JPS6437014A - Mask for x-ray lithography - Google Patents

Mask for x-ray lithography

Info

Publication number
JPS6437014A
JPS6437014A JP19314287A JP19314287A JPS6437014A JP S6437014 A JPS6437014 A JP S6437014A JP 19314287 A JP19314287 A JP 19314287A JP 19314287 A JP19314287 A JP 19314287A JP S6437014 A JPS6437014 A JP S6437014A
Authority
JP
Japan
Prior art keywords
heavy metal
giving
ray
stress
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19314287A
Other languages
Japanese (ja)
Inventor
Chiyako Shiga
Katsuji Iguchi
Masahiko Urai
Masayoshi Koba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP19314287A priority Critical patent/JPS6437014A/en
Publication of JPS6437014A publication Critical patent/JPS6437014A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To reduce the strain for improving the precision by using heavy metal films of heavy metal absorber giving low stress as an X-ray absorber. CONSTITUTION:A patterned X-ray absorber 5 mainly composed of a heavy metal obstructing the transmission of X-ray formed on an X-ray transmissive film 3 on a holding body 1 is structured by multiple alternately laminated layers comprising the first heavy metal containing layers 51 giving the tension stress and the second heavy metal containing layers 52 giving the compression stress while the first heavy metal containing layer on the X-ray transmissive film 3 side is composed of the first metal layers 51 giving the tension stress. Through these procedures, both stresses are offset to each other so that the heavy metal film 5 giving low stress may be formed to improve the precision of pattern positions.
JP19314287A 1987-07-31 1987-07-31 Mask for x-ray lithography Pending JPS6437014A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19314287A JPS6437014A (en) 1987-07-31 1987-07-31 Mask for x-ray lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19314287A JPS6437014A (en) 1987-07-31 1987-07-31 Mask for x-ray lithography

Publications (1)

Publication Number Publication Date
JPS6437014A true JPS6437014A (en) 1989-02-07

Family

ID=16302982

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19314287A Pending JPS6437014A (en) 1987-07-31 1987-07-31 Mask for x-ray lithography

Country Status (1)

Country Link
JP (1) JPS6437014A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03103644U (en) * 1990-02-09 1991-10-28
EP0707236A2 (en) * 1994-10-11 1996-04-17 AT&T Corp. Masks with low stress multilayer films and a process for controlling the stress of multilayer films
WO1999042901A1 (en) * 1998-02-20 1999-08-26 The Regents Of The University Of California Method to adjust multilayer film stress induced deformation of optics
JP2019036580A (en) * 2017-08-10 2019-03-07 株式会社ニューフレアテクノロジー Multi-charged particle beam lithography device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03103644U (en) * 1990-02-09 1991-10-28
EP0707236A2 (en) * 1994-10-11 1996-04-17 AT&T Corp. Masks with low stress multilayer films and a process for controlling the stress of multilayer films
JPH08190190A (en) * 1994-10-11 1996-07-23 At & T Corp Mask having low-stress multilayered film and process for controlling stress of multilayered film
EP0707236A3 (en) * 1994-10-11 1996-11-20 At & T Corp Masks with low stress multilayer films and a process for controlling the stress of multilayer films
WO1999042901A1 (en) * 1998-02-20 1999-08-26 The Regents Of The University Of California Method to adjust multilayer film stress induced deformation of optics
JP2019036580A (en) * 2017-08-10 2019-03-07 株式会社ニューフレアテクノロジー Multi-charged particle beam lithography device

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