JPS5521334B2 - - Google Patents
Info
- Publication number
- JPS5521334B2 JPS5521334B2 JP13403976A JP13403976A JPS5521334B2 JP S5521334 B2 JPS5521334 B2 JP S5521334B2 JP 13403976 A JP13403976 A JP 13403976A JP 13403976 A JP13403976 A JP 13403976A JP S5521334 B2 JPS5521334 B2 JP S5521334B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13403976A JPS5359367A (en) | 1976-11-10 | 1976-11-10 | Formation of electron beam resist image |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13403976A JPS5359367A (en) | 1976-11-10 | 1976-11-10 | Formation of electron beam resist image |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5359367A JPS5359367A (en) | 1978-05-29 |
| JPS5521334B2 true JPS5521334B2 (enExample) | 1980-06-09 |
Family
ID=15118932
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13403976A Granted JPS5359367A (en) | 1976-11-10 | 1976-11-10 | Formation of electron beam resist image |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5359367A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55155353A (en) * | 1979-05-22 | 1980-12-03 | Tokyo Ohka Kogyo Co Ltd | Developer composition |
| JPS5675646A (en) * | 1979-11-27 | 1981-06-22 | Fujitsu Ltd | Developing solution composition for radiation sensitive material |
| JPS5683740A (en) * | 1979-12-13 | 1981-07-08 | Japan Synthetic Rubber Co Ltd | Developer for polymer photoresist |
| JPS5984519A (ja) * | 1982-11-08 | 1984-05-16 | Hitachi Ltd | 現像液 |
| DE69841377D1 (de) | 1997-08-19 | 2010-01-21 | Panasonic Corp | Gasentladungstafel |
| US6445120B1 (en) | 1998-10-28 | 2002-09-03 | Lg Electronics Inc. | Plasma display panel with improved structure of discharge electrode and dielectric layer |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2237226A1 (en) * | 1973-04-09 | 1975-02-07 | Western Electric Co | Negative resist formation - using polydiallylorthophthalate electron sensitive resist layer |
| FR2286414A1 (fr) * | 1974-09-26 | 1976-04-23 | Ibm | Materiaux photoresistants positifs de haute resolution |
| JPS51105353A (ja) * | 1975-03-07 | 1976-09-17 | Hitachi Ltd | Denshisenkannoseikobunshisoseibutsu |
| JPS51130222A (en) * | 1975-05-07 | 1976-11-12 | Hitachi Ltd | A process for producing an electron beam resist image |
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1976
- 1976-11-10 JP JP13403976A patent/JPS5359367A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5359367A (en) | 1978-05-29 |