPH0558189B2 (de) * 1985-03-30 1993-08-25 Japan Synthetic Rubber Co Ltd
JPH0558188B2 (de) * 1985-03-30 1993-08-25 Japan Synthetic Rubber Co Ltd
JPS61226746A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPS61248054A (ja) * 1985-04-25 1986-11-05 Fuji Photo Film Co Ltd 感光性平版印刷版
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
JPS6236657A (ja) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd 半導体微細加工用レジスト組成物
JPS62170950A (ja) * 1986-01-23 1987-07-28 Fuji Photo Film Co Ltd 感光性組成物
JPS62226143A (ja) * 1986-03-27 1987-10-05 Fuji Photo Film Co Ltd 感光性組成物
JPS62227140A (ja) * 1986-03-28 1987-10-06 Fuji Photo Film Co Ltd 画像形成材料
JPS6418142A (en) * 1987-07-13 1989-01-20 Fuji Photo Film Co Ltd Photosensitive composition
US6780562B2 (en) 2000-08-29 2004-08-24 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US6740470B2 (en) 2001-02-08 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US7144678B2 (en) 2001-03-30 2006-12-05 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US6709800B2 (en) * 2001-08-16 2004-03-23 Fuji Photo Film Co., Ltd. Presensitized plate for preparing lithographic printing plate
US6830872B2 (en) 2001-09-21 2004-12-14 Fuji Photo Film Co., Ltd. Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound

Also Published As

Publication number Publication date
GB2023858A (en) 1980-01-03
DE2914558A1 (de) 1979-10-18

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