JPS5350680A - Transfer mask for x-ray exposure and its production - Google Patents

Transfer mask for x-ray exposure and its production

Info

Publication number
JPS5350680A
JPS5350680A JP12513476A JP12513476A JPS5350680A JP S5350680 A JPS5350680 A JP S5350680A JP 12513476 A JP12513476 A JP 12513476A JP 12513476 A JP12513476 A JP 12513476A JP S5350680 A JPS5350680 A JP S5350680A
Authority
JP
Japan
Prior art keywords
production
ray exposure
transfer mask
making
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12513476A
Other languages
English (en)
Other versions
JPS5334464B2 (ja
Inventor
Katsumi Suzuki
Yasuo Iida
Toshiki Kadota
Toshiro Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Nippon Telegraph and Telephone Corp
Original Assignee
NEC Corp
Nippon Telegraph and Telephone Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Telegraph and Telephone Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP12513476A priority Critical patent/JPS5350680A/ja
Priority to US05/843,485 priority patent/US4152601A/en
Publication of JPS5350680A publication Critical patent/JPS5350680A/ja
Publication of JPS5334464B2 publication Critical patent/JPS5334464B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP12513476A 1976-10-19 1976-10-19 Transfer mask for x-ray exposure and its production Granted JPS5350680A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP12513476A JPS5350680A (en) 1976-10-19 1976-10-19 Transfer mask for x-ray exposure and its production
US05/843,485 US4152601A (en) 1976-10-19 1977-10-19 X-ray lithography mask and method for manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12513476A JPS5350680A (en) 1976-10-19 1976-10-19 Transfer mask for x-ray exposure and its production

Publications (2)

Publication Number Publication Date
JPS5350680A true JPS5350680A (en) 1978-05-09
JPS5334464B2 JPS5334464B2 (ja) 1978-09-20

Family

ID=14902689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12513476A Granted JPS5350680A (en) 1976-10-19 1976-10-19 Transfer mask for x-ray exposure and its production

Country Status (2)

Country Link
US (1) US4152601A (ja)
JP (1) JPS5350680A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6220310A (ja) * 1985-07-19 1987-01-28 Nippon Telegr & Teleph Corp <Ntt> Ｘ線マスク

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4253029A (en) * 1979-05-23 1981-02-24 Bell Telephone Laboratories, Incorporated Mask structure for x-ray lithography
EP0048291B1 (de) * 1980-09-19 1985-07-03 Ibm Deutschland Gmbh Struktur mit einem eine durchgehende Öffnung aufweisenden Siliciumkörper und Verfahren zu ihrer Herstellung
US4453086A (en) * 1981-12-31 1984-06-05 International Business Machines Corporation Electron beam system with reduced charge buildup
DE3232498A1 (de) * 1982-09-01 1984-03-01 Philips Patentverwaltung Gmbh, 2000 Hamburg Maske fuer die mustererzeugung in lackschichten mittels roentgenstrahllithographie und verfahren zu ihrer herstellung
US4587184A (en) * 1983-07-27 1986-05-06 Siemens Aktiengesellschaft Method for manufacturing accurate structures with a high aspect ratio and particularly for manufacturing X-ray absorber masks
CN1003524B (zh) * 1985-10-14 1989-03-08 株式会社日立制作所 无电浸镀金溶液
JPH0746681B2 (ja) * 1986-10-28 1995-05-17 富士通株式会社 Ｘ線ステッパー用マスクの製造方法
US5262257A (en) * 1989-07-13 1993-11-16 Canon Kabushiki Kaisha Mask for lithography
JP2801270B2 (ja) * 1989-07-13 1998-09-21 キヤノン株式会社 マスク作成方法
US5124561A (en) * 1991-04-04 1992-06-23 International Business Machines Corporation Process for X-ray mask warpage reduction
DE69229987T2 (de) * 1991-11-15 2000-04-20 Canon K.K. Röntgenstrahlmaskenstruktur und -belichtungsverfahren sowie damit hergestelltes Halbleiterbauelement und Herstellungsverfahren für die Röntgenstrahlmaskenstruktur
US5570405A (en) * 1995-06-06 1996-10-29 International Business Machines Corporation Registration and alignment technique for X-ray mask fabrication
KR19980017722A (ko) * 1996-08-31 1998-06-05 구자홍 엑스(x)-선 리소그래피용 마스크 및 그 제조방법
JPH11260701A (ja) * 1998-03-13 1999-09-24 Tokyo Inst Of Technol 電子ビーム露光の位置合わせマーク
US6859330B2 (en) * 2003-06-04 2005-02-22 Intel Corporation Micromachined pellicle splitters and tunable laser modules incorporating same
DE10339823B4 (de) * 2003-08-25 2005-06-16 Hahn-Meitner-Institut Berlin Gmbh Verwendung eines Fensters in einer Ultrahochvakuum-Kammer
KR101095681B1 (ko) * 2008-12-26 2011-12-19 주식회사 하이닉스반도체 극자외선 리소그래피를 위한 포토마스크 및 그 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system
US3742230A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask support substrate
US3873824A (en) * 1973-10-01 1975-03-25 Texas Instruments Inc X-ray lithography mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6220310A (ja) * 1985-07-19 1987-01-28 Nippon Telegr & Teleph Corp <Ntt> Ｘ線マスク

Also Published As

Publication number Publication date
US4152601A (en) 1979-05-01
JPS5334464B2 (ja) 1978-09-20

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