JPS52151572A - Insulated gate semiconductor device and its production - Google Patents
Insulated gate semiconductor device and its productionInfo
- Publication number
- JPS52151572A JPS52151572A JP596177A JP596177A JPS52151572A JP S52151572 A JPS52151572 A JP S52151572A JP 596177 A JP596177 A JP 596177A JP 596177 A JP596177 A JP 596177A JP S52151572 A JPS52151572 A JP S52151572A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- film
- production
- insulated gate
- abovementioned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To reduce percent defective and improve quality by providing a semiconductor device comprising a gate insulation layer, a semiconductor layer provided on said film and a second insulation film which fills the gaps directly under edges of the abovementioned layer produced by side-etching of the abovementioned film when the abovementioned film etched.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52005961A JPS5858814B2 (en) | 1977-01-24 | 1977-01-24 | Manufacturing method of insulated gate semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52005961A JPS5858814B2 (en) | 1977-01-24 | 1977-01-24 | Manufacturing method of insulated gate semiconductor device |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8329371A Division JPS5112507B2 (en) | 1971-10-22 | 1971-10-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52151572A true JPS52151572A (en) | 1977-12-16 |
JPS5858814B2 JPS5858814B2 (en) | 1983-12-27 |
Family
ID=11625473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52005961A Expired JPS5858814B2 (en) | 1977-01-24 | 1977-01-24 | Manufacturing method of insulated gate semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5858814B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5789258A (en) * | 1980-11-26 | 1982-06-03 | Seiko Epson Corp | Manufacture of semiconductor device |
-
1977
- 1977-01-24 JP JP52005961A patent/JPS5858814B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5789258A (en) * | 1980-11-26 | 1982-06-03 | Seiko Epson Corp | Manufacture of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS5858814B2 (en) | 1983-12-27 |
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