JPS5253778A - Ion plating apparatus - Google Patents
Ion plating apparatusInfo
- Publication number
- JPS5253778A JPS5253778A JP13009775A JP13009775A JPS5253778A JP S5253778 A JPS5253778 A JP S5253778A JP 13009775 A JP13009775 A JP 13009775A JP 13009775 A JP13009775 A JP 13009775A JP S5253778 A JPS5253778 A JP S5253778A
- Authority
- JP
- Japan
- Prior art keywords
- ion plating
- plating apparatus
- plated
- ionization
- impurities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:A vacuum evaporation chamber is divided into two or more parts by electromagnetic shielding plates and ionization of evaporated particles by high frequency excitation is carried out in each part to increase bonding strength of plated products and prevent degradation of plated films due to the presence of impurities.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13009775A JPS5253778A (en) | 1975-10-29 | 1975-10-29 | Ion plating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13009775A JPS5253778A (en) | 1975-10-29 | 1975-10-29 | Ion plating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5253778A true JPS5253778A (en) | 1977-04-30 |
JPS5521109B2 JPS5521109B2 (en) | 1980-06-07 |
Family
ID=15025872
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13009775A Granted JPS5253778A (en) | 1975-10-29 | 1975-10-29 | Ion plating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5253778A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6210267A (en) * | 1985-07-05 | 1987-01-19 | Seiko Electronic Components Ltd | Ion plating method |
JPS63105960A (en) * | 1986-06-07 | 1988-05-11 | Kawasaki Steel Corp | Production of metallic strip provided with ion plating film having excellent adhesiveness and ion plating device |
US5474611A (en) * | 1992-05-20 | 1995-12-12 | Yoichi Murayama, Shincron Co., Ltd. | Plasma vapor deposition apparatus |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS474926U (en) * | 1971-02-03 | 1972-09-13 | ||
JPS4879736A (en) * | 1972-01-27 | 1973-10-25 | ||
JPS49120877A (en) * | 1973-03-20 | 1974-11-19 | ||
JPS5022780A (en) * | 1973-07-03 | 1975-03-11 |
-
1975
- 1975-10-29 JP JP13009775A patent/JPS5253778A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS474926U (en) * | 1971-02-03 | 1972-09-13 | ||
JPS4879736A (en) * | 1972-01-27 | 1973-10-25 | ||
JPS49120877A (en) * | 1973-03-20 | 1974-11-19 | ||
JPS5022780A (en) * | 1973-07-03 | 1975-03-11 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6210267A (en) * | 1985-07-05 | 1987-01-19 | Seiko Electronic Components Ltd | Ion plating method |
JPH0136553B2 (en) * | 1985-07-05 | 1989-08-01 | Seikoo Denshi Buhin Kk | |
JPS63105960A (en) * | 1986-06-07 | 1988-05-11 | Kawasaki Steel Corp | Production of metallic strip provided with ion plating film having excellent adhesiveness and ion plating device |
US5474611A (en) * | 1992-05-20 | 1995-12-12 | Yoichi Murayama, Shincron Co., Ltd. | Plasma vapor deposition apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS5521109B2 (en) | 1980-06-07 |
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