JPS53131766A - Semiconductor device electrode structural body and production of the same - Google Patents

Semiconductor device electrode structural body and production of the same

Info

Publication number
JPS53131766A
JPS53131766A JP4591577A JP4591577A JPS53131766A JP S53131766 A JPS53131766 A JP S53131766A JP 4591577 A JP4591577 A JP 4591577A JP 4591577 A JP4591577 A JP 4591577A JP S53131766 A JPS53131766 A JP S53131766A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
same
structural body
device electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4591577A
Other languages
Japanese (ja)
Inventor
Shigeru Takahashi
Yoshikazu Hosokawa
Ryosaku Kanzawa
Yoshitaka Sugawara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4591577A priority Critical patent/JPS53131766A/en
Publication of JPS53131766A publication Critical patent/JPS53131766A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To obtain a metal film electrode structual body of a specified size by evaporating underlying metal films by using a metal mask of a hole diameter larger than the specified size and removing part thereof through photoetching.
COPYRIGHT: (C)1978,JPO&Japio
JP4591577A 1977-04-22 1977-04-22 Semiconductor device electrode structural body and production of the same Pending JPS53131766A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4591577A JPS53131766A (en) 1977-04-22 1977-04-22 Semiconductor device electrode structural body and production of the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4591577A JPS53131766A (en) 1977-04-22 1977-04-22 Semiconductor device electrode structural body and production of the same

Publications (1)

Publication Number Publication Date
JPS53131766A true JPS53131766A (en) 1978-11-16

Family

ID=12732533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4591577A Pending JPS53131766A (en) 1977-04-22 1977-04-22 Semiconductor device electrode structural body and production of the same

Country Status (1)

Country Link
JP (1) JPS53131766A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6064457A (en) * 1983-09-19 1985-04-13 Hitachi Ltd Semiconductor device
JPS60140737A (en) * 1983-12-27 1985-07-25 Seiko Instr & Electronics Ltd Manufacture of semiconductor device
JP2011249564A (en) * 2010-05-27 2011-12-08 Renesas Electronics Corp Semiconductor device manufacturing method and mounting structure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6064457A (en) * 1983-09-19 1985-04-13 Hitachi Ltd Semiconductor device
JPS60140737A (en) * 1983-12-27 1985-07-25 Seiko Instr & Electronics Ltd Manufacture of semiconductor device
JPH0244145B2 (en) * 1983-12-27 1990-10-02 Seiko Instr & Electronics
JP2011249564A (en) * 2010-05-27 2011-12-08 Renesas Electronics Corp Semiconductor device manufacturing method and mounting structure

Similar Documents

Publication Publication Date Title
JPS51120180A (en) Pattern printing device
JPS51111752A (en) Method of removing organic mercury compounds by flotation
JPS53131766A (en) Semiconductor device electrode structural body and production of the same
JPS5380966A (en) Manufacture of electrode fdr semiconductor device
JPS5230170A (en) Method of photoetching
JPS52182A (en) Method of forming planar type fet electrodes
JPS53120383A (en) Production of semiconductor device
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS52104066A (en) Selective etching method of thermosetting organic materials
JPS52173A (en) X-ray etching mask
JPS52117077A (en) Electron beam-exposing method
JPS5396671A (en) Manufacture of semiconductor device
JPS53135267A (en) Production of semiconductor device
JPS52130567A (en) Preparation of semiconductor device
JPS5222473A (en) Panel measuring device
JPS545659A (en) Manufacture of semiconductor device
JPS5429971A (en) Manufacture of semiconductor device
JPS53124993A (en) Production of semiconductor device
JPS53142168A (en) Reproductive use of semiconductor substrate
JPS5293270A (en) Manufacture for semiconductor device
JPS5432068A (en) Manufacture of semiconductor device
JPS51118369A (en) Manufacturing process for simiconduator unit
JPS5354988A (en) Production of semiconductor device
JPS53116780A (en) Glassivation semiconductor device and production of the same
JPS53136493A (en) Manufacture for semiconductor device