JPS6418142A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS6418142A
JPS6418142A JP17443787A JP17443787A JPS6418142A JP S6418142 A JPS6418142 A JP S6418142A JP 17443787 A JP17443787 A JP 17443787A JP 17443787 A JP17443787 A JP 17443787A JP S6418142 A JPS6418142 A JP S6418142A
Authority
JP
Japan
Prior art keywords
acrylate
titled composition
methacrylate
oxyalkylene
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17443787A
Other languages
Japanese (ja)
Other versions
JPH06105350B2 (en
Inventor
Toshiyuki Sekiya
Hiroshi Misu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP62174437A priority Critical patent/JPH06105350B2/en
Publication of JPS6418142A publication Critical patent/JPS6418142A/en
Publication of JPH06105350B2 publication Critical patent/JPH06105350B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To enable the alkaline development, and to improve the forming property of the titled composition, by incorporating a copolymer contg. at least one kind of a specified acrylate or methacrylate, and a specified oxyalkylene acrylate, as a structural unit respectively, in the titled composition. CONSTITUTION:The titled composition contains the acrylate or the methacrylate having an alkyl or a substd. alkyl group having >=4 carbon atom, and the acrylate or the methacrylate which has 3-20 carbon atoms and contains >=30wt.% a fluorine atom, and has a fluoroaliphatic group fully fluorated at least 3 carbon atoms at end group. And, the titled composition contains the copolymer contg. at least one kind of oxyalkylene acrylate and poly(oxyalkylene) acrylate, etc., respectively. Thus, the alkaline development of the titled composition enables, and the high forming property of said composition is obtd.
JP62174437A 1987-07-13 1987-07-13 Photosensitive composition for lithographic printing plate Expired - Fee Related JPH06105350B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62174437A JPH06105350B2 (en) 1987-07-13 1987-07-13 Photosensitive composition for lithographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62174437A JPH06105350B2 (en) 1987-07-13 1987-07-13 Photosensitive composition for lithographic printing plate

Publications (2)

Publication Number Publication Date
JPS6418142A true JPS6418142A (en) 1989-01-20
JPH06105350B2 JPH06105350B2 (en) 1994-12-21

Family

ID=15978506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62174437A Expired - Fee Related JPH06105350B2 (en) 1987-07-13 1987-07-13 Photosensitive composition for lithographic printing plate

Country Status (1)

Country Link
JP (1) JPH06105350B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0842960A1 (en) * 1996-06-03 1998-05-20 Toyo Ink Manufacturing Co., Ltd. Curable liquid resin composition
US6689539B2 (en) 2000-01-05 2004-02-10 Kodak Polychrome Graphics Llc Photosensitive composition and photosensitive lithographic printing plate

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
JPS5740249A (en) * 1980-06-14 1982-03-05 Hoechst Ag Photographic copying material and method of coating photosensitive copying layer on support
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
JPS59137943A (en) * 1983-01-28 1984-08-08 W R Gureesu:Kk Photosensitive resin composition
JPS6236657A (en) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd Resist composition
JPS62170950A (en) * 1986-01-23 1987-07-28 Fuji Photo Film Co Ltd Photosensitive composition
JPS62226143A (en) * 1986-03-27 1987-10-05 Fuji Photo Film Co Ltd Photosensitive composition

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
JPS5740249A (en) * 1980-06-14 1982-03-05 Hoechst Ag Photographic copying material and method of coating photosensitive copying layer on support
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
JPS59137943A (en) * 1983-01-28 1984-08-08 W R Gureesu:Kk Photosensitive resin composition
JPS6236657A (en) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd Resist composition
JPS62170950A (en) * 1986-01-23 1987-07-28 Fuji Photo Film Co Ltd Photosensitive composition
JPS62226143A (en) * 1986-03-27 1987-10-05 Fuji Photo Film Co Ltd Photosensitive composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0842960A1 (en) * 1996-06-03 1998-05-20 Toyo Ink Manufacturing Co., Ltd. Curable liquid resin composition
EP0842960A4 (en) * 1996-06-03 1999-09-22 Toyo Ink Mfg Co Curable liquid resin composition
US6689539B2 (en) 2000-01-05 2004-02-10 Kodak Polychrome Graphics Llc Photosensitive composition and photosensitive lithographic printing plate

Also Published As

Publication number Publication date
JPH06105350B2 (en) 1994-12-21

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Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees