JPS51124379A - Plasma etching method - Google Patents

Plasma etching method

Info

Publication number
JPS51124379A
JPS51124379A JP4931375A JP4931375A JPS51124379A JP S51124379 A JPS51124379 A JP S51124379A JP 4931375 A JP4931375 A JP 4931375A JP 4931375 A JP4931375 A JP 4931375A JP S51124379 A JPS51124379 A JP S51124379A
Authority
JP
Japan
Prior art keywords
etching method
plasma etching
etching
etched
positions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4931375A
Other languages
Japanese (ja)
Inventor
Atsushi Sudo
Motoki Okazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4931375A priority Critical patent/JPS51124379A/en
Publication of JPS51124379A publication Critical patent/JPS51124379A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: In the plasm etching method by which silicon semiconductors are etched with the use of a gas plasma, to perform uniform etching without any etching variation due to positions in the same wafer.
COPYRIGHT: (C)1976,JPO&Japio
JP4931375A 1975-04-23 1975-04-23 Plasma etching method Pending JPS51124379A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4931375A JPS51124379A (en) 1975-04-23 1975-04-23 Plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4931375A JPS51124379A (en) 1975-04-23 1975-04-23 Plasma etching method

Publications (1)

Publication Number Publication Date
JPS51124379A true JPS51124379A (en) 1976-10-29

Family

ID=12827461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4931375A Pending JPS51124379A (en) 1975-04-23 1975-04-23 Plasma etching method

Country Status (1)

Country Link
JP (1) JPS51124379A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5271788A (en) * 1991-07-23 1993-12-21 Tokyo Electron Limited Plasma processing apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5271788A (en) * 1991-07-23 1993-12-21 Tokyo Electron Limited Plasma processing apparatus

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