GB2023858A - Light-sensitive lithographic printing plates - Google Patents
Light-sensitive lithographic printing plates Download PDFInfo
- Publication number
- GB2023858A GB2023858A GB7912369A GB7912369A GB2023858A GB 2023858 A GB2023858 A GB 2023858A GB 7912369 A GB7912369 A GB 7912369A GB 7912369 A GB7912369 A GB 7912369A GB 2023858 A GB2023858 A GB 2023858A
- Authority
- GB
- United Kingdom
- Prior art keywords
- lithographic printing
- printing plate
- light
- coating
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Abstract
In making light-sensitive materials from which lithographic printing plates can be prepared, it is difficult to get a coated light-sensitive layer of uniform thickness after drying in a stream of air. To obtain uniform layers, the composition to be coated contains a fluorine-containing surfactant, which is a polymer of weight average molecular weight of >/= 10,000 containing a fluoroalkyl group, e.g. a perfluoroalkyl group of 3 to 14 carbon atoms; suitable polymers are fluoroalkyl (meth)acrylates. Commercially available surfactants are used in the Examples. The composition contains a volatile organic liquid. To dry the coated composition heated air is used. Uniform coating thickness is obtained with a wide range of drying conditions.
Description
SPECIFICATION
Light-sensitive lithographic printing plates
The present invention relates to a light-sensitive lithographic printing plate obtained by dissolving or dispersing a light-sensitive composition in an organic liquid, coating the composition on a support and drying it.
Light-sensitive lithographic printing plates are generally obtained by coating a light-sensitive composition, dissolved or dispersed in an organic liquid, on the surface of a support (such as appropriately surface-treated aluminum, paper or plastics material), and drying the coated layer. It is necessary for the light-sensitive layer thus formed to be of uniform thickness, in order to obtain optimum performance of the resulting lithographic printing plate.
It has been extremely difficult to obtain a uniform light-sensitive layer upon drying the coating. In the drying step, a humidity and temperature-conditioned air is blown against the light-sensitive compositioncoated support to remove the organic liquid and thus a light-sensitive layer is formed. The thickness of the dried light-sensitive layer is not uniform, due to the turbulence and disturbance in the layer caused by the humidity and temperature-conditioned air shown. This unevenness gives the plate a bad appearance and, when used as a printing plate, it can cause fluctuation in durability, image strength, and sensitivity.
To overcome the above difficulty, the light-sensitive layer is dried gradually over a long period of time while reducing the velocity of a stream of drying air. Other methods which have been tried are to use drying air wherein the initial drying temperature is lower and the latter drying temperature is higher or to use a comparatively high-boiling point liquid as the organic liquid for dissolving or dispersing the light-sensitive composition. However, even with these methods it is difficult to prevent the unevenness caused by the drying air, and when a support of indefinite length is carried and continuously coated and dried in producing lithographic printing plate on an industrial scale, big, long and complicated drying equipment is required.
The selection of the organic liquid places a large limitation on the light-sensitive composition itself.
An object of the present invention is to provide a light-sensitive lithographic printing plate having a light-sensitive layer of uniform thickness obtained by drying a light-sensitive composition coated on a support and preferably using simple equipment and in a short period of time.
According to the present invention, a light-sensitive lithographic printing plate comprises a support bearing a light-sensitive composition containing a fluorine-containing surfactant.
The inclusion of the surfactant solves the problem of non-uniform thickness of the coated layer.
The present invention exhibits particularly good effects in preparing light-sensitive lithographic printing plates (known as presensitized plates) by continuously coating a light-sensitive composition dissolved or dispersed in an organic liquid on to a strip of the support and drying it.
The support can be made of any dimensionally stable plate-like material which has been conventionally used as support for printing plate. Such supports include paper, paper laminated with plastics (e.g., polyethylene, polyproplyene or polystyrene), metal plates (e.g. aluminum (inciuding aluminum alloy), zinc, iron or copper), plastics films such as cellulose diacetate, cellulose triacetate, cellulose proponate, cellulose butyrate, cellulose butyrate acetate, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polyproplene, polycarbonate or polyvinyl acetal and papers or plastics films laminated or vacuum-deposited with the metals as described above.
