JPS5311581A - Etching method - Google Patents

Etching method

Info

Publication number
JPS5311581A
JPS5311581A JP8618876A JP8618876A JPS5311581A JP S5311581 A JPS5311581 A JP S5311581A JP 8618876 A JP8618876 A JP 8618876A JP 8618876 A JP8618876 A JP 8618876A JP S5311581 A JPS5311581 A JP S5311581A
Authority
JP
Japan
Prior art keywords
etching method
resist
inhibit
degradation
mixed gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8618876A
Other languages
Japanese (ja)
Inventor
Kazushi Nagata
Kazuto Suehiro
Hiroshi Shibata
Masahiko Yasuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8618876A priority Critical patent/JPS5311581A/en
Publication of JPS5311581A publication Critical patent/JPS5311581A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To increase etching rate and inhibit the degradation of resist by performing plasma etching an a mixed gas atmosphere of fluorine compound and halogen alone.
COPYRIGHT: (C)1978,JPO&Japio
JP8618876A 1976-07-19 1976-07-19 Etching method Pending JPS5311581A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8618876A JPS5311581A (en) 1976-07-19 1976-07-19 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8618876A JPS5311581A (en) 1976-07-19 1976-07-19 Etching method

Publications (1)

Publication Number Publication Date
JPS5311581A true JPS5311581A (en) 1978-02-02

Family

ID=13879782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8618876A Pending JPS5311581A (en) 1976-07-19 1976-07-19 Etching method

Country Status (1)

Country Link
JP (1) JPS5311581A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56100422A (en) * 1980-01-17 1981-08-12 Toshiba Corp Plasma etching method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56100422A (en) * 1980-01-17 1981-08-12 Toshiba Corp Plasma etching method

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