JPH03172849A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPH03172849A JPH03172849A JP31275689A JP31275689A JPH03172849A JP H03172849 A JPH03172849 A JP H03172849A JP 31275689 A JP31275689 A JP 31275689A JP 31275689 A JP31275689 A JP 31275689A JP H03172849 A JPH03172849 A JP H03172849A
- Authority
- JP
- Japan
- Prior art keywords
- weight
- acrylate
- group
- photosensitive
- methacrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 38
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 36
- 229920001577 copolymer Polymers 0.000 claims abstract description 28
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 25
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 22
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims abstract description 18
- 125000006162 fluoroaliphatic group Chemical group 0.000 claims abstract description 17
- 239000000178 monomer Substances 0.000 claims abstract description 16
- 239000004094 surface-active agent Substances 0.000 claims abstract description 14
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 2
- -1 poly(oxyalkylene) Polymers 0.000 claims description 28
- 239000011737 fluorine Substances 0.000 claims description 20
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 19
- 238000009826 distribution Methods 0.000 abstract description 5
- 229910052782 aluminium Inorganic materials 0.000 description 28
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 28
- 238000000034 method Methods 0.000 description 21
- 239000010410 layer Substances 0.000 description 19
- 238000000576 coating method Methods 0.000 description 18
- 239000011248 coating agent Substances 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 229920005989 resin Polymers 0.000 description 16
- 238000011282 treatment Methods 0.000 description 16
- 238000001035 drying Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 238000005530 etching Methods 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 150000002430 hydrocarbons Chemical group 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 9
- 125000005702 oxyalkylene group Chemical group 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 5
- 125000001153 fluoro group Chemical group F* 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000004115 Sodium Silicate Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- 235000019441 ethanol Nutrition 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000007788 roughening Methods 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 229910052911 sodium silicate Inorganic materials 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 239000010407 anodic oxide Substances 0.000 description 3
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229920001800 Shellac Polymers 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 150000001540 azides Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000002848 electrochemical method Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 235000013312 flour Nutrition 0.000 description 2
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 230000001404 mediated effect Effects 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N n-propyl alcohol Natural products CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 125000006353 oxyethylene group Chemical group 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-M phthalate(1-) Chemical compound OC(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-M 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000004208 shellac Substances 0.000 description 2
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 2
- 229940113147 shellac Drugs 0.000 description 2
- 235000013874 shellac Nutrition 0.000 description 2
- 239000001488 sodium phosphate Substances 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 2
- 235000019801 trisodium phosphate Nutrition 0.000 description 2
- GPRLSGONYQIRFK-MNYXATJNSA-N triton Chemical compound [3H+] GPRLSGONYQIRFK-MNYXATJNSA-N 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RPUJTMFKJTXSHW-UHFFFAOYSA-N 1-(methoxymethoxy)ethanol Chemical compound COCOC(C)O RPUJTMFKJTXSHW-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- VEUMBMHMMCOFAG-UHFFFAOYSA-N 2,3-dihydrooxadiazole Chemical class N1NC=CO1 VEUMBMHMMCOFAG-UHFFFAOYSA-N 0.000 description 1
- AWBIJARKDOFDAN-UHFFFAOYSA-N 2,5-dimethyl-1,4-dioxane Chemical compound CC1COC(C)CO1 AWBIJARKDOFDAN-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 235000007516 Chrysanthemum Nutrition 0.000 description 1
- 240000005250 Chrysanthemum indicum Species 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
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- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
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- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
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- 229920006362 Teflon® Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
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- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はフッ素系界面活性剤を含有する感光性組成物に
関し、特に感光性組成物をフッ素系界面活性剤と共に有
機溶媒中に溶解又は分散させ支持体上に塗布乾燥するこ
とによって均一な膜厚を得ると共にインキ受容性を向上
することのできる感光性組成物に関する。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a photosensitive composition containing a fluorosurfactant, and particularly to a photosensitive composition containing a fluorosurfactant dissolved or dispersed in an organic solvent. The present invention relates to a photosensitive composition that can obtain a uniform film thickness and improve ink receptivity by coating and drying it on a support.
〔従来の技術及びその解決すべき課題〕感光性組成物は
、一般に適当な表面処理を施したアルミニウム、紙ある
いはプラスチック、Sin。[Prior Art and Problems to be Solved] Photosensitive compositions are generally made of aluminum, paper, plastic, or Sin which has been subjected to an appropriate surface treatment.
/ S iウェハーなどの支持体の表面に、有機溶媒中
に溶解又は分散したものを塗布し、乾燥して使用される
。この感光性組成物を塗布し乾燥する際、支持体上に均
一な感光層を設けることが感光性組成物の性能を発揮す
るために重要な事柄である。/ Si It is used by coating a solution or dispersion in an organic solvent on the surface of a support such as a wafer and drying it. When applying and drying this photosensitive composition, it is important to provide a uniform photosensitive layer on the support in order to exhibit the performance of the photosensitive composition.
本発明者等は上述の目的を達成するために、特開昭62
−1270950号及び特開昭62−226143号の
各明細書に記載されているように、塗布する感光性組成
物中に特定のフッ素系界面活性剤を含有させることによ
り、乾燥過程において生じる膜厚分布の不均一を解消し
得ることを見出している。しかしながら、これら技術に
より、不均一性は改善されるものの、必ずしも十分とは
言えず、またインキ受容性も十分とはいえないなど課題
が残っていた。In order to achieve the above-mentioned object, the present inventors have
As described in the specifications of JP-A-1270950 and JP-A-62-226143, by incorporating a specific fluorine-based surfactant into the photosensitive composition to be coated, the film thickness that occurs during the drying process is It has been found that the non-uniformity of the distribution can be resolved. However, although these techniques improve the non-uniformity, they are not necessarily sufficient and there remain problems such as insufficient ink receptivity.
従って、本発明は更に膜厚分布の均−性及びインキ受容
性の改善された感光性組成物を提供することを目的とす
る。Therefore, a further object of the present invention is to provide a photosensitive composition with improved uniformity of film thickness distribution and improved ink receptivity.
本発明者等は上記目的を達成するため、更にフッ素系界
面活性剤について鋭意研究を重ねた結果、塗布する感光
性組成物中に特定のフッ素系界面活性剤を含有させるこ
とにより、乾燥過程において生じる膜厚分布の不均一を
更に解消し得ると共にインキ受容性を向上できることを
見出し、本発明を完成するに至った。即ち、本発明は特
定のフッ素系界面活性剤を含有する感光性組成物におい
て、該フッ素系界面活性剤が(i)3〜20の炭素原子
を有しかつ40重量%以上のフッ素を含有し、末端の少
くとも3つの炭素原子が十分にフッ素化されているフル
オロ脂肪族基(Rf基)を含有するアクリレート又はR
f基を含有するメタクリレートと、(ii)ポリ (オ
キシアルキレン)アクリレート又はポリ (オキシアル
キレン)メタクリレートと、(iii)10〜22の炭
素原子からなる炭化水素基(RH基)を含有するアクリ
レート又はRH基を含有するメタクリレートとの共重合
体であり、各モノマー単位が、該共重合体の重量に基づ
いて(iHo〜50重量%、(ii)10〜50重量%
及び(iii)40〜70重量%であることを特徴とす
る感光性組成物に関する。In order to achieve the above object, the present inventors further conducted extensive research on fluorosurfactants, and found that by incorporating a specific fluorosurfactant into the photosensitive composition to be applied, the drying process can be improved. It was discovered that the non-uniformity of the film thickness distribution that occurs can be further eliminated and the ink receptivity can be improved, and the present invention has been completed. That is, the present invention provides a photosensitive composition containing a specific fluorine-based surfactant, wherein the fluorine-based surfactant (i) has 3 to 20 carbon atoms and contains 40% by weight or more of fluorine. , an acrylate containing a fluoroaliphatic group (Rf group) in which at least three terminal carbon atoms are fully fluorinated or R
methacrylate containing an f group, (ii) poly (oxyalkylene) acrylate or poly (oxyalkylene) methacrylate, and (iii) acrylate or RH containing a hydrocarbon group (RH group) consisting of 10 to 22 carbon atoms. a copolymer with a methacrylate containing groups, each monomer unit containing (iHo ~ 50% by weight, (ii) 10-50% by weight, based on the weight of the copolymer.
and (iii) 40 to 70% by weight.
以下、本発明について詳細に説明する。The present invention will be explained in detail below.
本発明に使用されるフッ素系界面活性剤は(i)3〜2
0の炭素原子を有しかつ40重量%以上のフッ素を含有
し、末端の少くとも3つの十分にフッ素化された炭素原
子を有するフルオロ脂肪族基(以下、Rf基という)を
含有するアクリレート又はメタクリレートと、(ii)
ポリ (オキシアルキレン)アクリレート又はメタクリ
レートと、lO〜22の炭素原子からなる炭化水素基(
RH基)を含有するアクリレート又はメタクリレートと
、の共重合体であり、各モノマー単位が該共重合体の重
量に基づいて、(i)10〜50重量%、(ii)10
〜50重量%、及び(iii)40〜70重量%である
ことを特徴とする。The fluorosurfactant used in the present invention is (i) 3 to 2
Acrylates having 0 carbon atoms and containing 40% by weight or more of fluorine and containing a fluoroaliphatic group (hereinafter referred to as Rf group) having at least 3 terminal fully fluorinated carbon atoms; (ii) methacrylate;
Poly (oxyalkylene) acrylate or methacrylate and a hydrocarbon group consisting of lO~22 carbon atoms (
RH group) containing acrylate or methacrylate, in which each monomer unit is (i) 10 to 50% by weight, (ii) 10% by weight, based on the weight of the copolymer.