The support is subjected, if necessary, to a surface treatment, e.g. to make it hydrophilic. Various hydrophilicity-imparting treatments may be used. For example, for a plastics surface, the surface-treating processes include chemical treatment, discharge treatment, flame treatment, ultroviolet treatment, high frequency treatment, glow discharge treatment, active plasma treatment and laser treatment (for example see U.S. Patents 2,764,520,3,497,407, 3,145,242,3,376,208, 3,072,483,3,475,193 and 3,360,448 and British
Patent 788,365) and a stubbing layer can be coated on the thus treated plastics surface.
Various methods are also known for coating a hydrophilic layer on a plastics support. There is a double layer method of coating first a hydrophobic resin layer which adheres well to plastics and shows good adhesion and then coating a hydrophilic resin layer thereon, and a single layer method of coating a resin layer having both hydrophobic and hydrophilic groups in the same polymer molecule.
In the case of using a metal or metal-coated support, in particular an aluminum support, it is preferable to conduct a graining treatment or to dip the support into an aqueous solution of sodium silicate, potasium fluorozirconate or a phosphate, or an anodic oxidation treatment. Also, an aluminum plate may be dipped into an aqueous solution or sodium silicate after graining, as described in U.S. Patent 2,714,066 or in an aqueous solution of alkali, metal silicate after anodic oxidation treatment as described in U.S. Patent 3,181,461. These latter two treatments are preferably used.
The above-described anodic oxidation treatment is conducted, for example, by allowing electric current to flow through an electrolytic solution of an aqueous or non-aqueous solution of an inorganic acid (e.g., phosphoric acid, chromic acid, sulfuric acid or boric acid) or an organic acid (e.g., oxalic acid or sulfamic acid) or a salt thereof, alone or in combinations of two or more, using an aluminum plate as the anode.
Also, a silicate electrode treatment described in U.S. Patent 3,658,622 is effective.
These hydrophilicity-imparting treatments are conducted to make the surface of the support hydrophilic and, in addition, to prevent harmful reaction with a light-sensitive composition provided therein and to improve the adhesion between the light-sensitive layer and the support.
As an organic light-sensitive composition to be coated on the support, any one that undergoes a change in its solubility of swelling property after exposure to light can be used. Particularly preferable as negative working type light-sensitive compositions which will become insoluble by the action of actinic light are:
(a) light-sensitive compositions comprising resin and a high molecular weight a diazo/compound, such as a diazo resin and shellac (see Japanese Patent Application (OPI) No. 24,404/72), poly(hydroxyethyl methacrylate) and a diazo resin, a diazo resin and a soluble polyamide resin (see U.S. Patent 3,751,257), a light-sensitive composition comprising an azide light-sensitive composition comprising an azide lightsensitive material and an epoxy resin (see U.S.Patent 2,852,379), and azide light-sensitive material and a diazo resin;
(b) light-sensitive materials comprising light-sensitive resins having an unsaturated double bond within the molecule and being capable of causing a dimerization reaction when exposed to actinic light to become insoluble, represented by polyvinyl cinnamate, such as the polyvinyl cinnamate derivatives decribed in
British Patents 843,545 and 966,297 and U.S. Patent 2,725,372:
(c) light-sensitive polyesters obtained by the condensation between bisphenol A and divanillal cyclphexanone, or between p-phenyl diathoxyacrylate and 1 ,4-di-P-hydrocyethoxycyclohexanone, as described in Canadian Patent 696,997;
(d) a diallyl phthalate propolymer as described in U.S.Patent 3,462,267;
(e) ethylenically unsaturated compounds having at least two unsaturated double bonds within the molecule and being capable of causing polymerization reaction upon irradiation with actinic light, such as unsaturated esters of a polyol as described in Japanese Patent Publication No.8,496!60 or in U.S.Patent 2,902,365 (e.g., ethylene di(meth)arcylate, diathylene glycol di(meth)acrylate, glycerol di(meth)acrylate, gycerol tri(meth)acrylate, 1,3-propylene di (meth)acryiate, 1.4-cyclohexanedial lmeth)acrylate, 1,4- benzenediol di(meth)acrylate, pentaerythritol tetra(meth)acrylate, 1,3-propylene glycol di(meth)acrylate, 1 5-pentadiol di(meth)acrylate or pentaerythritol tri(meth)-acrylate), bisacrylates and bismethacrylates or polyethyleneglycol having a molecularweight of 50 to 500, unsaturated amides particularly# methylenecarboxylic acid amides, more particularly C )-diamines and e)-diamines interrupted by an oxygen atom such a methylene bis(meth-acrylamide or diathylenetriamine tris(meth)acrylamide, divinyl succinate, divinyl adipate, divinyl phthalate, divinyl terephthalate or divinylbenzene-1,3-disulfonate, together with a suitable binder such as polyvinyl alcohol or a cellulose derivative having carboxy groups in side chains, such as polyvinyl hydrogen phthalate or carboxymethyl cellulose or a methyl methacryl atelmethacrylic acid copolymer.
