JPS5148279A - - Google Patents

Info

Publication number
JPS5148279A
JPS5148279A JP50099847A JP9984775A JPS5148279A JP S5148279 A JPS5148279 A JP S5148279A JP 50099847 A JP50099847 A JP 50099847A JP 9984775 A JP9984775 A JP 9984775A JP S5148279 A JPS5148279 A JP S5148279A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50099847A
Other languages
Japanese (ja)
Inventor
Gipusutein Edowaado
Emu Moryuu Uein
Yuu Niido Saado Omaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5148279A publication Critical patent/JPS5148279A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP50099847A 1974-09-26 1975-08-19 Pending JPS5148279A (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US50959474A 1974-09-26 1974-09-26

Publications (1)

Publication Number Publication Date
JPS5148279A true JPS5148279A (enExample) 1976-04-24

Family

ID=24027317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50099847A Pending JPS5148279A (enExample) 1974-09-26 1975-08-19

Country Status (3)

Country Link
JP (1) JPS5148279A (enExample)
DE (1) DE2536299A1 (enExample)
FR (1) FR2286414A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS5465480A (en) * 1977-11-04 1979-05-26 Tokyo Ouka Kougiyou Kk Method of forming microminiature pattern
JPS5475989A (en) * 1977-11-30 1979-06-18 Hitachi Ltd Pattern production method
JPS5511301A (en) * 1978-06-12 1980-01-26 Fujitsu Ltd Method of forming fine pattern
JPS63291053A (ja) * 1987-05-25 1988-11-28 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54125024A (en) * 1978-03-22 1979-09-28 Tokyo Ouka Kougiyou Kk Photosensitive composition
DE3272818D1 (en) * 1981-03-27 1986-10-02 Hitachi Ltd Radiation sensitive polymer materials
EP0154932A3 (en) * 1984-03-09 1986-02-05 Hewlett-Packard Company Multilayer photoresist process

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS5465480A (en) * 1977-11-04 1979-05-26 Tokyo Ouka Kougiyou Kk Method of forming microminiature pattern
JPS5475989A (en) * 1977-11-30 1979-06-18 Hitachi Ltd Pattern production method
JPS5511301A (en) * 1978-06-12 1980-01-26 Fujitsu Ltd Method of forming fine pattern
JPS63291053A (ja) * 1987-05-25 1988-11-28 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物

Also Published As

Publication number Publication date
DE2536299A1 (de) 1976-04-08
FR2286414A1 (fr) 1976-04-23

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