-50% by weight, and (iii) 40-70% by weight.
フルオロ脂肪族基Rfは飽和されかつ一般に一価の脂肪
族基である。これは直鎖、分枝鎖及び十分に大きい場合
には環式又はこれらの組み合せ(例えばアルキルシクロ
脂肪族基)である。フルオロ脂肪族骨格鋼は炭素原子に
のみ結合した連鎖の酸素及び/又は3価の窒素へテロ原
子を含むことができ、このペテロ原子はフルオロ炭素基
間に安定な結合を与えかつRf基の不活性特性を妨害し
ない。Rf基は、十分な効果を発揮するためには、3〜
20、好ましくは6〜12の炭素原子を有し、かつ40
重量%以上好ましくは50重量%以上の、炭素原子に結
合したフッ素を有するものである。Rf基の末端の少な
くとも3つの炭S原子は十分にフッ素化されている。R
f基の末端は例えば、CF3CF、CF2−であり、好
適なRf基は、CnF2h++(nは3以上の整数)の
ように実質上完全に、又は十分にフッ素化されたアルキ
ル基である。The fluoroaliphatic group Rf is a saturated and generally monovalent aliphatic group. It can be straight-chain, branched and, if sufficiently large, cyclic or combinations thereof (eg alkylcycloaliphatic groups). Fluoroaliphatic skeletal steels can contain chain oxygen and/or trivalent nitrogen heteroatoms bonded only to carbon atoms, which provide stable bonds between the fluorocarbon groups and provide free bonds in the Rf groups. Does not interfere with active properties. In order for the Rf group to exhibit a sufficient effect, 3 to
20, preferably 6 to 12 carbon atoms, and 40
It has at least 50% by weight of fluorine bonded to carbon atoms, preferably at least 50% by weight. At least three terminal carbon S atoms of the Rf group are fully fluorinated. R
The terminal f group is, for example, CF3CF, CF2-, and a suitable Rf group is a substantially fully or fully fluorinated alkyl group, such as CnF2h++ (n is an integer of 3 or more).
R[基のフッ素含有量が40重量%未満では本発明の目
的が十分に達成されない。フッ素原子はRf基の末端に
局在化している方が効果が大きい。If the fluorine content of the R[ group is less than 40% by weight, the object of the present invention cannot be fully achieved. The effect is greater when the fluorine atom is localized at the end of the Rf group.
Rf基の炭素原子数が2以下でも、フッ素含有率を高く
することはてきるが、フッ素原子の総量が不十分となり
、効果が弱い。炭素原子数が2以下の十分にフッ素化さ
れたRf基含有モノマーの、共重合体に対する比率を高
くすることによって共重合体中のフッ素含有率を高くし
ても、フッ素原子が局在化していないため、十分な効果
が得られない。Although it is possible to increase the fluorine content even if the number of carbon atoms in the Rf group is 2 or less, the total amount of fluorine atoms becomes insufficient and the effect is weak. Even if the fluorine content in the copolymer is increased by increasing the ratio of a fully fluorinated Rf group-containing monomer having 2 or less carbon atoms to the copolymer, the fluorine atoms will not be localized. Because of this, the sufficient effect cannot be obtained.
一方、Rf基の炭素原子数が21以上では、フッ素含有
量が高いと得られた共重合体の溶剤に対する溶解性が低
くなり、またフッ素含有量が低いと、フッ素原子の局在
化が十分でなくなり、十分な効果が得られない。On the other hand, when the number of carbon atoms in the Rf group is 21 or more, if the fluorine content is high, the resulting copolymer will have low solubility in a solvent, and if the fluorine content is low, the localization of fluorine atoms will be insufficient. , and the sufficient effect cannot be obtained.
共重合体中の可溶化部分はポリ (オキシアルキレン)
基、(OR’)、であって、R′は2〜4の炭素原子を
有するアルキレン基、例えば−CH2CH2−CH2C
H2CH2CH(CH3) CL−1又はCH(C11
3) CH(CH3)−であることが好ましい。前記ポ
リ (オキシアルキレン)基中のオキシアルキレン単位
はポリ (オキシプロピレン)におけるように同一であ
ってもよく、又は互いに異なる2種以上のオキシアルキ
レンが不規則に分布されたものであってもよく、直鎖又
は分枝のオキシプロピレン及びオキシエチレン単位であ
ったり、又は、直鎖又は分枝のオキシプロピレン単位の
ブロック及びオキシエチレン単位のブロックのように存
在するものであってもよい。このポリ (オキシアルキ
レン)鎖は1以上の連鎖結合(例えば、仲介され、又は
含むことができる。連鎖の結合が3つ以上の°原子価を
有する場合には、これは分岐のオキシアルキレン単位を
得るための手段を提供する。この共重合体を感光性組成
物に添加する場合に、所望の溶解度を得るためには、ポ
リ (オキシアルキレン)基の分子量は250〜250
0が適当である。The solubilizing portion in the copolymer is poly(oxyalkylene)
a group, (OR'), in which R' is an alkylene group having 2 to 4 carbon atoms, such as -CH2CH2-CH2C
H2CH2CH(CH3) CL-1 or CH(C11
3) CH(CH3)- is preferred. The oxyalkylene units in the poly(oxyalkylene) group may be the same as in poly(oxypropylene), or two or more different oxyalkylenes may be randomly distributed. , linear or branched oxypropylene and oxyethylene units, or blocks of linear or branched oxypropylene units and blocks of oxyethylene units. The poly(oxyalkylene) chain can include one or more chain bonds (e.g., mediated or included; if the chain bonds have a valency of three or more, it can contain branched oxyalkylene units). In order to obtain the desired solubility when this copolymer is added to a photosensitive composition, the molecular weight of the poly(oxyalkylene) group should be between 250 and 250.
0 is appropriate.
共重合体中のインキ受容性向上化部分は、10〜22の
炭素原子からなる炭化水素基(RH基)である。RH基
としては、直鎖又は分岐の脂肪族炭化水素基又は環式炭
化水素基であり、これらは飽和化合物でも不飽和化合物
でも良く、更に脂肪族基と環式炭化水素基との組み合せ
(例えば、アでも良い。RH基の炭素原子数が9以下で
はインキ受容性向上化の効果が弱く、一方、23以上で
は共重合体の溶剤に対する溶解性が低くなる。このRH
基はアクリル酸又はメタクリル酸と直接エステル結合に
よって結合されていても、1つ以上の連鎖結合(例えば
、−CL −CII2−0−−3−など)で仲介され、
又はこれを含んでいてもよい。The ink receptivity improving moiety in the copolymer is a hydrocarbon group (RH group) consisting of 10 to 22 carbon atoms. The RH group is a linear or branched aliphatic hydrocarbon group or a cyclic hydrocarbon group, which may be a saturated compound or an unsaturated compound, and may also be a combination of an aliphatic group and a cyclic hydrocarbon group (e.g. , A may also be used. If the number of carbon atoms in the RH group is 9 or less, the effect of improving ink receptivity will be weak, while if it is 23 or more, the solubility of the copolymer in a solvent will decrease.
The group may be bonded to acrylic acid or methacrylic acid by a direct ester bond or mediated by one or more chain bonds (such as -CL-CII2-0--3-),
Or it may contain this.
本発明に使用される上記共重合体は、例えば、フルオロ
脂肪族基含有アクリレート又はメタクリレートと、ポリ
(オキシアルキレン)アクリレート又はメタクリレー
ト、例えばモノアクリレート又はジアクリレートと、l
O〜22の炭素原子からなる炭化水素基含有アクリレー
ト又はメタクリレート又はその混合物との遊離基開始共
重合によって製造できる。ポリアクリレートオリコマ−
の分子量は、開始剤の濃度と活性度、単量体の濃度及び
重合反応温度を調節することによって、更に連鎖移動剤
、例えばチオーノペ例えばn−オクチルメルカプタンを
添加することによって調整できる。−例として、フルオ
ロ脂肪族基含有アクリレート、Rf−R’ −D□C−
CH=CH2(ここでR′は、例えばスルホンアミドア
ルキレン、カルボンアミドアルキレン、又はアルキレン
である)、例えばC8F、、SO□N(C=H9)CH
2CH202CCFl=CH2と、ポリ (オキシアル
キレン)モノアクリレート、
CH2=C)IC(0)(OR’ )、 OCH3と、
10〜22の炭素原子からなる炭化水素基含有アクリレ
ート、RH−02C−C)I=C)12とを共重合させ
ると下記の繰返し単位を有する共重合体が得られる。The above-mentioned copolymers used in the present invention include, for example, a fluoroaliphatic group-containing acrylate or methacrylate, a poly(oxyalkylene)acrylate or methacrylate, such as a monoacrylate or diacrylate, and l
It can be prepared by free radical initiated copolymerization with acrylates or methacrylates containing hydrocarbon groups of from 0 to 22 carbon atoms or mixtures thereof. polyacrylate olicomer
The molecular weight of can be adjusted by adjusting the concentration and activity of the initiator, the monomer concentration and the polymerization reaction temperature, as well as by adding a chain transfer agent, such as a thionope such as n-octyl mercaptan. - For example, fluoroaliphatic group-containing acrylate, Rf-R' -D□C-
CH=CH2 (where R' is e.g. sulfonamidoalkylene, carbonamidoalkylene or alkylene), e.g. C8F, , SO□N(C=H9)CH
2CH202CCFl=CH2, poly(oxyalkylene) monoacrylate, CH2=C)IC(0)(OR'), OCH3,
When a hydrocarbon group-containing acrylate containing 10 to 22 carbon atoms, RH-02C-C)I=C)12, is copolymerized, a copolymer having the following repeating units is obtained.
