JPS54127598A - Process for fabricating transparent conductive film - Google Patents

Process for fabricating transparent conductive film

Info

Publication number
JPS54127598A
JPS54127598A JP3563478A JP3563478A JPS54127598A JP S54127598 A JPS54127598 A JP S54127598A JP 3563478 A JP3563478 A JP 3563478A JP 3563478 A JP3563478 A JP 3563478A JP S54127598 A JPS54127598 A JP S54127598A
Authority
JP
Japan
Prior art keywords
transparent conductive
conductive film
added
permeability
argon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3563478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6215961B2 (enrdf_load_stackoverflow
Inventor
Yutaka Takato
Sadatoshi Takechi
Kozo Yano
Tomio Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP3563478A priority Critical patent/JPS54127598A/ja
Publication of JPS54127598A publication Critical patent/JPS54127598A/ja
Publication of JPS6215961B2 publication Critical patent/JPS6215961B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes

Landscapes

  • Conductive Materials (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP3563478A 1978-03-27 1978-03-27 Process for fabricating transparent conductive film Granted JPS54127598A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3563478A JPS54127598A (en) 1978-03-27 1978-03-27 Process for fabricating transparent conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3563478A JPS54127598A (en) 1978-03-27 1978-03-27 Process for fabricating transparent conductive film

Publications (2)

Publication Number Publication Date
JPS54127598A true JPS54127598A (en) 1979-10-03
JPS6215961B2 JPS6215961B2 (enrdf_load_stackoverflow) 1987-04-10

Family

ID=12447296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3563478A Granted JPS54127598A (en) 1978-03-27 1978-03-27 Process for fabricating transparent conductive film

Country Status (1)

Country Link
JP (1) JPS54127598A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58209009A (ja) * 1982-05-28 1983-12-05 株式会社日立製作所 透明導電膜の形成方法
JPS62190612A (ja) * 1986-02-17 1987-08-20 株式会社半導体エネルギー研究所 酸化亜鉛導電膜の作製方法
WO2001071054A1 (en) * 2000-03-22 2001-09-27 Pilkington Plc Process for coating glass surfaces
JP2003532997A (ja) * 2000-05-12 2003-11-05 ウンアクシス ドイチェランド ゲーエムベーハー インジウム−スズ酸化物（ｉｔｏ）フィルム及びその製造方法
US7928946B2 (en) 1991-06-14 2011-04-19 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method of driving the same
JP2011091063A (ja) * 2011-02-09 2011-05-06 Inst Of Materials Research & Engineering Ｏｌｅｄデバイスの性能を向上させるための改善された透明電極材料

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58209009A (ja) * 1982-05-28 1983-12-05 株式会社日立製作所 透明導電膜の形成方法
JPS62190612A (ja) * 1986-02-17 1987-08-20 株式会社半導体エネルギー研究所 酸化亜鉛導電膜の作製方法
US7928946B2 (en) 1991-06-14 2011-04-19 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method of driving the same
WO2001071054A1 (en) * 2000-03-22 2001-09-27 Pilkington Plc Process for coating glass surfaces
JP2003532997A (ja) * 2000-05-12 2003-11-05 ウンアクシス ドイチェランド ゲーエムベーハー インジウム−スズ酸化物（ｉｔｏ）フィルム及びその製造方法
JP2011091063A (ja) * 2011-02-09 2011-05-06 Inst Of Materials Research & Engineering Ｏｌｅｄデバイスの性能を向上させるための改善された透明電極材料

Also Published As

Publication number Publication date
JPS6215961B2 (enrdf_load_stackoverflow) 1987-04-10

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