JPS5368981A - Vacuum contact printing apparatus - Google Patents

Vacuum contact printing apparatus

Info

Publication number
JPS5368981A
JPS5368981A JP14528776A JP14528776A JPS5368981A JP S5368981 A JPS5368981 A JP S5368981A JP 14528776 A JP14528776 A JP 14528776A JP 14528776 A JP14528776 A JP 14528776A JP S5368981 A JPS5368981 A JP S5368981A
Authority
JP
Japan
Prior art keywords
vacuum contact
printing apparatus
contact printing
duplicating
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14528776A
Other languages
Japanese (ja)
Inventor
Ikuo Iwama
Sueo Hamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14528776A priority Critical patent/JPS5368981A/en
Publication of JPS5368981A publication Critical patent/JPS5368981A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Abstract

PURPOSE: To avert the effect of oxygen on rubber base photo resist even in the event of the occurrence of leakage in the apparatus and obtain a duplicating mask of high accuracy by keeping the surroundings of a reference photo mask and a duplicating specimen always filled with an inert gas from prior to starting of vacuum contact until the completion of vacuum contact exposure.
COPYRIGHT: (C)1978,JPO&Japio
JP14528776A 1976-12-02 1976-12-02 Vacuum contact printing apparatus Pending JPS5368981A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14528776A JPS5368981A (en) 1976-12-02 1976-12-02 Vacuum contact printing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14528776A JPS5368981A (en) 1976-12-02 1976-12-02 Vacuum contact printing apparatus

Publications (1)

Publication Number Publication Date
JPS5368981A true JPS5368981A (en) 1978-06-19

Family

ID=15381640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14528776A Pending JPS5368981A (en) 1976-12-02 1976-12-02 Vacuum contact printing apparatus

Country Status (1)

Country Link
JP (1) JPS5368981A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55141944U (en) * 1979-03-29 1980-10-11
JPS5836738U (en) * 1981-08-31 1983-03-10 三洋電機株式会社 Exposure mask device
JPS58151025A (en) * 1982-03-04 1983-09-08 Toshiba Corp Exposing method of photosensitive film of semiconductor wafer
JP2001168027A (en) * 1999-11-05 2001-06-22 Asm Lithography Bv Lithography device
JP2010040831A (en) * 2008-08-06 2010-02-18 Orc Mfg Co Ltd Exposing method for substrate in exposing device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55141944U (en) * 1979-03-29 1980-10-11
JPS5836738U (en) * 1981-08-31 1983-03-10 三洋電機株式会社 Exposure mask device
JPS623804Y2 (en) * 1981-08-31 1987-01-28
JPS58151025A (en) * 1982-03-04 1983-09-08 Toshiba Corp Exposing method of photosensitive film of semiconductor wafer
JPH0254652B2 (en) * 1982-03-04 1990-11-22 Tokyo Shibaura Electric Co
JP2001168027A (en) * 1999-11-05 2001-06-22 Asm Lithography Bv Lithography device
JP2010040831A (en) * 2008-08-06 2010-02-18 Orc Mfg Co Ltd Exposing method for substrate in exposing device

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