上記フルオロ脂肪族基含有アクリレートは米国特許第2
.803.615号、同第2.642.416号、同第
2、826.564号、同第3.102.103号、同
第3.282.905号及び同第3.304.278号
の各明細書に記載されている。上記共重合体の製造に使
用されるポリ(オキシアルキレン)アクリレート及びこ
の目的のために有用な他のアクリレートは、市販のヒド
ロキシポリ (オキシアルキレン)材料、例えば商品名
“プルロニック” CPluronic(旭電化工業側
製)〕、アデカボリエーテル(旭電化工業■製)〕、“
カルボワックス” (Carbowax (グリコ・プ
ロダクツ)(Glyco Products) C
o、 !I) ) 、 “ ト リ ト ン”[
Triton (o−ム・アンド・ハース(Rohm
andHaas) Co、製)〕及びP、E、G、(第
−工業製薬側腹)として販売れているものを公知の方法
でアクリル酸、メタクリル酸、アクリルクロリド又は無
水アクリル酸と反応させることによって製造できる。The above fluoroaliphatic group-containing acrylate is disclosed in U.S. Pat.
.. 803.615, 2.642.416, 2, 826.564, 3.102.103, 3.282.905 and 3.304.278. It is stated in each specification. The poly(oxyalkylene) acrylates used in the preparation of the above copolymers, and other acrylates useful for this purpose, are commercially available hydroxypoly(oxyalkylene) materials, such as commercially available hydroxypoly(oxyalkylene) materials such as CPluronic (Asahi Denka Kogyo). ADEKABORIETHER (manufactured by Asahi Denka Kogyo ■)], “
Carbowax (Glyco Products) C
o,! I) ), “Triton” [
Triton (Rohm and Hearth)
and Haas) Co, Ltd.) and P, E, G, (Dai-Kogyo Seiyaku Flank) by reacting them with acrylic acid, methacrylic acid, acrylic chloride or acrylic anhydride in a known manner. Can be manufactured.
別に、公知の方法で製造したポリ (オキシアルキレン
)ジアクリレート、
CH2=C)lcO2(R’ 0)−COCtl=CH
z、例えばCHa=CHCO2(C2H40) r o
(Ca)+110) 22 (CJ40) l 0C
OCH=CH2を前記のフルオロ脂肪族基含有アクリレ
ートと共重合させると、下記の繰返し単位を有するポリ
アクリレート共重合体が得られる。Separately, poly (oxyalkylene) diacrylate produced by a known method, CH2=C)lcO2(R' 0)-COCtl=CH
z, for example CHa=CHCO2(C2H40) r o
(Ca)+110) 22 (CJ40) l 0C
When OCH=CH2 is copolymerized with the fluoroaliphatic group-containing acrylate described above, a polyacrylate copolymer having the following repeating units is obtained.
+
+
本発明に使用される共重合体を製造するのに適する他の
フルオロ脂肪族基含有末端エチレン系不飽和単量体は、
米国特許第2.592.069号、同第2、995.5
42号、同第3.078.245号、同第3.081.
274号、同第3.291.843号及び同第3.32
5.163号の各明細書に記載されており、上記フルオ
ロ脂肪族基含有末端エチレン系不飽和単量体を製造する
のに適したエチレン系不飽和材料は米国特許第3、57
4.791号明細書に記載されている。+ + Other fluoroaliphatic group-containing terminal ethylenically unsaturated monomers suitable for producing the copolymer used in the present invention include:
U.S. Patent No. 2.592.069, U.S. Patent No. 2,995.5
No. 42, No. 3.078.245, No. 3.081.
No. 274, No. 3.291.843 and No. 3.32
No. 5.163, ethylenically unsaturated materials suitable for producing the terminal ethylenically unsaturated monomers containing fluoroaliphatic groups are described in U.S. Pat.
No. 4.791.
本発明に使用される共重合体を製造するのに適する10
〜22の炭素原子からなる炭化水素基含有アクリレート
又は炭化水素基含有メタクリレートは、例えば10〜2
2の炭素原子からなる脂肪族アルコールを公知の方法で
アクリル酸、メタクリル酸、アクリルクロリド又は無水
アクリル酸と反応させることによって製造できる。例え
ば、ステアリルアルコールを使用することによって、C
,、H3?0COCH=CH2が得られる。10 suitable for producing the copolymer used in the present invention
The hydrocarbon group-containing acrylate or hydrocarbon group-containing methacrylate consisting of ~22 carbon atoms is, for example, 10 to 2 carbon atoms.
They can be prepared by reacting aliphatic alcohols of 2 carbon atoms with acrylic acid, methacrylic acid, acrylic chloride or acrylic anhydride in a known manner. For example, by using stearyl alcohol, C
,,H3?0COCH=CH2 is obtained.
本発明に使用される共重合体は(i)フルオロ脂肪族基
含有アクリレート又はメタクリレートと、(ii)ポリ
(オキシアルキレン)アクリレート又はメタクリレー
トと、(iii>10〜20の炭素原子からなる炭化水
素基含有アクリレート又はメタクリレートと、の共重合
体であって、各モノマー単位が、該共重合体の重量に基
づいて(i)10〜50重量%、(ii)10〜5.0
重量%、及び(iii)40〜70重量%である。The copolymer used in the present invention comprises (i) a fluoroaliphatic group-containing acrylate or methacrylate, (ii) a poly(oxyalkylene)acrylate or methacrylate, and (iii) a hydrocarbon group consisting of >10 to 20 carbon atoms. A copolymer containing acrylate or methacrylate, wherein each monomer unit is (i) 10 to 50% by weight, (ii) 10 to 5.0% by weight, based on the weight of the copolymer.
% by weight, and (iii) 40-70% by weight.
(i)成分が10重量%より少ないと、膜厚分布の均一
性が十分でなく、逆に50重量%より多いと溶剤に対す
る溶解度が低すぎて好ましくない。If component (i) is less than 10% by weight, the uniformity of the film thickness distribution will not be sufficient, whereas if it is more than 50% by weight, the solubility in solvents will be too low, which is undesirable.
(ii )成分は可溶化部分であり、10重量%以下で
は溶解性が不十分であり、逆に50重量%以上では(i
)及び(iii )成分が減少する結果、効果が不十分
となる。Component (ii) is a solubilized portion, and if it is less than 10% by weight, the solubility is insufficient, and if it is more than 50% by weight, (i)
) and (iii) components are reduced, resulting in insufficient effects.
(iii )成分が40重量%より少ないとインキ受容
性向上効果が少なく、逆に70重量%より多いと溶剤に
対する溶解度が低すぎて好ましくない。If the component (iii) is less than 40% by weight, the effect of improving ink receptivity will be small, and if it is more than 70% by weight, the solubility in solvents will be too low, which is not preferable.
本発明に使用される共重合体の分子量は2.500〜1
00,000 、より好ましくは6.000〜100.
000である。分子量が2.500より小さいと効果が
十分でなく 、100.000より大きいと溶剤に対す
る溶解性が低下するので好ましくない。The molecular weight of the copolymer used in the present invention is 2.500 to 1
00,000, more preferably 6.000 to 100.00.
It is 000. If the molecular weight is less than 2.500, the effect will not be sufficient, and if it is more than 100.000, the solubility in solvents will decrease, which is not preferable.
本発明に使用される共重合体は、フルオロ脂肪族基含有
モノマーとして、フルオロ脂肪族基含有アクリレートを
フルオロ脂肪族基含有モノマー単位に対して50〜10
0重量%使用し、かつポリ(オキシアルキレン)アクリ
レートモノマー単位を共重合体の全重量に対して10重
量%以上使用して得られたものが好ましく、フルオロ脂
肪族基含有アクリレートと、ポリ (オキシアルキレン
)アクリレートと、炭化水素基含有アクリレートと、の
共重合体が特に好ましい。フルオロ脂肪族基含有メタク
リレートがフルオロ脂肪族基含有モノマー単位に対して
50重量%以上になると溶剤溶解性が低下する傾向とな
る。また、ポリ (オキシアルキレン)アクリレートモ
ノマーが共重合体の全重量に対して10重量%未渦の場
合、塗膜にピンホールが発生しやすくなる。In the copolymer used in the present invention, as a fluoroaliphatic group-containing monomer, fluoroaliphatic group-containing acrylate is added at 50 to 10% per fluoroaliphatic group-containing monomer unit.
It is preferable to use 0% by weight of poly(oxyalkylene) acrylate monomer units and 10% by weight or more of poly(oxyalkylene) acrylate monomer units based on the total weight of the copolymer. Particularly preferred are copolymers of (alkylene) acrylates and hydrocarbon group-containing acrylates. When the fluoroaliphatic group-containing methacrylate is 50% by weight or more based on the fluoroaliphatic group-containing monomer unit, the solvent solubility tends to decrease. Furthermore, if the poly(oxyalkylene) acrylate monomer is not mixed by 10% by weight based on the total weight of the copolymer, pinholes are likely to occur in the coating film.
