JPS5299072A - Mask for x-ray exposure - Google Patents

Mask for x-ray exposure

Info

Publication number
JPS5299072A
JPS5299072A JP1497576A JP1497576A JPS5299072A JP S5299072 A JPS5299072 A JP S5299072A JP 1497576 A JP1497576 A JP 1497576A JP 1497576 A JP1497576 A JP 1497576A JP S5299072 A JPS5299072 A JP S5299072A
Authority
JP
Japan
Prior art keywords
mask
ray exposure
forming
platinum
gold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1497576A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5329574B2 (enrdf_load_stackoverflow
Inventor
Yoshiaki Mimura
Satoru Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1497576A priority Critical patent/JPS5299072A/ja
Publication of JPS5299072A publication Critical patent/JPS5299072A/ja
Publication of JPS5329574B2 publication Critical patent/JPS5329574B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1497576A 1976-02-16 1976-02-16 Mask for x-ray exposure Granted JPS5299072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1497576A JPS5299072A (en) 1976-02-16 1976-02-16 Mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1497576A JPS5299072A (en) 1976-02-16 1976-02-16 Mask for x-ray exposure

Publications (2)

Publication Number Publication Date
JPS5299072A true JPS5299072A (en) 1977-08-19
JPS5329574B2 JPS5329574B2 (enrdf_load_stackoverflow) 1978-08-22

Family

ID=11875969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1497576A Granted JPS5299072A (en) 1976-02-16 1976-02-16 Mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS5299072A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950443A (ja) * 1982-09-16 1984-03-23 Hitachi Ltd Ｘ線マスク
JPS60168145A (ja) * 1984-02-13 1985-08-31 Nec Corp Ｘ線露光マスク
JPH04269832A (ja) * 1991-02-26 1992-09-25 Shin Etsu Chem Co Ltd Ｘ線リソグラフィ−用マスクの製造方法
JP2016040763A (ja) * 2014-08-13 2016-03-24 国立研究開発法人産業技術総合研究所 軟ｘ線を用いた二次電池オペランド測定用電極

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5577637A (en) * 1978-12-06 1980-06-11 Toshiba Corp Ignition control circuit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950443A (ja) * 1982-09-16 1984-03-23 Hitachi Ltd Ｘ線マスク
JPS60168145A (ja) * 1984-02-13 1985-08-31 Nec Corp Ｘ線露光マスク
JPH04269832A (ja) * 1991-02-26 1992-09-25 Shin Etsu Chem Co Ltd Ｘ線リソグラフィ−用マスクの製造方法
JP2016040763A (ja) * 2014-08-13 2016-03-24 国立研究開発法人産業技術総合研究所 軟ｘ線を用いた二次電池オペランド測定用電極

Also Published As

Publication number Publication date
JPS5329574B2 (enrdf_load_stackoverflow) 1978-08-22

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