Light-sensitive materials comprising o-diazoxide light-sensitive materials as described in U.S. Patents 3,635,709, 3061,430 and 3,061,120, phosphorus tu ngstate of diazo resin (Japanese Patent Publication No.
7,663/64), yellow prussiate of diazo resin (U.S. Patent 3,113,023. or diazo resin and polyvinyl hydrogen phthalate (Japanese Patent Application No. 18,812/65) are useful as positive-working type light-sensitive materials. Also, light-sensitive compositions containing a linear polyamide and an addition-polymerizable monomer containing unsaturated bonds are useful.
Examples of particularly useful light-sensitive compositions are light-sensitive composition comprising a diazo resin and shellac shown in British Patent No. 1,350,521, a composition comprising a diazo resin and a hydroxymethyl methacrylate copolymer shown in U.S. Patent No. 4,123,276, and a composition comprising naphthoquinoneiazididosulfonic acid, pyrogallolacetone resin esterified product and a novolak resin.
The distinctive feature of the present invention is the incorporation of a fluorine-containing surfactant in these light-sensitive compositions, to remove uneveness in the thickness of the coated and dried light-sensitive layer. Particularly effective fluorine-containing sufactants are having a weight average molecular weight of 10,000 or more and containing a fluoroalkyl group in side or main chain.
For example, fluoroalkyl acrylate polymers, fluoroalkyl methacrylate polymers, copolymers thereof with a polymerizable compound such as styrene or an ethylene fluoride methyl methacrylate copolymer can be used. As side chain, polyethylene glycol or polyproplene glycol may be introduced in addition to the fluoroalkyl groups.
Most preferred fluorine-containing surfactants which can be used in the present invention are those having an average molecular weight of 10,000 to 200,000, preferably 10,000 to 100,000, and having a recurring unit of the following general formula (I), as an essential recurring unit:
wherein R1 represents a hydrogen atom or a methyl group, Rf represents a perfluoroalkyl group having 3 to 14 carbon atoms and m represents 0, 1,2 or 3.
Illustrative examples of perfluoroalkyl groups represented by Rf are a perfluoropropyl group, a perfluorobutyl group, perfluorohexyl group, a perfluorolleptyl group, a perfluorooctyl group or a perfluorodecyl group.
The polymer having a recurring unit represented by the general formula (I) can also include a comonomer unit such as an acrylic acid ester or methacrylic acid ester of a polyol such as polyethylene gylcol polypropylene gylcol or an ethyleneglycol-propylene glycol block polymer. These polymers and the synthesis method thereof are described in U.S. Patents 2,642,516 and 3,102,103.
Commercially available fluorine-containing surfactants suitable for use in the present invention, and which are believed to fall within the aforesaid preferred class of formula (I), are illustated by Fluorad FC-430 and
FC-431 made by Minnesota Mining Manufacturing, Megafac F-171 and F-173 made by Dai Nippon Ink & BR<
Chemical, Inc. and Asahi Guard AG-710 made by Asahi Glass Company, Ltd.
The fluorine-containing surfactant is used preferably in an amount of 0.05 to 7% more preferably 0.2 to 3.0%, based on the dry weight of the light-sensitive composition (coating ingredients excluding liquid vehicle).