本発明に使用されるフッ素系界面活性剤の好ましい使用
範囲は、感光性組成物(溶媒を除いた塗布成分)に対し
て0.01〜5重量%の範囲であり、更に好ましい使用
範囲は0.05〜3重量%の範囲である。フッ素系界面
活性剤の使用量が0.01重量%未満では効果が十分で
なくなりやすく、一方、5重量%より多くなると、塗膜
の乾燥が十分に行われなくなったり、感光材料としての
性能(例えば、現像性)に悪影響を及ぼす傾向になる。The preferred usage range of the fluorosurfactant used in the present invention is 0.01 to 5% by weight based on the photosensitive composition (coating components excluding solvent), and the more preferred usage range is 0.01 to 5% by weight. It ranges from .05 to 3% by weight. If the amount of fluorosurfactant used is less than 0.01% by weight, the effect tends to be insufficient. On the other hand, if it is more than 5% by weight, the coating film may not dry sufficiently or the performance as a photosensitive material ( For example, it tends to have an adverse effect on developability.
本発明のフッ素系界面活性剤が配合される感光性組成物
は、露光の前後で現像液に対する溶解性又は膨潤性が変
化するものならばいずれのものも使用できる。特に好ま
しいものはジアゾ化合物、例えば、ジアゾ樹脂とシェラ
ツクとから成る感光性組成物(特開昭47−24404
号)、ポリ(ヒドロキシエチルメタクリレート)とジア
ゾ樹脂、ジアゾ樹脂と可溶性ポリアマイド樹脂(米国特
許第3.751.257号)、アジド感先物とエポキシ
樹脂(米国特許第2.852.379号)、アジド感先
物、ジアゾ樹脂、ポリビニルシンナメートで代表される
ような分子中に不飽和二重結合を有し、活性光線の照射
により二量化反応を起して不溶化する感光性樹脂、例え
ば英国特許第843.545号、同第966297号、
米国特許第2.725.372号の各明細書等に記載さ
れているポリビニルシンナメートの誘導体、カナダ国特
許第696.997号明細書に記載されているようなビ
スフェノールAとジバニラールシクロヘキサノン、p−
フェニレンジエトキシアクリレートと1.4−ジ−β−
ヒドロキシニドキシンクロヘキサノンとの縮合で得られ
た感光性ポリエステル、米国特許第3.462.267
号に記載されているようなジアリルフタレートのプレポ
リマー等及び分子中に少なくとも2つの不飽和二重結合
を有し、活性光線の照射により重合反応を引起すような
エチレン系不飽和化合物、例えば特公昭35−8495
号に記載されているようなポリオールの不飽和エステル
、例えばエチレンジ(メタ)アクリレート、ジエチレン
グリコールジ(メタ)アクリレート、グリセロールジ(
メタ)アクリレート、グリ′セロールトリ (メタ)ア
クリレート、エチレンジ(メタ)アクリレート、1.
3−7’0ピレンジ(メタ)アクリレート、1,4−シ
クロ−ヘキサンジオール(メタ)アクリレート、1゜4
−ベンゼンジオールジ(メタ)アクリレート、ペンタエ
リスリトールテトラ (メタ)アクリレート、1.3−
プロピレングリコールジ(メタ)アクリレート、1.5
−ペンタンジオールジ(メタ)アクリレート、ペンタエ
リスリトールトリ (メタ)アクリレート、分子量50
〜500のポリエチレングリコールのビスアクリレート
及びメタクリレート、不飽和アミド特に、α−メチレン
カルボン酸のアミド及び特にα、ω−ジアミン及び酸素
が中間に介在するω−ジアミンのもの、例えばメチレン
ビス(メタ)アクリルアミド及びジエチレントリアミン
トリス(メタ)アクリルアミド、ジビニルサクシネート
、ジビニルアジペート、ジビニルフタレート、ジビニル
テレフタレート、ジビニルベンゼン−1,3−ジスルホ
ネート等と適当なバインター、例えばポリビニルアルコ
ール又はセルロースの誘導体で側鎖にカルボキシ基を含
有するような化合物、例えばポリビニル水素フタレート
、カルボキシメチルセルローズ、又はメチルメタクリレ
ート七メタグリル酸の共重合体から成る感光性組成物等
が、活性光線の作用により不溶性と成るネガティブワー
キング型の感光性組成物として有用である。米国特許第
3.635.709号、同第3、061.430号、同
第3.061.120号に記載されて5)るような0−
ジアゾオキサイド系の感光物、ジアゾ樹脂のリンタング
ステン酸塩(特公昭397663号)、ジアゾ樹脂の黄
血塩(米国特許第3、113.023号)及びジアゾ樹
脂とポリビニル水素フタレート(特願昭40−1881
2号)等から成る感光性組成物はポジティブワーキング
型の感光物として有用である。また、米国特許第3.0
81.168号、同第3.486.903号、同第3.
512.971号、同第3、615.6’29号などの
各明細書に記されているような線状ポリアミド及び付加
重合性不飽和結合を有する単量体を含む感光性組成物も
有用である。Any photosensitive composition containing the fluorine-containing surfactant of the present invention can be used as long as its solubility or swelling property in a developer changes before and after exposure. Particularly preferred are diazo compounds, such as photosensitive compositions comprising diazo resin and shellac (Japanese Patent Laid-Open No. 47-24404
), poly(hydroxyethyl methacrylate) and diazo resins, diazo resins and soluble polyamide resins (U.S. Pat. No. 3.751.257), azide-sensitive futures and epoxy resins (U.S. Pat. No. 2.852.379), azide Photosensitive resins, such as photosensitive resins, diazo resins, and polyvinyl cinnamates, which have unsaturated double bonds in their molecules and which undergo a dimerization reaction and become insolubilized by irradiation with actinic rays, such as British Patent No. 843 No. 545, No. 966297,
derivatives of polyvinyl cinnamate as described in U.S. Patent No. 2.725.372, bisphenol A and divanylcyclohexanone as described in Canadian Patent No. 696.997; p-
Phenylene diethoxy acrylate and 1,4-di-β-
Photosensitive polyester obtained by condensation of hydroxynidoxin with clohexanone, U.S. Pat. No. 3,462,267
Prepolymers of diallyl phthalate as described in Kosho 35-8495
unsaturated esters of polyols, such as ethylene di(meth)acrylate, diethylene glycol di(meth)acrylate, glycerol di(
meth)acrylate, glycerol tri(meth)acrylate, ethylene di(meth)acrylate, 1.
3-7'0 pyrene di(meth)acrylate, 1,4-cyclo-hexanediol(meth)acrylate, 1゜4
-benzenediol di(meth)acrylate, pentaerythritol tetra(meth)acrylate, 1.3-
Propylene glycol di(meth)acrylate, 1.5
-Pentanediol di(meth)acrylate, pentaerythritol tri(meth)acrylate, molecular weight 50
~500 polyethylene glycol bisacrylates and methacrylates, unsaturated amides, especially amides of α-methylenecarboxylic acids and especially those of α,ω-diamines and ω-diamines with intermediate oxygen, such as methylene bis(meth)acrylamide and Diethylene triamine tris(meth)acrylamide, divinyl succinate, divinyl adipate, divinyl phthalate, divinyl terephthalate, divinylbenzene-1,3-disulfonate, etc. and a suitable binder, such as polyvinyl alcohol or a cellulose derivative containing a carboxy group in the side chain. As a negative working type photosensitive composition, a photosensitive composition consisting of a compound such as polyvinyl hydrogen phthalate, carboxymethyl cellulose, or a copolymer of methyl methacrylate heptamethacrylic acid becomes insoluble by the action of actinic rays. Useful. 0-
Diazo oxide photosensitive materials, phosphotungstate of diazo resin (Japanese Patent Publication No. 397,663), yellow blood salt of diazo resin (U.S. Pat. No. 3,113.023), and diazo resin and polyvinyl hydrogen phthalate (Japanese Patent Application No. 1983) -1881
A photosensitive composition comprising No. 2) etc. is useful as a positive working type photosensitive material. Also, U.S. Patent No. 3.0
No. 81.168, No. 3.486.903, No. 3.
Photosensitive compositions containing linear polyamides and monomers having addition-polymerizable unsaturated bonds, such as those described in specifications such as No. 512.971, No. 3, and No. 615.6'29, are also useful. It is.
特に有用な感光性組成物としては、特開昭47−244
04号公報に示されているジアゾ樹脂とシェラツクから
なる感光性組成物、特開昭50−118802号に示さ
れているジアゾ樹脂とヒドキシエチルメタクリレート共
重合体からなる組成物、米国特許箱3.635.709
号明細書に示されているナフトキノンジアジドスルホン
酸とピロガロール−アセトン樹脂のエステル化物及びノ
ボラ、ツク樹脂よりなる組成物等が挙げられる。Particularly useful photosensitive compositions include JP-A-47-244
A photosensitive composition comprising a diazo resin and shellac as shown in Japanese Patent Application No. 04, a composition comprising a diazo resin and a hydroxyethyl methacrylate copolymer as shown in JP-A-50-118802, and US Patent Box 3. .635.709
Examples include compositions made of esterified products of naphthoquinonediazide sulfonic acid and pyrogallol-acetone resin, and novola and tsuku resins shown in the specification of the above patent.
