JPS5389655A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5389655A
JPS5389655A JP392077A JP392077A JPS5389655A JP S5389655 A JPS5389655 A JP S5389655A JP 392077 A JP392077 A JP 392077A JP 392077 A JP392077 A JP 392077A JP S5389655 A JPS5389655 A JP S5389655A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
thickness
wafers
registers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP392077A
Other languages
Japanese (ja)
Inventor
Shigeru Takahashi
Takaya Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP392077A priority Critical patent/JPS5389655A/en
Publication of JPS5389655A publication Critical patent/JPS5389655A/en
Pending legal-status Critical Current

Links

Landscapes

  • Element Separation (AREA)
  • Dicing (AREA)

Abstract

PURPOSE: To make even the thickness of semiconductor substrates and the thickness of wafers and achieve the improvement in yield by using etching registers such as SiO2 etc. on Si polycrystalline layer.
COPYRIGHT: (C)1978,JPO&Japio
JP392077A 1977-01-19 1977-01-19 Production of semiconductor device Pending JPS5389655A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP392077A JPS5389655A (en) 1977-01-19 1977-01-19 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP392077A JPS5389655A (en) 1977-01-19 1977-01-19 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5389655A true JPS5389655A (en) 1978-08-07

Family

ID=11570579

Family Applications (1)

Application Number Title Priority Date Filing Date
JP392077A Pending JPS5389655A (en) 1977-01-19 1977-01-19 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5389655A (en)

Similar Documents

Publication Publication Date Title
JPS5351970A (en) Manufacture for semiconductor substrate
JPS5244173A (en) Method of flat etching of silicon substrate
JPS53104156A (en) Manufacture for semiconductor device
JPS5389374A (en) Production of semiconductor device
JPS5389655A (en) Production of semiconductor device
JPS542070A (en) Manufacture for semiconductor element
JPS543473A (en) Manufacture of semiconductor device
JPS5243385A (en) Process for production of semiconductor integrated circuit
JPS5382174A (en) Surface processing method for semiconductor device
JPS5244175A (en) Method of flat etching of silicon substrate
JPS5244579A (en) Process for production of mos type semiconductor device
JPS5436182A (en) Manufacture for semiconductor device
JPS5436192A (en) Manufacture for semiconductor
JPS5249771A (en) Process for production of semiconductor device
JPS5243369A (en) Flat etching method for silicon
JPS53116787A (en) Production of semiconductor device
JPS5328374A (en) Wafer production
JPS5397791A (en) Production of semiconductor integrated circuit device
JPS5244165A (en) Process for production of semiconductor device
JPS52119192A (en) Semiconductor
JPS53147479A (en) Production of semiconductor device
JPS52153676A (en) Production of semiconductor device
JPS53142870A (en) Manufacture for semiconductor device
JPS5428580A (en) Manufacture of semiconductor device
JPS5283180A (en) Production of semiconductor device