JPS5352072A - Pattern for alignment - Google Patents

Pattern for alignment

Info

Publication number
JPS5352072A
JPS5352072A JP12614376A JP12614376A JPS5352072A JP S5352072 A JPS5352072 A JP S5352072A JP 12614376 A JP12614376 A JP 12614376A JP 12614376 A JP12614376 A JP 12614376A JP S5352072 A JPS5352072 A JP S5352072A
Authority
JP
Japan
Prior art keywords
pattern
alignment
wafer
seciconductor
lectile
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12614376A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5619734B2 (OSRAM
Inventor
Nobuyuki Akiyama
Tomohiro Kuji
Mitsuyoshi Koizumi
Yoshimasa Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12614376A priority Critical patent/JPS5352072A/ja
Publication of JPS5352072A publication Critical patent/JPS5352072A/ja
Publication of JPS5619734B2 publication Critical patent/JPS5619734B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12614376A 1976-10-22 1976-10-22 Pattern for alignment Granted JPS5352072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12614376A JPS5352072A (en) 1976-10-22 1976-10-22 Pattern for alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12614376A JPS5352072A (en) 1976-10-22 1976-10-22 Pattern for alignment

Publications (2)

Publication Number Publication Date
JPS5352072A true JPS5352072A (en) 1978-05-12
JPS5619734B2 JPS5619734B2 (OSRAM) 1981-05-09

Family

ID=14927730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12614376A Granted JPS5352072A (en) 1976-10-22 1976-10-22 Pattern for alignment

Country Status (1)

Country Link
JP (1) JPS5352072A (OSRAM)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
JPS5533145A (en) * 1978-08-30 1980-03-08 Dainippon Screen Mfg Co Ltd Positioning sensor
JPS5533146A (en) * 1978-08-30 1980-03-08 Dainippon Screen Mfg Co Ltd Photoelectric element for detecting and positioning register mark for engraving
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device
JPS59101829A (ja) * 1982-12-01 1984-06-12 Canon Inc アライメントマ−クの配置方法
JPS60196944A (ja) * 1984-07-30 1985-10-05 Hitachi Ltd アライメント方法
JPS61123139A (ja) * 1985-10-11 1986-06-11 Canon Inc アライメント装置
JPS62122129A (ja) * 1986-05-09 1987-06-03 Hitachi Ltd ウエハ上パタ−ン位置検出装置
JPH01103835A (ja) * 1988-08-26 1989-04-20 Hitachi Ltd 半導体ウエハ等の被露光試料

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
JPS5533145A (en) * 1978-08-30 1980-03-08 Dainippon Screen Mfg Co Ltd Positioning sensor
JPS5533146A (en) * 1978-08-30 1980-03-08 Dainippon Screen Mfg Co Ltd Photoelectric element for detecting and positioning register mark for engraving
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device
JPS59101829A (ja) * 1982-12-01 1984-06-12 Canon Inc アライメントマ−クの配置方法
JPS60196944A (ja) * 1984-07-30 1985-10-05 Hitachi Ltd アライメント方法
JPS61123139A (ja) * 1985-10-11 1986-06-11 Canon Inc アライメント装置
JPS62122129A (ja) * 1986-05-09 1987-06-03 Hitachi Ltd ウエハ上パタ−ン位置検出装置
JPH01103835A (ja) * 1988-08-26 1989-04-20 Hitachi Ltd 半導体ウエハ等の被露光試料

Also Published As

Publication number Publication date
JPS5619734B2 (OSRAM) 1981-05-09

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