JPS5376758A - Plasma etching method - Google Patents
Plasma etching methodInfo
- Publication number
- JPS5376758A JPS5376758A JP15211376A JP15211376A JPS5376758A JP S5376758 A JPS5376758 A JP S5376758A JP 15211376 A JP15211376 A JP 15211376A JP 15211376 A JP15211376 A JP 15211376A JP S5376758 A JPS5376758 A JP S5376758A
- Authority
- JP
- Japan
- Prior art keywords
- plasma etching
- etching method
- etchingof
- impinge
- letting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15211376A JPS5376758A (en) | 1976-12-20 | 1976-12-20 | Plasma etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15211376A JPS5376758A (en) | 1976-12-20 | 1976-12-20 | Plasma etching method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5376758A true JPS5376758A (en) | 1978-07-07 |
JPS5538053B2 JPS5538053B2 (ja) | 1980-10-02 |
Family
ID=15533331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15211376A Granted JPS5376758A (en) | 1976-12-20 | 1976-12-20 | Plasma etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5376758A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5691447A (en) * | 1979-12-25 | 1981-07-24 | Seiko Epson Corp | Forming of element segregation region of semiconductor integrated circuit |
JPS5691446A (en) * | 1979-12-25 | 1981-07-24 | Seiko Epson Corp | Forming of element segregation region of semiconductor integrated circuit |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5171597A (ja) * | 1974-12-18 | 1976-06-21 | Hitachi Ltd | Ionkakosochi |
JPS5334461A (en) * | 1976-09-13 | 1978-03-31 | Toshiba Corp | Operating method for accumulating tube |
JPS5368171A (en) * | 1976-11-30 | 1978-06-17 | Hitachi Ltd | Method and apparatus for plasma treatment |
-
1976
- 1976-12-20 JP JP15211376A patent/JPS5376758A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5171597A (ja) * | 1974-12-18 | 1976-06-21 | Hitachi Ltd | Ionkakosochi |
JPS5334461A (en) * | 1976-09-13 | 1978-03-31 | Toshiba Corp | Operating method for accumulating tube |
JPS5368171A (en) * | 1976-11-30 | 1978-06-17 | Hitachi Ltd | Method and apparatus for plasma treatment |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5691447A (en) * | 1979-12-25 | 1981-07-24 | Seiko Epson Corp | Forming of element segregation region of semiconductor integrated circuit |
JPS5691446A (en) * | 1979-12-25 | 1981-07-24 | Seiko Epson Corp | Forming of element segregation region of semiconductor integrated circuit |
Also Published As
Publication number | Publication date |
---|---|
JPS5538053B2 (ja) | 1980-10-02 |
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