The light-sensitive composition containing the fluorine-containing surfactant is dissolved or dispersed in an organic liquid, coated on the above-described support and dried.
As the organic liquid to be used, those having a boiling point of 40 C to 180 C, in particular 60 C to 150 C, are selected in view of their drying advantages.
Suitable liquids are one or a mixture of alcohols such as methyl alcohol, ethyl alcohol, n- or i-propyl alcohol, n or i-butyl alcohol; ketones such as acetone, methyl ethyl ketone, methyl propyl ketone, methyl butyl ketone, methyl amyl ketone, methyl hexyl ketone, diethyl ketone, diisobuty ketone, cyclohexanone or methylcyclohexanone; hydrocarbons such as benzene, toluene, xylene, cyclohexane or methoxybenzene; ethers such as 2-methoxy ethanol, 2-ethoxy ethanol. 2-butoxy ethanol, dioxane, or dimethyldioxane; acetates such as 2-methoxy ethyl ace tate, 2-ethoxy ethanol acetate, ethyl acetate, n- or i-propyl acetate, n- or butyl acetate, ethyl butyl acetate or hexyl acetate; halides such as methylene di-chloride, ethylene dichloride or monochlorobenzene; or acid amides such as dimethylformamide.
As the coating method, roll coating, dip coating, air knife coating, gravure coating, gravure offset coating, hopper coating, blade coating, wire doctor coating or spray coating may be employed. A preferable coating amount for the light-sensitive composition is from lOmlim2 to 100ml/m > .
Drying is preferably effected by using heated air. The air temperature is preferably 30;C to 200 CC, in particular, 400C to 140 C. The drying temperature is not necessarily maintained at one level during drying, but may be stepwise raised.
In some cases, favourable results are obtained by removing moisture from the drying air. The heated air is suitably supplied to the coated surface at a rate of 0.1 misec to 30 m'sec, in particular 0.5 m'sec to 20 m/sec.
The present invention removes the unevenness in thickness of a light-sensitive layer which has occured upon drying, serves to make the performance as a printing plate uniform, and enable one to obtain a light-sensitive layer with a uniform thickness under an extremely broad range of drying conditions, and therefore simplifies the drying equipment required.
The present invention will now be described in more detail by the following examples. Percentages in the examples are by weight.
Example 1
An aluminum strip of 0.3 mm in thickness and 1,000 mm in width was passed through a 10% aqueous trisodim phosphate solution 800C over a period of 1 minute to degrease, then subjected to graining treatment using an abrasive and a brush, passed through a 2.5% sodium silicate aqueous solution kept at 70 C for a period of 1 minute, washed with water, dried, and guided to a coating step.
In the coating step, the following solution was prepared.
Parts Naphthoquinone-(1,2-)-diazo-(2)-5- sulfonic acid and an esterified product of pyrogallol-acetone resin 1.3 (described in U.S. Patent 3,636,709,
Example 1)
Cresol-novolak resin 2.6
Oil Blue 603 (made by Orient
Chemical Industries Co, Ltd) 0.03
Fluorine-containing surfactant see Table 1
Methylglycol 23
Methyl ethyl ketone 23
The above-described coating solution was continuously coated on the grained aluminum strip in an amount of 30 glum2, and passed through a drying zone over 2 minutes into which a 100do hot air was supplied. Thus, there was formed dry light-sensitive layers.
Table 1
Sample Fluorine-containing surfactant State of light
No. Trade name Amount added sensitive layer
(parts) 1 none(comparative 0 Strong streak-like
example) unevenness 2 Fluorad FC-430 0.01 uniform with no un
evenness 3 Asahi Guard AG- 0.20 slight unevenness
710 4 Megafac F-171 0.05 uniform with no un
evenness
As is tabulated above, the addition of fluorine-containing surfactants served to greatly improve the uniformity of the thickness of light-sensitive layer.
Light-sensitive lithographic printing plates cut into sheet form after drying showed uniform, excellent sensitivity, durability, etc. as positive type printing plates.
Example 2
The following coating solution was prepared in place of that described in Example 1.