本発明に1吏用される感光性組成物には、画像識別のた
めの染料、例えばクリスタルバイオレット、メチルバイ
オレット、マラカイトグリーン、ツクシン、パラツクシ
ン、ビクトリア・ブルーBH〔保土谷化学工業■製〕、
ビクトリア・ピュアー・ブルー・BOHC保土谷化学工
業■製〕、オイルブルー#603(オチェント化学工業
a1製〕、オイルピンク#312 (オリエント化学工
業■製〕、オイルレッド5B[オリエント化学工業■製
〕、オイルグリーン#502Cオリエント化学工業■製
〕、などを全感光性組成物に対して0.3〜15重量%
重量%前しても良い。更に、これらの染料と相互作用を
して色調を変えさせる光分解物を発生させる化合物、例
えば特開昭50−36209号公報に記載の0−ナトフ
キノンジアジド−4−スルホン酸ハロゲニド、特開昭5
3−36223号公報に記載のトリハロメチル−2−ピ
ロンやトリハロメチルトリアジン、特開昭55−624
44号公報に記載の種々の○−ナフトキノンジアジド化
合物、特開昭55−77742号公報に記載の2−トリ
ハロメチル−5−アリール−1,3゜4−オキサジアゾ
ール化合物などを添加することが出来る。これらの化合
物は単独又は混合して使用することが出来、添加量は0
.3〜15重量%が好ましい。更に、充てん剤を添加す
ることができる。充てん剤を加えることによって塗膜の
物理的性質をより一層向上させることができるばかりで
なく、感光層表面のマット化が可能となり、画像焼付は
時の真空密着性がよくなり、いわゆる焼ボケを防止する
ことができる。このような充てん剤としては、タルク粉
末、ガラス粉末、粘土、デンプン、小麦粉、とうもろこ
し粉、テフロン粉末等がある。更に、その他種々の目的
に応じて各種添加剤を加えることができる。The photosensitive composition used in the present invention includes dyes for image identification, such as crystal violet, methyl violet, malachite green, tsuksin, para tsuksin, Victoria Blue BH [manufactured by Hodogaya Chemical Industry ■],
Victoria Pure Blue BOHC manufactured by Hodogaya Chemical Industry ■], Oil Blue #603 (manufactured by Ocento Chemical Industry A1), Oil Pink #312 (manufactured by Orient Chemical Industry ■), Oil Red 5B [manufactured by Orient Chemical Industry ■], Oil Green #502C manufactured by Orient Kagaku Kogyo ■], etc., in an amount of 0.3 to 15% by weight based on the total photosensitive composition.
It may be adjusted by weight%. Furthermore, compounds that interact with these dyes to generate photolytic products that change color tone, such as 0-natofquinonediazide-4-sulfonic acid halide described in JP-A-50-36209, JP-A-50-36209;
Trihalomethyl-2-pyrone and trihalomethyltriazine described in Publication No. 3-36223, JP-A-55-624
Various ○-naphthoquinonediazide compounds described in Japanese Patent Publication No. 44, 2-trihalomethyl-5-aryl-1,3°4-oxadiazole compounds described in JP-A-55-77742, etc. can be added. I can do it. These compounds can be used alone or in combination, and the amount added is 0.
.. 3 to 15% by weight is preferred. Furthermore, fillers can be added. Adding a filler not only makes it possible to further improve the physical properties of the coating film, but also makes it possible to make the surface of the photosensitive layer matte, which improves vacuum adhesion during image printing and eliminates so-called printing blur. It can be prevented. Such fillers include talcum powder, glass powder, clay, starch, wheat flour, corn flour, Teflon powder, and the like. Furthermore, various additives can be added depending on various other purposes.
上記の感光性組成物は、一般に支持体上に塗設されて、
感光性平版印刷版等に使用される。The above photosensitive composition is generally coated on a support,
Used in photosensitive planographic printing plates, etc.
支持体としては、寸度的に安定な板状物が使用され、こ
れまで印刷板の支持体として使用されたものが含まれる
。かかる支持体としては、紙、プラスチックス(例えば
、ポリエチレン、ポリプロピレン、ポリスチレンなど)
がラミネートされた紙、例えばアルミニウム(アルミニ
ウム合金も含む)、亜鉛、鉄、銅などのような金属の板
、例えば二酢酸セルロース、三酢酸セルロース、プロピ
オン酸セルロース、酪酸セルロース、酪酸酢酸セルロー
ス、硝酸セルロース、ポリエチレンテレフタレート、ポ
リエチレン、ポリスチレン、ポリプロピレン、ポリカー
ボネート、ポリビニルアセタールなどのようなプラスチ
ックスのフィルム、上記のような金属がラミネートもし
くは蒸着された紙もしくはプラスチックフィルムなどが
含まれるが、特にアルミニウム板が好ましい。アルミニ
ウム板には純アルミニウム及びアルミニウム合金板が含
まれる。アルミニウム合金としては種々のものが使用で
き、例えば珪素、銅、マンガン、マグネシウム、クロム
、亜鉛、鉛、ビスマス、ニッケルなどの金属とアルミニ
ウムとの合金が用いられる。これらの組成物は、いくら
かの鉄及びチタンに加えてその他無視し得る程度の量の
不純物をも含むものである。As the support, dimensionally stable plate-like materials are used, including those used hitherto as supports for printing plates. Such supports include paper, plastics (e.g. polyethylene, polypropylene, polystyrene, etc.)
Paper laminated with metal plates such as aluminum (including aluminum alloys), zinc, iron, copper, etc., such as cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate , films of plastics such as polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc., paper or plastic films laminated or vapor-deposited with metals as described above, and aluminum plates are particularly preferred. Aluminum plates include pure aluminum and aluminum alloy plates. Various aluminum alloys can be used, such as alloys of aluminum and metals such as silicon, copper, manganese, magnesium, chromium, zinc, lead, bismuth, and nickel. These compositions contain some iron and titanium as well as other negligible impurities.
支持体は、必要に応じて表面処理される。例えば感光性
平版印刷版の場合には、支持体の表面に、親水化処理が
施される。かかる親水化処理には種々のものがある。例
えばプラスチックの表面を有する支持体の場合には、化
学的処理、放電処理、火焔処理、紫外線処理、高周波処
理、グロー放電処理、活性プラズマ処理、レーザー処理
などの所謂表面処理方法(例えば、米国特許箱2.76
4.520号、第3.497.407号、第3.145
.242号、第3.376、208号、第3.072.
483号、第3.475.193号、第3.360.4
43号、英国特許第788.365号明細書など)によ
り処理したものと、−旦これらの表面処理をした後、該
プラスチックに下塗層を塗設したものとがある。The support is surface-treated as necessary. For example, in the case of a photosensitive lithographic printing plate, the surface of the support is subjected to a hydrophilic treatment. There are various types of such hydrophilic treatment. For example, in the case of a support having a plastic surface, so-called surface treatment methods such as chemical treatment, electric discharge treatment, flame treatment, ultraviolet treatment, high frequency treatment, glow discharge treatment, activated plasma treatment, laser treatment (for example, U.S. Pat. box 2.76
No. 4.520, No. 3.497.407, No. 3.145
.. No. 242, No. 3.376, No. 208, No. 3.072.
No. 483, No. 3.475.193, No. 3.360.4
43, British Patent No. 788.365, etc.), and there are those in which a subbing layer is applied to the plastic after the surface treatment.
塗布方法としても色々工夫が行なわれており、−層目は
プラスチックによる接着し、かつ接着性のよい疎水性の
樹脂層を塗布し、二層目として親水性の樹脂層を塗布す
る重層法と、同一重合体中に疎水基と親木基を含有する
樹脂の層を塗布する単層法とがある。Various methods have been used for coating, such as a multi-layer method in which the first layer is made of plastic and a hydrophobic resin layer with good adhesion is applied, and the second layer is a hydrophilic resin layer. There is also a single layer method in which a layer of resin containing hydrophobic groups and parent wood groups is applied in the same polymer.
金属、特にアルミニウムの表面を有する支持体の場合に
は、砂目立て処理、珪酸ソーダ、フン化ジルコニウム酸
カリウム、燐酸塩等の水溶液への浸漬処理、あるいは陽
極酸化処理などの表面処理がなされていることが好まし
い。また、米国特許第2.714.066号明細書に記
載されているように、砂目立てしたのち珪酸ナトリウム
水溶液に浸漬処理したアルミニウ板、米国特許第3.1
81.461号明細書に記載されているようにアルミニ
ウム板を陽極酸化処理を行った後にアルカリ金属珪酸塩
の水溶液に浸漬処理したものも好適に使用される。In the case of a support having a surface of metal, especially aluminum, surface treatments such as graining treatment, immersion treatment in an aqueous solution of sodium silicate, potassium fluorinated zirconate, phosphate, etc., or anodization treatment are performed. It is preferable. In addition, as described in U.S. Pat. No. 2.714.066, an aluminum plate that is grained and then immersed in a sodium silicate aqueous solution, U.S. Pat.
As described in No. 81.461, an aluminum plate which is anodized and then immersed in an aqueous solution of an alkali metal silicate is also preferably used.
上記陽極酸化処理は、例えば、燐酸、クロム酸、硫酸、
硼酸等の無機酸、若しくは蓚酸、スルファミン酸等の有
機酸又はこれらの塩の水溶液又は非水溶液の単独又は二
種以上を組み合わせた電解液中でアルミニウム板を陽極
として電流を流すことにより実施される。The above anodic oxidation treatment can be performed using, for example, phosphoric acid, chromic acid, sulfuric acid,
It is carried out by passing an electric current through an aluminum plate as an anode in an electrolytic solution consisting of an aqueous solution or a non-aqueous solution of an inorganic acid such as boric acid, an organic acid such as oxalic acid or sulfamic acid, or a salt thereof, or a combination of two or more of them. .
また、米国特許第3.658.662号明細書に記載さ
れているようなシリケート電着も有効である。Also effective is silicate electrodeposition as described in US Pat. No. 3,658,662.
これらの親水化処理は、支持体の表面を親水性とする為
に施される以外に、その上に設けられる感光性組成物と
の有害な反応を防ぐ為や、感光層との密着性を向上させ
る為に施されるものである。These hydrophilic treatments are performed not only to make the surface of the support hydrophilic, but also to prevent harmful reactions with the photosensitive composition provided thereon, and to improve the adhesion with the photosensitive layer. It is done to improve.
