JPS5359367A - Formation of electron beam resist image - Google Patents

Formation of electron beam resist image

Info

Publication number
JPS5359367A
JPS5359367A JP13403976A JP13403976A JPS5359367A JP S5359367 A JPS5359367 A JP S5359367A JP 13403976 A JP13403976 A JP 13403976A JP 13403976 A JP13403976 A JP 13403976A JP S5359367 A JPS5359367 A JP S5359367A
Authority
JP
Japan
Prior art keywords
electron beam
formation
beam resist
resist image
sensitivety
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13403976A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5521334B2 (enExample
Inventor
Yukio Hatano
Saburo Nonogaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
NTT Inc
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP13403976A priority Critical patent/JPS5359367A/ja
Publication of JPS5359367A publication Critical patent/JPS5359367A/ja
Publication of JPS5521334B2 publication Critical patent/JPS5521334B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electron Beam Exposure (AREA)
JP13403976A 1976-11-10 1976-11-10 Formation of electron beam resist image Granted JPS5359367A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13403976A JPS5359367A (en) 1976-11-10 1976-11-10 Formation of electron beam resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13403976A JPS5359367A (en) 1976-11-10 1976-11-10 Formation of electron beam resist image

Publications (2)

Publication Number Publication Date
JPS5359367A true JPS5359367A (en) 1978-05-29
JPS5521334B2 JPS5521334B2 (enExample) 1980-06-09

Family

ID=15118932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13403976A Granted JPS5359367A (en) 1976-11-10 1976-11-10 Formation of electron beam resist image

Country Status (1)

Country Link
JP (1) JPS5359367A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155353A (en) * 1979-05-22 1980-12-03 Tokyo Ohka Kogyo Co Ltd Developer composition
JPS5675646A (en) * 1979-11-27 1981-06-22 Fujitsu Ltd Developing solution composition for radiation sensitive material
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPS5984519A (ja) * 1982-11-08 1984-05-16 Hitachi Ltd 現像液
US6445120B1 (en) 1998-10-28 2002-09-03 Lg Electronics Inc. Plasma display panel with improved structure of discharge electrode and dielectric layer
US6548962B1 (en) 1997-08-19 2003-04-15 Matsushita Electric Industrial Co., Ltd. Gas discharge panel

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS502939A (enExample) * 1973-04-09 1975-01-13
JPS5148279A (enExample) * 1974-09-26 1976-04-24 Ibm
JPS51105353A (ja) * 1975-03-07 1976-09-17 Hitachi Ltd Denshisenkannoseikobunshisoseibutsu
JPS51130222A (en) * 1975-05-07 1976-11-12 Hitachi Ltd A process for producing an electron beam resist image

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS502939A (enExample) * 1973-04-09 1975-01-13
JPS5148279A (enExample) * 1974-09-26 1976-04-24 Ibm
JPS51105353A (ja) * 1975-03-07 1976-09-17 Hitachi Ltd Denshisenkannoseikobunshisoseibutsu
JPS51130222A (en) * 1975-05-07 1976-11-12 Hitachi Ltd A process for producing an electron beam resist image

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155353A (en) * 1979-05-22 1980-12-03 Tokyo Ohka Kogyo Co Ltd Developer composition
JPS5675646A (en) * 1979-11-27 1981-06-22 Fujitsu Ltd Developing solution composition for radiation sensitive material
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPS5984519A (ja) * 1982-11-08 1984-05-16 Hitachi Ltd 現像液
US6548962B1 (en) 1997-08-19 2003-04-15 Matsushita Electric Industrial Co., Ltd. Gas discharge panel
US6445120B1 (en) 1998-10-28 2002-09-03 Lg Electronics Inc. Plasma display panel with improved structure of discharge electrode and dielectric layer

Also Published As

Publication number Publication date
JPS5521334B2 (enExample) 1980-06-09

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