JPS5360580A - Etching method of semiconductor material - Google Patents

Etching method of semiconductor material

Info

Publication number
JPS5360580A
JPS5360580A JP13604576A JP13604576A JPS5360580A JP S5360580 A JPS5360580 A JP S5360580A JP 13604576 A JP13604576 A JP 13604576A JP 13604576 A JP13604576 A JP 13604576A JP S5360580 A JPS5360580 A JP S5360580A
Authority
JP
Japan
Prior art keywords
semiconductor material
etching method
porous
etching
away
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13604576A
Other languages
Japanese (ja)
Inventor
Masanori Matsuo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP13604576A priority Critical patent/JPS5360580A/en
Publication of JPS5360580A publication Critical patent/JPS5360580A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To reduce lateral etching by converting the regions of semiconductor wafers to be etched away to porous and further to porous insulation films thereafter etching these away.
COPYRIGHT: (C)1978,JPO&Japio
JP13604576A 1976-11-11 1976-11-11 Etching method of semiconductor material Pending JPS5360580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13604576A JPS5360580A (en) 1976-11-11 1976-11-11 Etching method of semiconductor material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13604576A JPS5360580A (en) 1976-11-11 1976-11-11 Etching method of semiconductor material

Publications (1)

Publication Number Publication Date
JPS5360580A true JPS5360580A (en) 1978-05-31

Family

ID=15165878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13604576A Pending JPS5360580A (en) 1976-11-11 1976-11-11 Etching method of semiconductor material

Country Status (1)

Country Link
JP (1) JPS5360580A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2449971A1 (en) * 1979-02-22 1980-09-19 Rca Corp ONE-TIME ATTACK METHOD FOR FORMING A MESA STRUCTURE HAVING MULTI-STAGE WALL

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2449971A1 (en) * 1979-02-22 1980-09-19 Rca Corp ONE-TIME ATTACK METHOD FOR FORMING A MESA STRUCTURE HAVING MULTI-STAGE WALL

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