アルミニウム板を砂目立てするに先立って、必要に応じ
て表面の圧延油を除去すること及び清浄なアルミニウム
面を表出させるためにその表面の前処理を施しても良い
。前者のためには、トリクレン等の溶剤、界面活性剤等
が用いられている。Prior to graining the aluminum plate, if necessary, the surface may be pretreated to remove rolling oil from the surface and expose a clean aluminum surface. For the former, solvents such as trichlene, surfactants, etc. are used.
又後者のためには水酸化ナトリウム、水酸化カリウム等
のアルカリ・エツチング剤を用いる方法が広く行われて
いる。For the latter, a method using an alkaline etching agent such as sodium hydroxide or potassium hydroxide is widely used.
砂目立て方法としては、機械的、化学的及び電気化学的
な方法のいずれの方法も有効である。機械的方法として
は、ボール研磨法、ブラスト研磨法、軽石のような研磨
剤の水分散スラリーをナイロンブラシで擦りつけるブラ
シ研磨法などがあり、化学的方法としては、特開昭54
−31187号公報に記載されているような鉱酸のアル
ミニウム塩の飽和水溶液に浸漬する方法が適しており、
電気化学的方法としては塩酸、硝酸又はこれらの組合せ
のような酸性電解液中で交流電解する方法が好ましい。Mechanical, chemical, and electrochemical methods are all effective as the graining method. Mechanical methods include the ball polishing method, blast polishing method, and brush polishing method in which a water-dispersed slurry of an abrasive such as pumice is rubbed with a nylon brush.
A method of immersion in a saturated aqueous solution of an aluminum salt of a mineral acid as described in Publication No. 31187 is suitable.
As the electrochemical method, a method of alternating current electrolysis in an acidic electrolyte such as hydrochloric acid, nitric acid, or a combination thereof is preferred.
このような粗面化方法の内、特に特開昭55−1379
93号公報に記載されているような機械的粗面化と電気
化学的粗面化を組合せた粗面化方法は、感脂性画像の支
持体への接着力が強いので好ましい。Among these surface roughening methods, especially Japanese Patent Application Laid-Open No. 55-1379
A surface roughening method that combines mechanical roughening and electrochemical roughening as described in Japanese Patent No. 93 is preferred because it provides strong adhesion of the oil-sensitive image to the support.
上記の如き方法による砂目立ては、アルミニウム板の表
面の中心線表面粗さ()Ia)が0.2〜1.0μとな
るような範囲で施されることが好ましい。Graining by the method described above is preferably carried out in such a range that the centerline surface roughness (Ia) of the surface of the aluminum plate is 0.2 to 1.0 μ.
このようにして砂目立てされたアルミニウム板は必要に
応じて水洗及び化学的にエツチングされる。The thus grained aluminum plate is washed with water and chemically etched as required.
エツチング処理液は、通常アルミニウムを溶解する塩基
又は酸の水溶液より選ばれる。この場合、エツチングさ
れた表面に、エツチング液成分から誘導されるアルミニ
ウムと異なる被膜が形成されないものでなければならな
い。好ましいエツチング剤を例示すれば、塩基性物質と
しては水酸化ナトリウム、水酸化カリウム、燐酸三ナト
リウム、燐酸二す) IJウム、燐酸三カリウム、燐酸
二カリウム等;酸性物質としては硫酸、過硫酸、燐酸、
塩酸及びその塩等であるが、アルミニウムよりイオン化
傾向の低い金属、例えば亜鉛、クロム、コバルト、ニッ
ケル、銅等の塩はエツチング表面に不必要な被膜を形成
するから好ましくない。The etching solution is usually selected from aqueous base or acid solutions that dissolve aluminum. In this case, it is necessary that no film different from aluminum derived from the etching solution components is formed on the etched surface. Examples of preferred etching agents include basic substances such as sodium hydroxide, potassium hydroxide, trisodium phosphate, dibasic phosphate, tripotassium phosphate, and dipotassium phosphate; acidic substances such as sulfuric acid, persulfuric acid, and phosphoric acid,
Examples include hydrochloric acid and its salts, but salts of metals having a lower ionization tendency than aluminum, such as zinc, chromium, cobalt, nickel, copper, etc., are not preferred because they form an unnecessary film on the etched surface.
これ等のエツチング剤は、使用濃度、温度の設定におい
て、使用するアルミニウムあるいは合金の溶解速度が浸
漬時間1分あたり0.3〜40グラム/ゴになる様に行
なわれるのが最も好ましいが、これを上回るあるいは下
回るものであっても差支えない。It is most preferable to use these etching agents in such a way that the concentration and temperature used are such that the dissolution rate of the aluminum or alloy used is 0.3 to 40 grams per minute of immersion time. There is no problem even if it exceeds or falls below.
エツチングは上記エツチング液にアルミニウム板を浸漬
したり、該アルミニウム板にエツチング液を塗布するこ
と等により行われ、エツチング量が0.5〜10g/m
’の範囲となるように処理されることが好ましい。Etching is performed by immersing the aluminum plate in the above etching solution or applying the etching solution to the aluminum plate, and the etching amount is 0.5 to 10 g/m.
' is preferably processed.
上記エツチング剤としては、そのエツチング速度が早い
という特長から塩基の水溶液を使用することが望ましい
。この場合、スマットが生成するので、通常デスマット
される。デスマット処理に使用される酸は、硝酸、硫酸
、燐酸、クロム酸、フッ酸、ホウフッ化水素酸等が用い
られる。As the above-mentioned etching agent, it is desirable to use an aqueous base solution because of its high etching rate. In this case, since smut is generated, it is usually desmutted. The acids used for desmutting include nitric acid, sulfuric acid, phosphoric acid, chromic acid, hydrofluoric acid, and hydrofluoroboric acid.
エツチング処理されたアルミニウム板は、必要により水
洗及び陽極酸化される。陽極酸化は、この分野で従来よ
り行なわれている方法で行なうことができる。具体的に
は、硫酸、燐酸、クロム酸、蓚酸、スルファミン酸、ベ
ンゼンスルホン酸等あるいはそれらの二種類以上を組み
合せた水溶液又は非水溶液中でアルミニウムに直流又は
交流の電流を流すと、アルミニウム支持体表面に陽極酸
化被膜を形成させることができる。The etched aluminum plate is washed with water and anodized if necessary. Anodic oxidation can be performed by methods conventionally practiced in this field. Specifically, when a direct or alternating current is passed through aluminum in an aqueous or non-aqueous solution containing sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfamic acid, benzenesulfonic acid, etc. or a combination of two or more thereof, the aluminum support An anodic oxide film can be formed on the surface.
陽極酸化の処理条件は使用される電解液によって種々変
化するので一概には決定され得ないが、一般的には電解
液の濃度が1〜80重量%、液温5〜70℃、電流密度
0.5〜60アンペア/dm”電圧1〜100V、電解
時間30秒〜50分の範囲が適当である。The processing conditions for anodic oxidation vary depending on the electrolyte used and cannot be determined unconditionally, but generally the electrolyte concentration is 1 to 80% by weight, the solution temperature is 5 to 70°C, and the current density is 0. A suitable range is .5 to 60 amperes/dm, voltage of 1 to 100 V, and electrolysis time of 30 seconds to 50 minutes.
これらの陽極酸化処理の内でも、特に英国特許第1.4
12.768号明細書に記載されている硫酸中で高電流
密度で陽極酸化する方法及び米国特許第3、511.6
61号明細書に記載されている燐酸を電解浴として陽極
酸化する方法が好ましい。Among these anodizing treatments, especially British Patent No. 1.4
12,768 and U.S. Pat. No. 3,511.6.
The method described in No. 61, in which phosphoric acid is used as an electrolytic bath for anodic oxidation, is preferred.
上記のように粗面化され、更に陽極酸化されたアルミニ
ウム板は、必要に応じて親水化処理しても良く、その好
ましい例としては米国特許第2、714.066号及び
同第3.181.461号に開示されているようなアル
カリ金属シリケート、例えば珪酸ナトリウム水溶液又は
特公昭36−22.063号公報に開示されているフッ
化ジルコニウム酸カリウム及び米国特許第4.153.
461号明細書に開示されているようなポリビニルホス
ホン酸で処理する方法がある。The aluminum plate roughened as described above and further anodized may be subjected to a hydrophilic treatment if necessary. Preferred examples thereof include US Pat. No. 2,714.066 and US Pat. Alkali metal silicates such as aqueous sodium silicate solutions as disclosed in Japanese Patent Publication No. 36-22.063 and potassium fluorozirconate as disclosed in U.S. Pat. No. 4.153.
There is a method of treatment with polyvinylphosphonic acid as disclosed in US Pat.
本発明のフッ素系界面活性剤を含む感光性組成物は下記
の有機溶剤の単独あるいは混合したものに溶解又は分散
され、上記のごとき支持体に塗布され乾燥される。The photosensitive composition containing the fluorosurfactant of the present invention is dissolved or dispersed in one or a mixture of the following organic solvents, applied to the above-mentioned support, and dried.
使用される有機溶剤は沸点40℃〜200℃、特に60
℃〜160℃の範囲のものが乾燥の際における有利さか
ら選択される。The organic solvent used has a boiling point of 40°C to 200°C, especially 60°C.
A temperature in the range of .degree. C. to 160.degree. C. is selected for its advantage in drying.
