JPS51124379A - Plasma etching method - Google Patents
Plasma etching methodInfo
- Publication number
- JPS51124379A JPS51124379A JP4931375A JP4931375A JPS51124379A JP S51124379 A JPS51124379 A JP S51124379A JP 4931375 A JP4931375 A JP 4931375A JP 4931375 A JP4931375 A JP 4931375A JP S51124379 A JPS51124379 A JP S51124379A
- Authority
- JP
- Japan
- Prior art keywords
- etching method
- plasma etching
- etching
- etched
- positions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: In the plasm etching method by which silicon semiconductors are etched with the use of a gas plasma, to perform uniform etching without any etching variation due to positions in the same wafer.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4931375A JPS51124379A (en) | 1975-04-23 | 1975-04-23 | Plasma etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4931375A JPS51124379A (en) | 1975-04-23 | 1975-04-23 | Plasma etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51124379A true JPS51124379A (en) | 1976-10-29 |
Family
ID=12827461
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4931375A Pending JPS51124379A (en) | 1975-04-23 | 1975-04-23 | Plasma etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51124379A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5271788A (en) * | 1991-07-23 | 1993-12-21 | Tokyo Electron Limited | Plasma processing apparatus |
-
1975
- 1975-04-23 JP JP4931375A patent/JPS51124379A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5271788A (en) * | 1991-07-23 | 1993-12-21 | Tokyo Electron Limited | Plasma processing apparatus |
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