Parts 2-Hydroxyethyl methacrylate copolymer (described in U.S. Patent 1.75 4,123,276, Example 1) 2-Methoxy-4-hydroxy-5-benzoylbenzenesulfonic acid salt of a 0.2 condensate of p-diazodiphenylamine and formaldehyde
Oil Blue 603 (made by Orient
Chemical Industried Co., Ltd.) 0.05
Fluorine-containing curfactant Table 2
Methylglycol 24
Methanol 24
The above-described coating solution was continuously coated on the aluminum strip in an amount of 40 g/m2 and passed through a drving zone into which 80'C hot air was supplied for 1 minute, then through a drying zone into which 100 C hot air was supplied for 1 minute. Thus, there were formed solid dry light-sensitive layer.
Table 2
Sample Fluorine-containing surfactant State of light
No. Trade Name Amount added sensitive layer
(parts) 5 none 0 strongvaque unevenness 6 Fluorad FC-430 0.01 uniform with
no unevenness 7 Fluorad FC-431 0.02 uniform with
no unevenness 8 Megafac F-171 0.05 uniform with
no unevenness 9 Megafac F-173 0.05 uniform with
no unevenness
As shown above, the addition of fluorine-containing surfactants serves greatly improves the uniformity in the thickness of the light-sensitive layer.
Light-sensitive lithographic printing plates cut into sheets after drying showed uniform, excellent sensitivity and
Claims (21)
1. A light-sensitive lithographic printing plate comprising a support bearing a light-sensitive composition containing a fluorine-containing surfactant which is a polymer having a weight average molecular weight of 10,000 or more and containing a fluoralkyl group in the main chain or a side chain thereof.
2. A lithographic printing plate as claimed in Claim 1, wherein said polymer has a recurring unit of the following general formula (I):
wherein R1 represents a hydrogen atom or a methyl group, Rf represents a perfluoroalkyl group having 3 to 4 carbon atoms and m represents 0, 1, 2 or 3.
3. A lithographic printing plate as claimed in Claim 1 or 2, wherein said fluorine-containing surfactant is present in said light-sensitive composition in an amount of 0.05 to 7% by weight based on the dry weight of the composition.
4. A lithographic printing plate as claimed in Claim 3, wherein said amount is 0.02 to 3%.
5. A lithographic printing plate as claimed in Claim 1,2 or 3, wherein said support is a sheet of paper, plastics-coated paper or metal-coated paper, a metal plate, a plastics film or a metal-coated plastics film.
6. A lithographic printing plate as claimed in Claim 5, wherein said support is aluminum.
7. A lithographic printing plate as claimed in Claim 6, wherein the surface of said aluminum support is grained.
8. A lithographic printing plate as claimed in Claim 6, wherein said support is subjected to anodic oxidation.
9. A lithographic printing plate as claimed in any preceding claim, wherein the surface of said support has been treated to improve the adhesion between the support and the light-sensitive layer.
10. A lithographic printing plate as claimed in any preceding claim, wherein the polymer has a weight average molecular weight of 10,00 to 200,000.
11. A lithographic printing plate as claimed in Claim 10, wherein the polymer is a polymer comprising a fluoroalkyl acrylate or fluoroalkyl methacrylate.
12. A lithographic printing plate as claimed in Claim 11, wherein the polymer is copolymerwith styrene or a copolymer of ethylene fluoride and methyl methacrylate.
13. A lithographic printing plate as claimed in Claim 10,11 or 12, wherein the polymer includes polyethylene glycol or polypropylene glycol side chains.
14. A lithographic printing plate as claimed in Claim 1, substantially as hereinbefore described with reference to any of the Samples 2 to 4 or 6 to 9 of the Examples.
15. A method of making a light-sensitive lithographic printing plate as claimed in any preceding claim, which method comprises coating-the surfactent containing composition, dissolved or dispersed in an organic liquid, on a support, and drying said composition to form a uniform layer.
16. A method as claimed in Claim 15, wherein said drying is performed by directing a stream of heated air toward the coated support.
17. A method as claimed in Claim 16, wherein said heated air is directed to said coated support at a rate of 0.1 to 30 metres per second.