例えば、メチルアルコール、エチルアルコール、n−又
はイソ−プロピルアルコール、n−4はイソ−ブチルア
ルコール、ジアセトンアルコール等のアルコール類、ア
セトン、メチルエチルケトン、メチルプロピルケトン、
メチルブチルケトン、メチルアミルケトン、メチルへキ
シルケトン、ジエチルケトン、ジイソブチルケトン、シ
クロヘキサノン、メチルシクロヘキサノン、アセチルア
セトン等のケトン類、ベンゼン、トルエン、キシレン、
シクロヘキサン、メトキシベンゼン等の炭化水素類、エ
チルアセテート、n−又はイソ−プロピルアセテート、
n−又はイソ−ブチルアセテート1、エチルブチルアセ
テート、ヘキシルアセテート等の酢酸エステル類、乳酸
メチル、乳酸エチル等の乳酸エステル類、メチレンジク
ロライド、エチレンジクロライド、モノクロルベンゼン
等のハロゲン化物、イソプロピルエーテル、n−ブチル
エーテル、ジオキサン、ジメチルジオキサン、テトラヒ
ドロフラン等のエーテル類、エチレングリコール、メチ
ルセロソルブ、メチルセロソルブアセテート、エチルセ
ロソルブ、ジエチルセロソルブ、セロソルブアセテート
、ブチルセロソルブ、ブチルセロソルブアセテート、メ
トキシメトキシエタノール、ジエチレングリコールモノ
メチルエーテル、ジエチレングリコールジメチルエーテ
ル、ジエチレングリコールメチルエチルエーテル、ジエ
チレングリコールジエチルエーテル、プロピレングリコ
ール、プロピレングリコールモノメチルエーテル、プロ
ピレングリコールモノメチルエーテルアセテート、プロ
ピレングリコールモノエチルエーテル、プロピレングリ
コールモノエチルエーテルアセテート、プロピレングリ
コールモノブチルエーテル、3−メチル−3−メトキシ
ブタノール等の多価アルコールとその誘導体、ジメチル
スルホキシド、N、N−ジメチルホルムアミド等の特殊
溶剤などが単独あるいは混合物として好適に使用される
。そして、塗布液中の固形分の濃度は、2〜50重量%
が適当である。For example, alcohols such as methyl alcohol, ethyl alcohol, n- or iso-propyl alcohol, n-4 is iso-butyl alcohol, diacetone alcohol, acetone, methyl ethyl ketone, methyl propyl ketone,
Ketones such as methyl butyl ketone, methyl amyl ketone, methyl hexyl ketone, diethyl ketone, diisobutyl ketone, cyclohexanone, methyl cyclohexanone, acetylacetone, benzene, toluene, xylene,
Hydrocarbons such as cyclohexane and methoxybenzene, ethyl acetate, n- or iso-propyl acetate,
n- or iso-butyl acetate 1, acetate esters such as ethyl butyl acetate and hexyl acetate, lactic acid esters such as methyl lactate and ethyl lactate, halides such as methylene dichloride, ethylene dichloride, and monochlorobenzene, isopropyl ether, n- Ethers such as butyl ether, dioxane, dimethyl dioxane, tetrahydrofuran, ethylene glycol, methyl cellosolve, methyl cellosolve acetate, ethyl cellosolve, diethyl cellosolve, cellosolve acetate, butyl cellosolve, butyl cellosolve acetate, methoxymethoxyethanol, diethylene glycol monomethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl Ethyl ether, diethylene glycol diethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether, 3-methyl-3-methoxybutanol, etc. Hydrolic alcohols and their derivatives, special solvents such as dimethyl sulfoxide, N,N-dimethylformamide, and the like are preferably used alone or in mixtures. The concentration of solid content in the coating liquid is 2 to 50% by weight.
is appropriate.
塗布方法としてはロールコーティング、デイツプコーテ
ィング、エアナイフコーティング、グラビアコーティン
グ、グラビアオフセットコーティング、ホッパーコーテ
ィング、ブレードコーティング、ワイヤドクターコーテ
ィング、スプレーコーティング等の方法が用いられ、特
に10〜100m1/%の塗布液量の範囲が好適である
。As the coating method, roll coating, dip coating, air knife coating, gravure coating, gravure offset coating, hopper coating, blade coating, wire doctor coating, spray coating, etc. are used, especially when the coating liquid amount is 10 to 100 m1/%. A range of is suitable.
乾燥は加熱された空気によって行なわれる。加熱は30
〜200℃、特に、40〜140℃の範囲が好適である
。乾燥温度は乾燥中一定に保たれる方法だけでなく段階
的に上昇させる方法も実施し得る。Drying is done with heated air. Heating is 30
A temperature range of 200°C to 200°C, particularly 40 to 140°C is suitable. It is possible to implement not only a method in which the drying temperature is kept constant during drying, but also a method in which it is increased stepwise.
又、乾燥風は除湿することによって好結果が得られる場
合もある。加熱された空気は塗布面に対し、0.1〜3
0m/秒、特に0.5〜20m/秒の割合で供給するの
が好適である。Also, good results may be obtained by dehumidifying the dry air. The heated air is 0.1 to 3
It is preferred to feed at a rate of 0 m/sec, especially 0.5 to 20 m/sec.
本発明により、乾燥工程において従来発生していた感光
層の膜厚の不均一がなくなり、印刷版としての性能が均
一化されるとともに、インキ受容性を向上することがで
きる。According to the present invention, the non-uniformity of the thickness of the photosensitive layer that conventionally occurs in the drying process is eliminated, the performance as a printing plate is made uniform, and the ink receptivity can be improved.
以下、本発明を実施例に基づいて、更に詳細に説明する
。ただし、本発明はこれらの実施例によって限定される
ものではない。なお、実施例中の%は、重量%を示す。Hereinafter, the present invention will be explained in more detail based on examples. However, the present invention is not limited to these Examples. In addition, % in an example shows weight %.
実施例1及び比較例1〜8
厚さQ、 3 龍、巾1,000龍の帯状アルミニウム
を搬送し、まず80℃に保った第三燐酸ナトリウムの1
0%水溶液中を1分間通過させて脱脂を行なった。次に
ナイロンブラシと400メ・ノシュのバミスー水懸濁液
を用い、この表面を砂目立てし、よく水で洗滌した。こ
の板を、45℃の25%水酸化ナトリウム水溶液に9秒
間浸漬して工・ノチングを行ない、水洗後、更に20%
硝酸に20秒間浸漬して水洗した。この時の砂目立て表
面のエツチング量を約8g/mであった。次に、この仮
を7%硫酸を電解液として電流密度15A/dm2で3
g/rrrの直流陽極酸化皮膜を設けた後、水洗乾燥
し、以下の感光液塗布工程に導いた。Example 1 and Comparative Examples 1 to 8 A strip of aluminum having a thickness of Q, 3 mm and a width of 1,000 mm was transported and first heated to 1 mm of trisodium phosphate kept at 80°C.
Degreasing was performed by passing through a 0% aqueous solution for 1 minute. Next, the surface was grained using a nylon brush and a 400 meter Bamisu water suspension, and thoroughly washed with water. This board was immersed in a 25% sodium hydroxide aqueous solution at 45°C for 9 seconds to perform processing and notching, and after washing with water, an additional 20%
It was immersed in nitric acid for 20 seconds and washed with water. The amount of etching on the grained surface at this time was approximately 8 g/m. Next, this temporary was used as an electrolyte with 7% sulfuric acid at a current density of 15 A/dm2 for 3 hours.
After forming a DC anodic oxide film of g/rrr, it was washed with water and dried, followed by the following photosensitive liquid coating step.
次の感光液を準備した。The following photosensitive solution was prepared.
ことによって乾燥し、感光層を形成した。This was dried to form a photosensitive layer.
このようにして、各種フッ素系界面活性剤を添加した感
光層を設けた感光性平版印刷版(実施例1及び比較例1
〜7)、及びフッ素系界面活性剤を添加しなかった感光
層を設けた感光性平版印刷版(比較例8)の性能を評価
した結果を以下の表1に示す。In this way, photosensitive lithographic printing plates (Example 1 and Comparative Example 1) provided with photosensitive layers containing various fluorosurfactants were prepared.
Table 1 below shows the results of evaluating the performance of 7) and a photosensitive lithographic printing plate (Comparative Example 8) provided with a photosensitive layer to which no fluorosurfactant was added.
注■:米国特許第3,635,709号明細書中、実施
例1に記載されているもの。Note ■: As described in Example 1 of US Pat. No. 3,635,709.
上記感光液を砂目立てされた帯状アルミニウム上に連続
的に30g/mの割合で塗布した後、100℃の熱風の
乾燥ゾーンを1分間通過させる表1において、感光層の
均一性は、乾燥風等による色ムラ並びに塗布時及び乾燥
時に発生するスジムラ故障について目視判定を行なった
ものである。In Table 1, the uniformity of the photosensitive layer was determined by applying the above photosensitive liquid continuously on a grained aluminum strip at a rate of 30 g/m and then passing it through a hot air drying zone at 100°C for 1 minute. Visual judgment was made for color unevenness caused by such factors as well as line unevenness failures that occur during coating and drying.
表1から、本発明によるフッ素系界面活性剤を用いた実
施例1は、感光層の膜厚の均一性が、添加しなかった比
較例8と比べて格段に向上していることがわかる。また
、表1において、インキ受容性は、画像フィルムを通し
て露光後、富士写真フィルム■製自動現像機800U、
同社製自動現像液DP−4(1: 8)25℃40秒現
像処理を行ない、同社製ガム(GP)を塗布して1週間
後印刷を行ない、インキが完全に付着するまでの印刷枚
数で評価した。表1から本発明によるフッ素系界面活性
剤を用いた実施例1は、添加しなかった比較例8と比べ
て格段にインキ受容性が向上していることがわかる。From Table 1, it can be seen that in Example 1 in which the fluorine-based surfactant of the present invention was used, the uniformity of the thickness of the photosensitive layer was significantly improved compared to Comparative Example 8 in which the fluorine-based surfactant was not added. In addition, in Table 1, the ink receptivity was measured using an automatic processor 800U manufactured by Fuji Photo Film ■ after exposure through an image film.
