JPS5330277A - Mask for x-ray exposure - Google Patents

Mask for x-ray exposure

Info

Publication number
JPS5330277A
JPS5330277A JP10452876A JP10452876A JPS5330277A JP S5330277 A JPS5330277 A JP S5330277A JP 10452876 A JP10452876 A JP 10452876A JP 10452876 A JP10452876 A JP 10452876A JP S5330277 A JPS5330277 A JP S5330277A
Authority
JP
Japan
Prior art keywords
mask
ray exposure
substrate
visibly
windows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10452876A
Other languages
English (en)
Other versions
JPS5326113B2 (ja
Inventor
Takaaki Miwa
Yushi Inagaki
Toru Funayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10452876A priority Critical patent/JPS5330277A/ja
Publication of JPS5330277A publication Critical patent/JPS5330277A/ja
Publication of JPS5326113B2 publication Critical patent/JPS5326113B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP10452876A 1976-09-01 1976-09-01 Mask for x-ray exposure Granted JPS5330277A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10452876A JPS5330277A (en) 1976-09-01 1976-09-01 Mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10452876A JPS5330277A (en) 1976-09-01 1976-09-01 Mask for x-ray exposure

Publications (2)

Publication Number Publication Date
JPS5330277A true JPS5330277A (en) 1978-03-22
JPS5326113B2 JPS5326113B2 (ja) 1978-07-31

Family

ID=14382982

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10452876A Granted JPS5330277A (en) 1976-09-01 1976-09-01 Mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS5330277A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63133524A (ja) * 1986-11-25 1988-06-06 Matsushita Electronics Corp Ｘ線マスクおよびその製造方法
RU2785012C1 (ru) * 2022-01-25 2022-12-01 Федеральное государственное бюджетное учреждение науки, Институт Ядерной Физики им. Г.И. Будкера Сибирского отделения (ИЯФ СО РАН) Рентгеновская маска

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63133524A (ja) * 1986-11-25 1988-06-06 Matsushita Electronics Corp Ｘ線マスクおよびその製造方法
RU2785012C1 (ru) * 2022-01-25 2022-12-01 Федеральное государственное бюджетное учреждение науки, Институт Ядерной Физики им. Г.И. Будкера Сибирского отделения (ИЯФ СО РАН) Рентгеновская маска

Also Published As

Publication number Publication date
JPS5326113B2 (ja) 1978-07-31

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