JPS5375854A - Production fo semiconductor device - Google Patents

Production fo semiconductor device

Info

Publication number
JPS5375854A
JPS5375854A JP15168976A JP15168976A JPS5375854A JP S5375854 A JPS5375854 A JP S5375854A JP 15168976 A JP15168976 A JP 15168976A JP 15168976 A JP15168976 A JP 15168976A JP S5375854 A JPS5375854 A JP S5375854A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
delfection
doping
condensed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15168976A
Other languages
Japanese (ja)
Inventor
Nobuhiko Mizushima
Masahiro Sakagami
Akio Tamama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP15168976A priority Critical patent/JPS5375854A/en
Publication of JPS5375854A publication Critical patent/JPS5375854A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To obtain semiconductor regions of fine patterns at high accuracy without using mask by performing the doping of impurities into a semiconductor substrate through writing using impurity ion beams which are condensed, accelerated and delfection controlled to give desired conductivity type.
COPYRIGHT: (C)1978,JPO&Japio
JP15168976A 1976-12-17 1976-12-17 Production fo semiconductor device Pending JPS5375854A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15168976A JPS5375854A (en) 1976-12-17 1976-12-17 Production fo semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15168976A JPS5375854A (en) 1976-12-17 1976-12-17 Production fo semiconductor device

Publications (1)

Publication Number Publication Date
JPS5375854A true JPS5375854A (en) 1978-07-05

Family

ID=15524100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15168976A Pending JPS5375854A (en) 1976-12-17 1976-12-17 Production fo semiconductor device

Country Status (1)

Country Link
JP (1) JPS5375854A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58223321A (en) * 1982-06-22 1983-12-24 Toshiba Corp Implantation of ion
JPH02263435A (en) * 1988-10-31 1990-10-26 Sharp Corp Ion implanting method and apparatus
US5106764A (en) * 1989-04-10 1992-04-21 At&T Bell Laboratories Device fabrication

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58223321A (en) * 1982-06-22 1983-12-24 Toshiba Corp Implantation of ion
JPH02263435A (en) * 1988-10-31 1990-10-26 Sharp Corp Ion implanting method and apparatus
US5106764A (en) * 1989-04-10 1992-04-21 At&T Bell Laboratories Device fabrication

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