JPS5299778A - Production of silicon mask for x-ray lithography - Google Patents

Production of silicon mask for x-ray lithography

Info

Publication number
JPS5299778A
JPS5299778A JP1669376A JP1669376A JPS5299778A JP S5299778 A JPS5299778 A JP S5299778A JP 1669376 A JP1669376 A JP 1669376A JP 1669376 A JP1669376 A JP 1669376A JP S5299778 A JPS5299778 A JP S5299778A
Authority
JP
Japan
Prior art keywords
production
ray lithography
silicon mask
layer
implanted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1669376A
Other languages
English (en)
Inventor
Jiyunji Matsui
Hidekazu Okabayashi
Daizaburo Shinoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP1669376A priority Critical patent/JPS5299778A/ja
Publication of JPS5299778A publication Critical patent/JPS5299778A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1669376A 1976-02-18 1976-02-18 Production of silicon mask for x-ray lithography Pending JPS5299778A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1669376A JPS5299778A (en) 1976-02-18 1976-02-18 Production of silicon mask for x-ray lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1669376A JPS5299778A (en) 1976-02-18 1976-02-18 Production of silicon mask for x-ray lithography

Publications (1)

Publication Number Publication Date
JPS5299778A true JPS5299778A (en) 1977-08-22

Family

ID=11923373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1669376A Pending JPS5299778A (en) 1976-02-18 1976-02-18 Production of silicon mask for x-ray lithography

Country Status (1)

Country Link
JP (1) JPS5299778A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59193454A (ja) * 1983-04-18 1984-11-02 Shuzo Hattori Ｘ線リソグラフイ−用マスクの製造法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59193454A (ja) * 1983-04-18 1984-11-02 Shuzo Hattori Ｘ線リソグラフイ−用マスクの製造法
JPH0424854B2 (ja) * 1983-04-18 1992-04-28 Shuzo Hatsutori

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