18. A method as claimed in Claim 15, 16 or 17, wherein said coating is by roll coating, dip coating, air knife coating, gravure coating, gravure offset coating, hopper coating, blade coating. wire doctor coating or spray coating.
19. A method as claimed in any of Claims 15 to 18, wherein said composition is coated in an amount of 10 to 100 millitres per square metre.
20. A method as claimed in Claim 15 of making a lithographic printing plate, substantially as hereinbefore described.
21. A lithographic printing plate made by a method as claimed in any of Claims 15 to 20.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4200478A JPS54135004A (en) | 1978-04-10 | 1978-04-10 | Photosensitive flat printing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB2023858A true GB2023858A (en) | 1980-01-03 |
Family
ID=12624039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB7912369A Withdrawn GB2023858A (en) | 1978-04-10 | 1979-04-09 | Light-sensitive lithographic printing plates |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS54135004A (en) |
| DE (1) | DE2914558A1 (en) |
| GB (1) | GB2023858A (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4487823A (en) * | 1980-06-14 | 1984-12-11 | Hoechst Aktiengesellschaft | Light-sensitive copying material and process for the manufacture thereof utilizing non-ionic fluorinated ester surfactant |
| US4508814A (en) * | 1981-07-09 | 1985-04-02 | Nippon Paint Co., Ltd. | Waterless negative or positive lithographic printing plate preparation |
| US4526856A (en) * | 1983-05-23 | 1985-07-02 | Allied Corporation | Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents |
| US4661436A (en) * | 1983-06-17 | 1987-04-28 | Petrarch System, Inc. | Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant |
| EP0273026A2 (en) † | 1986-12-23 | 1988-06-29 | Shipley Company Inc. | Solvents for Photoresist compositions |
| US4822713A (en) * | 1986-01-23 | 1989-04-18 | Fuji Photo Film Co., Ltd. | Light-sensitive composition with fluorine containing acrylate or methacrylate copolymer surfactant |
| US5128230A (en) * | 1986-12-23 | 1992-07-07 | Shipley Company Inc. | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate |
| US5215857A (en) * | 1985-08-07 | 1993-06-01 | Japan Synthetic Rubber Co., Ltd. | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent |
| US5238774A (en) * | 1985-08-07 | 1993-08-24 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
| US5405720A (en) * | 1985-08-07 | 1995-04-11 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
| US6787286B2 (en) * | 2001-03-08 | 2004-09-07 | Shipley Company, L.L.C. | Solvents and photoresist compositions for short wavelength imaging |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5660441A (en) * | 1979-10-22 | 1981-05-25 | Asahi Chem Ind Co Ltd | Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition |
| JPS57178242A (en) * | 1981-04-27 | 1982-11-02 | Konishiroku Photo Ind Co Ltd | Photosensitive lithographic plate |
| JPS58205149A (en) * | 1982-05-26 | 1983-11-30 | Daikin Ind Ltd | Image sharpening agent in dissolution rate difference developing solution and developing composition containing it |
| JPS5980468A (en) * | 1982-10-29 | 1984-05-09 | Asahi Glass Co Ltd | Film for agricultural and horticultural use |
| JPS59137943A (en) * | 1983-01-28 | 1984-08-08 | W R Gureesu:Kk | Photosensitive resin composition |
| JPS59142547A (en) * | 1983-02-02 | 1984-08-15 | Nippon Telegr & Teleph Corp <Ntt> | Agent for raising image sharpness added into developing solution dependent on dissolution speed difference and developing composition containing it |
| JPS59155836A (en) * | 1983-02-24 | 1984-09-05 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
| JPS59222843A (en) * | 1983-06-01 | 1984-12-14 | Toray Ind Inc | Manufacture of negative type lithographic plate requiriing no dampening water |
| JPS61226746A (en) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | Radiation sensitive composition |
