JPS5366374A - Manufacture for semiconductor element - Google Patents

Manufacture for semiconductor element

Info

Publication number
JPS5366374A
JPS5366374A JP13930276A JP13930276A JPS5366374A JP S5366374 A JPS5366374 A JP S5366374A JP 13930276 A JP13930276 A JP 13930276A JP 13930276 A JP13930276 A JP 13930276A JP S5366374 A JPS5366374 A JP S5366374A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor element
mask
semiconductor substrate
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13930276A
Other languages
Japanese (ja)
Inventor
Kenichi Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13930276A priority Critical patent/JPS5366374A/en
Publication of JPS5366374A publication Critical patent/JPS5366374A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To obtain the desired angle with a good reproducibility and to prevent open wire of the wiring provided on it, by using gas plasma mixed with CF4 and O2. and controlling the incineration speed of photo resist used for the mask, when an opening having a given angle is formed to the oxide film coated on the semiconductor substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP13930276A 1976-11-18 1976-11-18 Manufacture for semiconductor element Pending JPS5366374A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13930276A JPS5366374A (en) 1976-11-18 1976-11-18 Manufacture for semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13930276A JPS5366374A (en) 1976-11-18 1976-11-18 Manufacture for semiconductor element

Publications (1)

Publication Number Publication Date
JPS5366374A true JPS5366374A (en) 1978-06-13

Family

ID=15242111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13930276A Pending JPS5366374A (en) 1976-11-18 1976-11-18 Manufacture for semiconductor element

Country Status (1)

Country Link
JP (1) JPS5366374A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55175095U (en) * 1979-05-29 1980-12-15
JPS58137214A (en) * 1982-02-09 1983-08-15 Kokusai Electric Co Ltd Pattern forming
JPS60247926A (en) * 1984-04-23 1985-12-07 ゼネラル・エレクトリツク・カンパニイ Taper dry etching method
JPH03293623A (en) * 1989-12-29 1991-12-25 American Teleph & Telegr Co <Att> Optical element with diffraction grating
JPH05188148A (en) * 1992-01-13 1993-07-30 Hamamatsu Photonics Kk Radiation detecting element

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55175095U (en) * 1979-05-29 1980-12-15
JPS58137214A (en) * 1982-02-09 1983-08-15 Kokusai Electric Co Ltd Pattern forming
JPS60247926A (en) * 1984-04-23 1985-12-07 ゼネラル・エレクトリツク・カンパニイ Taper dry etching method
JPH03293623A (en) * 1989-12-29 1991-12-25 American Teleph & Telegr Co <Att> Optical element with diffraction grating
JPH05188148A (en) * 1992-01-13 1993-07-30 Hamamatsu Photonics Kk Radiation detecting element

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