JPS54101273A - Manufacture for semiconductor device - Google Patents
Manufacture for semiconductor deviceInfo
- Publication number
- JPS54101273A JPS54101273A JP796578A JP796578A JPS54101273A JP S54101273 A JPS54101273 A JP S54101273A JP 796578 A JP796578 A JP 796578A JP 796578 A JP796578 A JP 796578A JP S54101273 A JPS54101273 A JP S54101273A
- Authority
- JP
- Japan
- Prior art keywords
- perforated layer
- manufacture
- semiconductor device
- heavy metal
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910001385 heavy metal Inorganic materials 0.000 abstract 2
- 238000011109 contamination Methods 0.000 abstract 1
- 230000005684 electric field Effects 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
Landscapes
- Formation Of Insulating Films (AREA)
- Drying Of Semiconductors (AREA)
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP796578A JPS54101273A (en) | 1978-01-26 | 1978-01-26 | Manufacture for semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP796578A JPS54101273A (en) | 1978-01-26 | 1978-01-26 | Manufacture for semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54101273A true JPS54101273A (en) | 1979-08-09 |
| JPS6225252B2 JPS6225252B2 (cs) | 1987-06-02 |
Family
ID=11680172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP796578A Granted JPS54101273A (en) | 1978-01-26 | 1978-01-26 | Manufacture for semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54101273A (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008511136A (ja) * | 2004-08-17 | 2008-04-10 | セシリア ワイ マック | 多孔質膜の堆積方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0353360U (cs) * | 1989-09-30 | 1991-05-23 |
-
1978
- 1978-01-26 JP JP796578A patent/JPS54101273A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008511136A (ja) * | 2004-08-17 | 2008-04-10 | セシリア ワイ マック | 多孔質膜の堆積方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6225252B2 (cs) | 1987-06-02 |
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