| JPS61226745A (en) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | Radiation sensitive composition |
| JPH081517B2 (en) * | 1985-04-25 | 1996-01-10 | 富士写真フイルム株式会社 | Photosensitive lithographic printing plate |
| DE3523176A1 (en) * | 1985-06-28 | 1987-01-08 | Hoechst Ag | RADIATION-SENSITIVE COATING SOLUTION AND METHOD FOR PRODUCING A RADIATION-SENSITIVE LAYER ON A LAYER |
| JPH0721626B2 (en) * | 1985-08-10 | 1995-03-08 | 日本合成ゴム株式会社 | Resist composition for semiconductor fine processing |
| JPH06105351B2 (en) * | 1986-03-27 | 1994-12-21 | 富士写真フイルム株式会社 | Photosensitive composition |
| JPH0762761B2 (en) * | 1986-03-28 | 1995-07-05 | 富士写真フイルム株式会社 | Image forming material |
| JPH06105350B2 (en) * | 1987-07-13 | 1994-12-21 | 富士写真フイルム株式会社 | Photosensitive composition for lithographic printing plate |
| JP2002072474A (en) | 2000-08-29 | 2002-03-12 | Fuji Photo Film Co Ltd | Original plate of planographic printing plate |
| EP1235106B1 (en) | 2001-02-08 | 2011-12-07 | FUJIFILM Corporation | Lithographic printing plate precursor |
| JP2002296774A (en) | 2001-03-30 | 2002-10-09 | Fuji Photo Film Co Ltd | Original plate for planographic printing plate |
| JP4141120B2 (en) * | 2001-08-16 | 2008-08-27 | 富士フイルム株式会社 | Master for lithographic printing plate |
| JP4216494B2 (en) | 2001-09-21 | 2009-01-28 | 富士フイルム株式会社 | Planographic printing plate precursor |
-
1978
- 1978-04-10 JP JP4200478A patent/JPS54135004A/en active Pending
-
1979
- 1979-04-09 GB GB7912369A patent/GB2023858A/en not_active Withdrawn
- 1979-04-10 DE DE19792914558 patent/DE2914558A1/en active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4487823A (en) * | 1980-06-14 | 1984-12-11 | Hoechst Aktiengesellschaft | Light-sensitive copying material and process for the manufacture thereof utilizing non-ionic fluorinated ester surfactant |
| US4508814A (en) * | 1981-07-09 | 1985-04-02 | Nippon Paint Co., Ltd. | Waterless negative or positive lithographic printing plate preparation |
| US4526856A (en) * | 1983-05-23 | 1985-07-02 | Allied Corporation | Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents |
| US4661436A (en) * | 1983-06-17 | 1987-04-28 | Petrarch System, Inc. | Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant |
| US6228554B1 (en) | 1985-08-07 | 2001-05-08 | Jsr Corporation | Radiation-sensitive resin composition |
| US5215857A (en) * | 1985-08-07 | 1993-06-01 | Japan Synthetic Rubber Co., Ltd. | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent |
| US5238774A (en) * | 1985-08-07 | 1993-08-24 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
| US5405720A (en) * | 1985-08-07 | 1995-04-11 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
| US5494784A (en) * | 1985-08-07 | 1996-02-27 | Japan Synthetic Rubber Co., Ltd. | Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent |
| US5925492A (en) * | 1985-08-07 | 1999-07-20 | Jsr Corporation | Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent |
| US6270939B1 (en) | 1985-08-07 | 2001-08-07 | Jsr Corporation | Radiation-sensitive resin composition |
| US4822713A (en) * | 1986-01-23 | 1989-04-18 | Fuji Photo Film Co., Ltd. | Light-sensitive composition with fluorine containing acrylate or methacrylate copolymer surfactant |
| US5128230A (en) * | 1986-12-23 | 1992-07-07 | Shipley Company Inc. | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate |
| EP0273026A2 (en) † | 1986-12-23 | 1988-06-29 | Shipley Company Inc. | Solvents for Photoresist compositions |
| EP0273026B2 (en) † | 1986-12-23 | 2003-08-20 | Shipley Company Inc. | Solvents for Photoresist compositions |
| US6787286B2 (en) * | 2001-03-08 | 2004-09-07 | Shipley Company, L.L.C. | Solvents and photoresist compositions for short wavelength imaging |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54135004A (en) | 1979-10-19 |
| DE2914558A1 (en) | 1979-10-18 |
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| WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |