JPS5396766A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5396766A JPS5396766A JP1196577A JP1196577A JPS5396766A JP S5396766 A JPS5396766 A JP S5396766A JP 1196577 A JP1196577 A JP 1196577A JP 1196577 A JP1196577 A JP 1196577A JP S5396766 A JPS5396766 A JP S5396766A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- buried layer
- layer
- forming
- collector electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Bipolar Transistors (AREA)
- Element Separation (AREA)
Abstract
PURPOSE: To considerably reduce resistances between buried layer collector electrodes by forming a metal layer from an island form epitaxial layer surface down to an n type buried layer without contacting base and emitter layers.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1196577A JPS5396766A (en) | 1977-02-04 | 1977-02-04 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1196577A JPS5396766A (en) | 1977-02-04 | 1977-02-04 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5396766A true JPS5396766A (en) | 1978-08-24 |
Family
ID=11792321
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1196577A Pending JPS5396766A (en) | 1977-02-04 | 1977-02-04 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5396766A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57113267A (en) * | 1980-11-19 | 1982-07-14 | Ibm | Method of producing semiconductor device |
JPS57176742A (en) * | 1981-04-21 | 1982-10-30 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device and manufacture thereof |
JPS63204649A (en) * | 1987-02-19 | 1988-08-24 | Nec Corp | Semiconductor device |
JPH02152241A (en) * | 1988-12-02 | 1990-06-12 | Nec Corp | Integrated circuit device |
JPH0369124A (en) * | 1989-08-08 | 1991-03-25 | Nec Corp | Semiconductor integrated circuit |
JPH06101470B2 (en) * | 1984-02-03 | 1994-12-12 | アドバンスト・マイクロ・ディバイシズ・インコ−ポレ−テッド | Integrated circuit device with active elements consisting of bipolar transistors formed in slots |
JP2007501511A (en) * | 2003-08-02 | 2007-01-25 | ゼテックス・ピーエルシー | Low saturation voltage bipolar transistor |
-
1977
- 1977-02-04 JP JP1196577A patent/JPS5396766A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57113267A (en) * | 1980-11-19 | 1982-07-14 | Ibm | Method of producing semiconductor device |
JPH0235468B2 (en) * | 1980-11-19 | 1990-08-10 | Intaanashonaru Bijinesu Mashiinzu Corp | |
JPS57176742A (en) * | 1981-04-21 | 1982-10-30 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device and manufacture thereof |
JPS6322463B2 (en) * | 1981-04-21 | 1988-05-12 | Nippon Telegraph & Telephone | |
JPH06101470B2 (en) * | 1984-02-03 | 1994-12-12 | アドバンスト・マイクロ・ディバイシズ・インコ−ポレ−テッド | Integrated circuit device with active elements consisting of bipolar transistors formed in slots |
JPS63204649A (en) * | 1987-02-19 | 1988-08-24 | Nec Corp | Semiconductor device |
JPH02152241A (en) * | 1988-12-02 | 1990-06-12 | Nec Corp | Integrated circuit device |
JPH0369124A (en) * | 1989-08-08 | 1991-03-25 | Nec Corp | Semiconductor integrated circuit |
JP2007501511A (en) * | 2003-08-02 | 2007-01-25 | ゼテックス・ピーエルシー | Low saturation voltage bipolar transistor |
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