JPS5259577A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5259577A
JPS5259577A JP13536275A JP13536275A JPS5259577A JP S5259577 A JPS5259577 A JP S5259577A JP 13536275 A JP13536275 A JP 13536275A JP 13536275 A JP13536275 A JP 13536275A JP S5259577 A JPS5259577 A JP S5259577A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
serration
bury
flattening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13536275A
Other languages
Japanese (ja)
Other versions
JPS5918860B2 (en
Inventor
Eizo Fujii
Hiroshi Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13536275A priority Critical patent/JPS5918860B2/en
Publication of JPS5259577A publication Critical patent/JPS5259577A/en
Publication of JPS5918860B2 publication Critical patent/JPS5918860B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)

Abstract

PURPOSE: Positive and highly accurate window opening is performed by forming a buried layer so as to bury the serration on a thin film region of an insulating film having the serration thereby flattening the substrate surface and making possible the formation of a uniform thin photo resist film.
COPYRIGHT: (C)1977,JPO&Japio
JP13536275A 1975-11-10 1975-11-10 hand tai souchi no seizou houhou Expired JPS5918860B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13536275A JPS5918860B2 (en) 1975-11-10 1975-11-10 hand tai souchi no seizou houhou

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13536275A JPS5918860B2 (en) 1975-11-10 1975-11-10 hand tai souchi no seizou houhou

Publications (2)

Publication Number Publication Date
JPS5259577A true JPS5259577A (en) 1977-05-17
JPS5918860B2 JPS5918860B2 (en) 1984-05-01

Family

ID=15149953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13536275A Expired JPS5918860B2 (en) 1975-11-10 1975-11-10 hand tai souchi no seizou houhou

Country Status (1)

Country Link
JP (1) JPS5918860B2 (en)

Also Published As

Publication number Publication date
JPS5918860B2 (en) 1984-05-01

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