The company's automatic developer DP-4 (1:8) was used to develop the product at 25°C for 40 seconds, and the company's gum (GP) was applied and printing was performed one week later. evaluated. From Table 1, it can be seen that Example 1 using the fluorine-based surfactant of the present invention has significantly improved ink receptivity compared to Comparative Example 8 where no fluorine-based surfactant was added.
また、本発明以外のフッ素系界面活性剤を用いた比較例
1〜7では感光層の均−性及び/又はインキ受容性が悪
いことがわかる。Furthermore, it can be seen that in Comparative Examples 1 to 7 in which fluorosurfactants other than those of the present invention were used, the uniformity and/or ink receptivity of the photosensitive layer was poor.
実施例1により得られた感光性平版印刷版をオリジナル
フィルムと密着露光した後、富士写真フィルム01製ポ
ジ用現像液DP−4(t : 8)で現像したところ、
感度、オリジナルパターンの再現性の均一なすぐれたも
のであることがわかった。After the photosensitive lithographic printing plate obtained in Example 1 was exposed in close contact with the original film, it was developed with a positive developer DP-4 (t: 8) manufactured by Fuji Photo Film 01.
It was found that the sensitivity and reproducibility of the original pattern were uniform and excellent.
これを用いて印刷したところ、耐剛力、画像強度の均一
なすぐれたものであることがわかった。When this was used for printing, it was found to have excellent stiffness resistance and uniform image strength.
実施例2及び比較例9
実施例1において陽極酸化皮膜を設けた帯状アルミニウ
ム支持体を70℃の珪酸ナトリウム2.5%水溶液中に
30秒間通過させた後、水洗乾燥し、塗布工程に導いた
。Example 2 and Comparative Example 9 The band-shaped aluminum support provided with the anodic oxide film in Example 1 was passed through a 2.5% aqueous sodium silicate solution at 70°C for 30 seconds, washed with water and dried, and led to the coating process. .
次に、以下の組成の感光液を準備した。Next, a photosensitive solution having the following composition was prepared.
怒−]L二辰
なお、比較例9では、フッ素系界面活性剤1を使用しな
かった。Note that in Comparative Example 9, fluorine-based surfactant 1 was not used.
上記感光液を前記帯状アルミニウムに連続的に40g/
−nfの割合で塗布した後、80℃の熱風が供給されて
いる乾燥ゾーンを1分間で、100℃の熱風が供給され
ている乾燥ゾーンを1分間で通過させることによって乾
燥させ、感光層を形成した。Continuously apply 40 g of the photosensitive solution to the aluminum strip.
-nf, the photosensitive layer is dried by passing through a drying zone supplied with hot air at 80°C for 1 minute and through a drying zone supplied with hot air at 100°C for 1 minute. Formed.
フッ素系界面活性剤を添加しなかった比較例9では、強
いもやもやとしたムラが発生したが、実施例2では、均
一な膜厚の感光層を得ることができた。In Comparative Example 9, in which no fluorosurfactant was added, strong hazy unevenness occurred, but in Example 2, a photosensitive layer with a uniform thickness could be obtained.
乾燥後シート状に切断された感光性平版印刷版はネガ型
の印刷版として、感度、再現性にすぐれ、これから得ら
れた印刷版は耐剛性、画像強度等の均一な、すぐれたも
のであった。The photosensitive lithographic printing plate cut into sheets after drying is a negative printing plate with excellent sensitivity and reproducibility, and the printing plate obtained from this plate has excellent rigidity resistance and uniform image strength. Ta.
露光・現像後、富士写真フィルム0菊製ガム(GU−2
)を塗布して1週間後に印刷を行なったところ、比較例
9ではインキが完全に付着するまでに45枚を要したの
に対して、実施例2では26枚と、インキ受容性が良好
であった。After exposure and development, Fuji Photo Film 0 Chrysanthemum Gum (GU-2)
) was applied and printed one week later. Comparative Example 9 required 45 sheets for the ink to completely adhere, whereas Example 2 required 26 sheets, indicating good ink receptivity. there were.
実施例3〜7
フッ素系界面活性剤としてそれぞれ以下の化合物を使用
した他は、実施例1と同様にして感光性平版印刷版及び
刷版を作成し、同様に評価したところ、実施例1と同様
に良好な結果が得られた。Examples 3 to 7 Photosensitive lithographic printing plates and printing plates were prepared in the same manner as in Example 1, except that the following compounds were used as fluorosurfactants, and evaluated in the same manner. Similarly good results were obtained.
実施例3 実施例6 実施例4 実施例7 実施例5Example 3 Example 6 Example 4 Example 7 Example 5
Claims (2)
いて、該フッ素系界面活性剤が、 (i)3〜20の炭素原子を有しかつ40重量%以上の
フッ素を含有し、末端の少くとも3つの炭素原子が十分
にフッ素化されているフルオロ脂肪族基(Rf基)を含
有するアクリレート又はメタクリレートと、 (ii)ポリ(オキシアルキレン)アクリレート又はメ
タクリレートと、 (iii)10〜22の炭素原子からなる炭化水素基(
RH基)を含有するアクリレート又はメタクリレートと
、 の共重合体であり、各モノマー単位が該共重合体の重量
に基づいて(i)10〜50重量%、(ii)10〜5
0重量%及び(iii)40〜70重量%であることを
特徴とする感光性組成物。(1) In a photosensitive composition containing a fluorine-based surfactant, the fluorine-based surfactant (i) has 3 to 20 carbon atoms and contains 40% by weight or more of fluorine, and has a terminal an acrylate or methacrylate containing a fluoroaliphatic group (Rf group) in which at least three carbon atoms are fully fluorinated; (ii) a poly(oxyalkylene) acrylate or methacrylate; (iii) 10 to 22 Hydrocarbon group consisting of carbon atoms (
RH group) containing acrylate or methacrylate, and each monomer unit is (i) 10 to 50% by weight, (ii) 10 to 5% by weight, based on the weight of the copolymer.
0% by weight and (iii) 40 to 70% by weight.
0である請求項1記載の感光性組成物。(2) The molecular weight of the copolymer is 2,500 to 100,00
2. The photosensitive composition according to claim 1, wherein the photosensitive composition is 0.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31275689A JPH03172849A (en) | 1989-12-01 | 1989-12-01 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31275689A JPH03172849A (en) | 1989-12-01 | 1989-12-01 | Photosensitive composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03172849A true JPH03172849A (en) | 1991-07-26 |
Family
ID=18033047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31275689A Pending JPH03172849A (en) | 1989-12-01 | 1989-12-01 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03172849A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0573278A2 (en) * | 1992-06-03 | 1993-12-08 | NIPPON OIL Co. Ltd. | Method of making compensator for liquid crystal display |
WO1996009417A1 (en) * | 1994-09-21 | 1996-03-28 | Minnesota Mining And Manufacturing Company | Leaching of precious metal ore with fluoroaliphatic surfactant |
EP0843218A1 (en) * | 1996-11-14 | 1998-05-20 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
EP0949539A3 (en) * | 1998-04-06 | 2000-01-19 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
US6689539B2 (en) | 2000-01-05 | 2004-02-10 | Kodak Polychrome Graphics Llc | Photosensitive composition and photosensitive lithographic printing plate |
JP2013205801A (en) * | 2012-03-29 | 2013-10-07 | Sumitomo Bakelite Co Ltd | Photosensitive resin composition, cured film of the same, protective film, insulting film, semiconductor device, and display device |
-
1989
- 1989-12-01 JP JP31275689A patent/JPH03172849A/en active Pending
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0573278A2 (en) * | 1992-06-03 | 1993-12-08 | NIPPON OIL Co. Ltd. | Method of making compensator for liquid crystal display |
EP0573278A3 (en) * | 1992-06-03 | 1994-04-06 | Nippon Oil Co Ltd | |
WO1996009417A1 (en) * | 1994-09-21 | 1996-03-28 | Minnesota Mining And Manufacturing Company | Leaching of precious metal ore with fluoroaliphatic surfactant |
US5612431A (en) * | 1994-09-21 | 1997-03-18 | Minnesota Mining And Manufacturing Company | Leaching of precious metal ore with fluoroaliphatic surfactant |
US5827348A (en) * | 1994-09-21 | 1998-10-27 | Minnesota Mining And Manufacturing Company | Leaching of precious metal ore with fluoroaliphatic surfactant |
EP0843218A1 (en) * | 1996-11-14 | 1998-05-20 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
EP0949539A3 (en) * | 1998-04-06 | 2000-01-19 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
EP1225478A3 (en) * | 1998-04-06 | 2002-07-31 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
EP1314552A2 (en) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
EP1314552A3 (en) * | 1998-04-06 | 2003-06-04 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
US6746812B2 (en) | 1998-04-06 | 2004-06-08 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
US6689539B2 (en) | 2000-01-05 | 2004-02-10 | Kodak Polychrome Graphics Llc | Photosensitive composition and photosensitive lithographic printing plate |
JP2013205801A (en) * | 2012-03-29 | 2013-10-07 | Sumitomo Bakelite Co Ltd | Photosensitive resin composition, cured film of the same, protective film, insulting film, semiconductor device, and display device |
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