JPS5376758A - Plasma etching method - Google Patents

Plasma etching method

Info

Publication number
JPS5376758A
JPS5376758A JP15211376A JP15211376A JPS5376758A JP S5376758 A JPS5376758 A JP S5376758A JP 15211376 A JP15211376 A JP 15211376A JP 15211376 A JP15211376 A JP 15211376A JP S5376758 A JPS5376758 A JP S5376758A
Authority
JP
Japan
Prior art keywords
plasma etching
etching method
etchingof
impinge
letting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15211376A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5538053B2 (OSRAM
Inventor
Seitaro Matsuo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP15211376A priority Critical patent/JPS5376758A/ja
Publication of JPS5376758A publication Critical patent/JPS5376758A/ja
Publication of JPS5538053B2 publication Critical patent/JPS5538053B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP15211376A 1976-12-20 1976-12-20 Plasma etching method Granted JPS5376758A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15211376A JPS5376758A (en) 1976-12-20 1976-12-20 Plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15211376A JPS5376758A (en) 1976-12-20 1976-12-20 Plasma etching method

Publications (2)

Publication Number Publication Date
JPS5376758A true JPS5376758A (en) 1978-07-07
JPS5538053B2 JPS5538053B2 (OSRAM) 1980-10-02

Family

ID=15533331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15211376A Granted JPS5376758A (en) 1976-12-20 1976-12-20 Plasma etching method

Country Status (1)

Country Link
JP (1) JPS5376758A (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691446A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Forming of element segregation region of semiconductor integrated circuit
JPS5691447A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Forming of element segregation region of semiconductor integrated circuit

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5171597A (OSRAM) * 1974-12-18 1976-06-21 Hitachi Ltd
JPS5334461A (en) * 1976-09-13 1978-03-31 Toshiba Corp Operating method for accumulating tube
JPS5368171A (en) * 1976-11-30 1978-06-17 Hitachi Ltd Method and apparatus for plasma treatment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5171597A (OSRAM) * 1974-12-18 1976-06-21 Hitachi Ltd
JPS5334461A (en) * 1976-09-13 1978-03-31 Toshiba Corp Operating method for accumulating tube
JPS5368171A (en) * 1976-11-30 1978-06-17 Hitachi Ltd Method and apparatus for plasma treatment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691446A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Forming of element segregation region of semiconductor integrated circuit
JPS5691447A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Forming of element segregation region of semiconductor integrated circuit

Also Published As

Publication number Publication date
JPS5538053B2 (OSRAM) 1980-10-02

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